Semiconductor device manufacturing method and semiconductor device
A semiconductor device manufacturing method of an embodiment includes forming a first layer in a region of a first substrate excluding an outer peripheral portion thereof; forming a first semiconductor circuit above the first layer; forming a second semiconductor circuit on a second substrate; forming a second layer with a predetermined width at an outer peripheral portion of the second substrate; bonding a surface of the first substrate on a side provided with the first semiconductor circuit and a surface of the second substrate on a side provided with the second semiconductor circuit; and applying tensile stress to the first layer and the second layer to debond the first layer and the second layer, thereby forming the second substrate including the first semiconductor circuit and the second semiconductor circuit.
1. A semiconductor device manufacturing method comprising:
forming a first layer in a region of a first substrate excluding an outer peripheral portion thereof;
forming a first film including a first semiconductor circuit above the first layer;
forming a second film including a second semiconductor circuit on a second substrate different from the first substrate;
forming a second layer with a predetermined width on the second film at an outer peripheral portion of the second substrate;
bonding a surface of the first substrate on a side provided with the first semiconductor circuit and a surface of the second substrate on a side provided with the second semiconductor circuit; and
debonding the first layer and the second layer, thereby forming the second substrate including the first semiconductor circuit and the second semiconductor circuit.
2. The semiconductor device manufacturing method according to claim 1 , wherein
the first layer of the first substrate is formed at a predetermined depth of the first substrate.
3. The semiconductor device manufacturing method according to claim 2 , wherein
forming the first layer on the first substrate includes any of:
injecting an elemental ion to the predetermined depth of the first substrate,
irradiating the predetermined depth of the first substrate with a laser, and
oxidizing a region of the first substrate inside the outer peripheral portion thereof.
4. The semiconductor device manufacturing method according to claim 3 , wherein
the elemental ion injected to the first substrate is at least one of a hydrogen ion, an oxygen ion, an argon ion, or a helium ion, and
the laser with which the first substrate is irradiated is ultraviolet light.
5. The semiconductor device manufacturing method according to claim 3 , wherein
when the first substrate is irradiated with the laser, a laser pulsed with any pulse width of a picosecond, a nanosecond, and a femtosecond is irradiated.
6. The semiconductor device manufacturing method according to claim 1 , wherein
the first layer of the first substrate is formed at an intermediate layer arranged between the first substrate and the first film.
7. The semiconductor device manufacturing method according to claim 6 , wherein
forming the first layer on the first substrate includes any of:
injecting an elemental ion to the intermediate layer arranged on the first substrate, and
irradiating the intermediate layer arranged on the first substrate with a laser whose focal point is adjusted to the intermediate layer arranged on the first substrate.
8. The semiconductor device manufacturing method according to claim 7 , wherein
the elemental ion injected to the first substrate is at least one of a hydrogen ion, an oxygen ion, an argon ion, and a helium ion, and
the laser with which the intermediate layer arranged on first substrate is irradiated is ultraviolet light.
9. The semiconductor device manufacturing method according to claim 7 , wherein
when the intermediate layer arranged on the first substrate is irradiated with the laser, a laser pulsed with any pulse width of a picosecond, a nanosecond, and a femtosecond is irradiated.
10. The semiconductor device manufacturing method according to claim 1 , wherein
forming the second layer on the second film includes any of:
increasing a surface roughness of the second film at the outer peripheral portion of the second substrate,
forming a groove to the second film at the outer peripheral portion of the second substrate, and
forming a step to the second film at the outer peripheral portion of the second substrate to provide the outer peripheral portion lower than a bonded surface between the first substrate and the second film.
11. The semiconductor device manufacturing method according to claim 10 , wherein
the surface roughness is equal to or greater than 50 nm.
12. The semiconductor device manufacturing method according to claim 1 , wherein
a third layer not connected to the first layer is formed on the first film at the outer peripheral portion of the first substrate.
13. The semiconductor device manufacturing method according to claim 12 , wherein
forming the third layer on the first film includes any of:
increasing a surface roughness of the first film at the outer peripheral portion of the first substrate,
forming a groove to the first film at the outer peripheral portion of the first substrate, and
forming a step to the first film at the outer peripheral portion of the first substrate to provide the outer peripheral portion lower than a bonded surface between the first substrate and the second substrate.
14. The semiconductor device manufacturing method according to claim 13 , wherein
the surface roughness is equal to or greater than 50 nm.
15. The semiconductor device manufacturing method according to claim 1 , wherein
a blade is inserted between the first substrate and the second substrate, or
fluid is spayed between the first substrate and the second substrate to debond the first layer and the second layer.
16. The semiconductor device manufacturing method according to claim 1 , wherein at least one of the first and second substrates is a whole wafer.
17. A semiconductor device manufacturing method comprising:
forming a first layer in a region of a first substrate excluding an outer peripheral portion thereof;
forming a first semiconductor circuit above the first layer;
forming a second semiconductor circuit on a second substrate different from the first substrate;
forming a second layer with a predetermined width at an outer peripheral portion of the second substrate;
bonding a surface of the first substrate on a side provided with the first semiconductor circuit and a surface of the second substrate on a side provided with the second semiconductor circuit; and
debonding the first layer and the second layer, thereby forming the second substrate including the first semiconductor circuit and the second semiconductor circuit, wherein
forming the second layer on the second substrate includes any of:
increasing a surface roughness of the outer peripheral portion of the second substrate,
forming a groove at the outer peripheral portion of the second substrate, and
forming a step at the outer peripheral portion of the second substrate to provide the outer peripheral portion lower than a bonded surface between the first substrate and the second substrate.
18. A semiconductor device manufacturing method comprising:
forming a first layer in a region of a first substrate excluding an outer peripheral portion thereof;
forming a first semiconductor circuit above the first layer,
forming a third layer not connected to the first layer at the outer peripheral portion of the first substrate;
forming a second semiconductor circuit on a second substrate different from the first substrate;
forming a second layer with a predetermined width at an outer peripheral portion of the second substrate;
bonding a surface of the first substrate on a side provided with the first semiconductor circuit and a surface of the second substrate on a side provided with the second semiconductor circuit; and
debonding the first layer and the second layer, thereby forming the second substrate including the first semiconductor circuit and the second semiconductor circuit.