Surface treatment for an implant surface
An implant system and a method of forming the implant system including an implant to be implanted into living bone. The implant includes titanium. The implant includes a first surface geometry on a first portion of a surface of the implant and a second surface geometry on a second portion of the surface of the implant. The first surface geometry includes at least a submicron topography including tube-like structures and the second surface geometry includes a first micro-scale topography, a second micro-scale topography superimposed on the first topography, and a submicron topography superimposed on the first and second micro-scale topographies, the submicron topography including the tube-like structures.
1. An implant system including an implant to be implanted into living bone, the implant being formed of a material comprising titanium, the implant comprising:
a first surface geometry on a first portion of a surface of the implant, the first surface geometry including:
a first submicron topography including tube structures; and
a second surface geometry on a second portion of the surface of the implant, the second surface geometry including:
a first micro-scale topography;
a second micro-scale topography superimposed on the first micro-scale topography, the second micro-scale topography being less coarse than the first micro-scale topography; and
a second submicron topography superimposed on the first and second micro-scale topographies, the second submicron topography including the tube structures.
2. The implant system of claim 1 , wherein the tube structures have heights in a range of about 200 nanometers to about 400 nanometers.
3. The implant system of claim 1 , wherein the tube structures have diameters in a range of about 10 to about 400 nanometers.
4. The implant system of claim 1 , wherein the tube structures are formed from titanium dioxide.
5. The implant system of claim 1 , wherein the first micro-scale topography includes peak-to-valley heights of about 1 microns to about 30 microns.
6. The implant system of claim 5 , wherein the first micro-scale topography includes peak-to-valley heights of about 10 microns to about 20 microns.
7. The implant system of claim 5 , wherein the second micro-scale topography includes peak-to-valley heights of less than about 10 microns and peak-to-peak distances of less than about 3 microns.
8. The implant system of claim 7 , wherein the first surface geometry on the first portion of the surface of the implant includes a third micro-scale topography, wherein the first submicron topography is superimposed on the third micro-scale topography.
9. The implant system of claim 8 , wherein third micro-scale topography includes peak-to-valley heights of less than about 10 microns and peak-to-peak distances of less than about 3 microns.
10. The implant system of claim 8 , wherein the first surface geometry on the first portion of the surface of the implant includes a fourth micro-scale topography, wherein the third micro-scale topography is superimposed on the fourth micro-scale topography.
11. The implant system of claim 10 , wherein the fourth micro-scale topography is less coarse than the first micro-scale topography.
12. The implant system of claim 1 , wherein the first surface geometry extends from a coronal end of the implant to an intermediate point.
13. The implant system of claim 1 , wherein the first surface geometry extends along about fifty percent or less of a length of the implant.
14. The implant system of claim 1 , wherein the second surface geometry extends from an intermediate point toward an apical end of the implant.
15. The implant system of claim 1 , wherein the implant system further includes:
a mating component configured to be coupled with the implant, the mating component including a third surface topography including one of:
a fourth submicron topography including the tube structures; and
a fifth micro-scale topography superimposed on fourth submicron topography.