Optical element fabrication with optical scanner feedback

1. A computer-implemented optical element fabrication method comprising:

initiating an optical scanner to obtain an optical measurement of an optical layer of a multi-layer film, wherein the multi-layer film comprises a liner layer adhered to the optical layer, and wherein the optical scanner is configured to generate a beam of light that is not incident upon the liner layer to obtain the optical measurement of the optical layer, wherein the liner layer comprises one or more cutouts to allow the beam of light to be incident upon the optical layer and not the liner layer;

determining a rotational orientation for an optical element to be cut from the multi-layer film based on the optical measurement; and

initiating a cutting instrument to cut the optical element from the multi-layer film at the rotational orientation.

2. The computer-implemented optical element fabrication method of claim 1 , wherein initiating the optical scanner to obtain the optical measurement includes determining whether the optical scanner is aligned with the one or more cutouts.

3. The computer-implemented optical element fabrication method of claim 1 , further comprising:

initiating the optical scanner to obtain an additional optical measurement at a subsequent location of the optical layer;

determining an adjusted rotational orientation for a subsequent optical element to be cut from the multi-layer film in response to the additional optical measurement; and

initiating the cutting instrument to cut the subsequent optical element from the multi-layer film at the adjusted rotational orientation.

4. The computer-implemented optical element fabrication method of claim 1 , further comprising:

determining an optical axis of the optical layer based on the optical measurement, wherein determining the rotational orientation is based on the optical axis.

5. The computer-implemented optical element fabrication method of claim 4 , wherein the optical axis is at least one of a polarization axis or a retardation axis of the optical layer.

6. The computer-implemented optical element fabrication method of claim 4 , wherein the optical axis of the optical layer is at a first angle with respect to a reference edge of the multi-layer film, and wherein the rotational orientation is determined such that an optical axis of the optical element is at a second angle with respect to a reference edge of the optical element, wherein the first angle is different from the second angle.

7. The computer-implemented optical element fabrication method of claim 1 , wherein the optical measurement comprises a Mueller matrix.

8. A computing device configured to support optical element fabrication, comprising:

at least one processor; and

at least one memory coupled to the at least one processor, the at least one memory having instructions stored therein, which when executed by the at least one processor, direct the computing device to:

initiate an optical scanner to obtain an optical measurement of an optical layer of a multi-layer film, wherein the multi-layer film comprises a liner layer adhered to the optical layer, wherein the liner layer comprises one or more cutouts;

determine whether the optical scanner is aligned with the one or more cutouts;

initiate the optical scanner to direct a beam of light through the one or more cutouts such that the beam of light is incident upon the optical layer and not the liner layer to obtain the optical measurement;

determine a rotational orientation for an optical element to be cut from the multi-layer film based on the optical measurement; and

initiate a cutting instrument to cut the optical element from the multi-layer film at the rotational orientation.

9. The computing device of claim 8 , wherein the at least one memory further comprises instructions to direct the computing device to:

initiate the optical scanner to obtain an additional optical measurement at a subsequent location of the optical layer;

determine an adjusted rotational orientation for a subsequent optical element to be cut from the multi-layer film in response to the additional optical measurement; and

initiate the cutting instrument to cut the subsequent optical element from the multi-layer film at the adjusted rotational orientation.

10. The computing device of claim 8 , wherein the at least one memory further comprises instructions to direct the computing device to:

determine an optical axis of the optical layer based on the optical measurement, wherein determining the rotational orientation is based on the optical axis.

11. The computing device of claim 10 , wherein the optical axis is at least one of a polarization axis or a retardation axis of the optical layer.

12. The computing device of claim 10 , wherein the optical measurement comprises a Mueller matrix.

13. An optical element fabrication system, comprising:

an optical scanner configured to obtain an optical measurement of an optical layer of a multi-layer film, wherein the multi-layer film comprises a liner layer adhered to the optical layer, the liner layer comprising one or more cutouts, and wherein the optical scanner is configured to direct a beam of light through the one or more cutouts such that the beam of light is incident upon the optical layer and not the liner layer to obtain the optical measurement;

a computing device communicatively coupled to the optical scanner to receive the optical measurement and to determine a rotational orientation for an optical element to be cut from the multi-layer film based on the optical measurement; and

a cutting instrument communicatively coupled to the computing device and configured to cut the optical element from the multi-layer film at the rotational orientation.

14. The optical element fabrication system of claim 13 , wherein the computing device is further configured to:

determine an optical axis of the optical layer based on the optical measurement, wherein the rotational orientation is determined based on the optical axis.

15. The optical element fabrication system of claim 14 , wherein the optical axis is at least one of a polarization axis or a retardation axis of the optical layer.

16. The optical element fabrication system of claim 14 , wherein the optical measurement comprises a Mueller matrix.