Electric pulse generation system using capacitive coupling
In accordance with the present disclosure, exposure of a sample to one or more electric pulses via capacitive coupling is described. In certain embodiments, the sample may be a biological sample to be treated or modified using the pulsed electric fields. In certain embodiments, the electric pulses may be delivered to a load using capacitive coupling. In other embodiments, the electric pulses may be bipolar pulses.
1. A cuvette comprising:
a body comprising a nonconductive material;
a sample cavity configured to receive a sample;
a first wall configured to couple to a first electrode of a pulse generating system that comprises a capacitive element, wherein the capacitive element is in series with the sample during operation; and
a second wall configured to couple to a second electrode of the pulse generating system.
2. The cuvette of claim 1 , wherein the capacitive element comprises a capacitance in a range between 1 nF and 1 mF.
3. The cuvette of claim 1 , wherein the nonconductive material comprises a quartz or a plastic.
4. The cuvette of claim 1 , wherein the first wall comprises a conductive contact configured to couple to the first electrode to the capacitive element, wherein the conductive contact is separated from the sample cavity by a dielectric gap of the capacitive element, and wherein the dielectric gap comprises the nonconductive material.
5. The cuvette of claim 4 , wherein the dielectric gap comprises a first thickness between about 1 mm and 5 mm.
6. The cuvette of claim 1 , wherein the second wall comprises a second capacitive element.
7. The cuvette of claim 1 , wherein the first wall comprises a dielectric element.
8. The cuvette of claim 7 , wherein the dielectric element comprises a ceramic dielectric or a plastic dielectric.
9. The cuvette of claim 1 , wherein the second wall comprises a conductive contact configured to couple the second electrode directly to the sample cavity.
10. The cuvette of claim 1 , comprising a label that comprises a tag associated with a capacitance of the capacitive element of the cuvette.
11. The cuvette of claim 1 , wherein the first wall is configured to receive a current from the pulse generating system, wherein the current flows through the capacitive element prior to the current reaching the first electrode.
12. The cuvette of claim 1 , wherein the first wall is configured to receive a current from the pulse generating system, wherein pulse generating system comprises the capacitive element configured to receive the current prior to the current reaching the first electrode.