Probe card for characterizing processes of submicron semiconductor device fabrication

1. A testing device for electrically probing a device-under-test (DUT) that includes two rows[s] of electrodes, the testing device comprising:

a backplane; and

an array of probes extending from the backplane, another array of probes extending from the backplane, wherein each probe included in the another array of probes corresponds to one of the probes included in the array of probes, such that when a first probe of the array of probes is in electrical contact with a first anode of a row of anodes, a first probe of the another array of probes is in electrical contact with a first cathode of a row of cathodes, wherein the two rows of electrodes of the DUT comprises a row of anodes and the DUT includes another row of electrodes comprising a row of cathodes corresponding to the row of anodes, wherein the first cathode corresponds to the first anode, such that the first probe of the array of probes, the first probe of the another array of probes, and the backplane completes a circuit of the DUT that is operable by a transmitted electrical signal, wherein each probe of the array of probes and the another array of probes fabricated from a semiconductor material and including:

a cantilever member with a proximate portion coupled to the backplane, wherein the cantilever member is electrically insulating and includes one or more electrically conductive traces: and

a probe tip that includes a surface and a non-metallic conductive material located on the surface, wherein the probe tip is positioned on a distal portion of the cantilever member,

wherein, each probe is configured to transmit the electrical signal between the backplane and the DUT, via the electrical signal passing through the non-metallic conductive material of the probe tip and a corresponding electrode of the row of electrodes, when the non-metallic conductive material located on the surface of the probe tip is in electrical and physical contact with the corresponding electrode[s], and wherein the electrical signal includes at least one of an electrical current or a voltage.

2. The testing device of claim 1 , wherein a spacing between adjacent probe tips of the array of probes and the another array of probes substantially matches a spacing of the row of anodes and the row of cathodes.

3. The testing device of claim 1 , wherein the cantilever member[s] of the probe[s] is an elastic member[s] such that, when the corresponding probe tip[s] are in electrical contact with the corresponding electrode[s] of the row of anodes and the row of cathodes, the cantilever member[s] reduce a compressive force applied to the corresponding probe tip[s] via an elastic deformation of the cantilever member[s] that deflects the distal portion[s] of the cantilever member[s] and the probe tip[s], with respect to the DUT.

4. The testing device of claim 1 , wherein the DUT includes a row light-emitting diodes (LEDs) and when each probe of the array of probes and the another array of probes is concurrently in electrical contact with the corresponding electrode of the row of anodes and the row of cathodes, each LED of the row of LEDS is enabled for electrically probing.

5. The testing device of claim 1 , wherein the backplane generates and receives separate electrical signals to each probe of the array of probes and the another array of probes.

6. A method for electrically probing a device-under-test (DUT) that includes two row[s] of electrodes, the method comprising:

positioning a testing device proximate to the DUT, wherein the testing device includes a backplane and an array of probes extending from the backplane, another array of probes extending from the backplane, wherein each probe included in the another array of probes corresponds to one of the probes included in the array of probes, such that when a first probe of the array of probes is in electrical contact with a first anode of a row of anodes, a first probe of the another array of probes is in electrical contact with a first cathode of a row of cathodes, wherein the two rows of electrodes of the DUT comprises a row of anodes and the DUT includes another row of electrodes comprising a row of cathodes corresponding to the row of anodes, wherein the first cathode corresponds to the first anode, such that the first probe of the array of probes, the first probe of the another array of probes, and the backplane completes a circuit of the DUT that is operable by a transmitted electrical signal, wherein each probe of the array of probes and the another array of probes is fabricated from a semiconductor material and including a cantilever member, with a proximate portion coupled to the backplane, wherein the cantilever member is electrically insulating and includes one or more electrically conductive traces, and a probe tip positioned on a distal portion of the cantilever member that includes a surface and a non-metallic conductive material located on the surface, the testing device positioned proximate to the DUT such that each probe tip of each probe of the array of probes is in electrical contact with a first anode of the row of anodes and the another array of probes is in electrical contact with a first cathode of the row of cathodes; and

transmitting one or more electrical signals between the backplane of the testing device and the DUT, via the corresponding electrode, the cantilever member of the probe[s], and the non-metallic conductive material of the probe tip[s], when the non-metallic conductive material located on the surface of the probe tip[s] is in physical contact with the two corresponding electrodes on a row of anodes and a row of cathodes and the one or more electrical signals includes at least one of an electrical current or a voltage.

7. The method of claim 6 , wherein the DUT includes a row of micro light-emitting diodes (uLEDS), each uLED of the row of uLEDs being in electrical contact with one anode of the row of anodes and one cathode of the row of cathodes, and wherein there is a one-to-one correspondence between each probe of the array of probes and the another array of probes and each uLED of the row of uLEDs.

8. The method of claim 6 , wherein positioning the testing device proximate to the DUT includes:

aligning the testing device with the DUT such that each of the probe tips of the array of probes and the another array of probes is above and aligned with a corresponding electrode of the row of anodes and the row of cathodes;

translating the testing device such that each of the probe tips is in electrical contact with the corresponding anode of the row of anodes and the corresponding cathode of the row of cathodes; and

in response to the one or more electrical signals transmitted between the backplane of the testing device and the DUT, determining one or more characteristics of circuits included in the DUT and associated with the row of anodes and the row of cathodes.

9. The method of claim 8 , wherein the DUT includes another row of electrodes and the method further comprises:

translating the testing device such that the electrical contact between each of the probe tips and the corresponding anode of the row of anodes and the corresponding cathode of the row of cathodes is terminated;

aligning the testing device with the DUT such that each of the probe tips of the array of probes is above and aligned with a different anode of the row of anodes and a different cathode of the row of cathodes;

translating the testing device such that each of the probe tips is in electrical contact with the corresponding different anode of the row of anodes and the different cathode of the row of cathodes;

transmitting additional electrical signals between the backplane and the DUT, via the electrical contact between the probe tips, the cantilever members, and the different anode of the row of anodes and the different cathode of the row of cathodes; and

in response to transmitting the additional electrical signals between the backplane and the DUT, determining one or more characteristics of additional circuits, included in the DUT and associated with the another row of electrodes.

10. The method of claim 6 , wherein each of the probes of the array of probes and the another array of probes is an atomic force microscopy (AFM) probe, and the probe tips are fabricated on the cantilever members such that an electrical conductivity and an elasticity of the probe tips are increased.

11. The method of claim 6 , wherein the array of probes and the another array of probes is configured such that the cantilever members extend from the backplane as parallel cantilever members.

12. The method of claim 6 , further comprising:

using the testing device to characterize a process of a semiconductor foundry.

13. The method of claim 6 , where a distance between adjacent probe tips is less than 10 microns.

14. A system for electrically probing a device-under-test (DUT) that includes two rows[s] of electrodes, the system comprising:

a backplane; and

an array of probes extending from the backplane, another array of probes extending from the backplane, wherein each probe included in the another array of probes corresponds to one of the probes included in the array of probes, such that when a first probe of the array of probes is in electrical contact with a first anode of a row of anodes, a first probe of the another array of probes is in electrical contact with a first cathode of a row of cathodes, wherein the two rows of electrodes of the DUT comprises a row of anodes and the DUT includes another row of electrodes comprising a row of cathodes corresponding to the row of anodes, wherein the first cathode corresponds to the first anode, such that the first probe of the array of probes, the first probe of the another array of probes, and the backplane completes a circuit of the DUT that is operable by a transmitted electrical signal, wherein each probe of the array of probes and the another array of probes is an atomic force microscopy (AFM) probe that is fabricated from a semiconductor material and including:

a cantilever member with a proximate portion coupled to the backplane, wherein the cantilever member is electrically insulating and includes one or more electrically conductive traces; and

a probe tip that includes a surface and a non-metallic conductive material located on the surface, and the probe tip is positioned on a distal portion of the cantilever member, wherein each probe is configured to transmit an electrical signal between the backplane and the DUT, via the electrical signal passing through the non-metallic conductive material of the probe tip and the corresponding electrode, when the non-metallic conductive material located on the surface of the probe tip is in electrical and physical contact with a corresponding anode of the row of anodes or a corresponding cathode of the row of cathodes, and wherein the electrical signal includes at least one of an electrical current or a voltage.

15. The system of claim 14 , wherein the another array of probes extends

from the backplane, where cantilever members of the another array of probes are substantially parallel to and in opposition with the cantilever members of the array of probes.

16. The system of claim 14 , wherein the backplane includes a multiplexer component that separately addresses each probe of the array of probes.

17. The system of claim 14 , wherein the backplane includes a plurality of drivers that drive separate electronic signals through each probe of the array of probes.

18. The system of claim 14 , wherein the semiconductor material includes silicon.

19. The system of claim 14 , wherein the probe tips are fabricated on the cantilever members and the non-metallic conductive material includes carbon compound nanoparticles.