IP Library Granted Patent US 11,069,850
Granted Patent B2
US 11,069,850 · App. 16/568,050 · Granted Jul 20, 2021

Magnetic memory device and manufacturing method of the same

Inventor: Yoshinori Kumura (Seoul, KR)
Assignee: TOSHIBA MEMORY CORPORATION
H01L43/02H01F10/329H01L27/224H01L27/228H01L43/12H01F10/3231H01F10/3295
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,069,850
App. No.
16/568,050
Granted
Jul 20, 2021
Kind
B2
Abstract

According to one embodiment, a magnetic memory device includes a stacked structure including a first magnetic layer having a fixed magnetization direction, a nonmagnetic layer provided on the first magnetic layer, and a second magnetic layer provided on the nonmagnetic layer and having a variable magnetization direction, a first insulating layer provided along a side surface of the stacked structure and having an upper end located at a position lower than an upper end of the side surface of the stacked structure, and a second insulating layer covering the first insulating layer and having an upper end located at a position higher than the upper end of the first insulating layer.

Claims (9)

1. A magnetic memory device comprising:

a stacked structure including a first magnetic layer having a fixed magnetization direction, a nonmagnetic layer provided on the first magnetic layer, and a second magnetic layer provided on the nonmagnetic layer and having a variable magnetization direction;

a first insulating layer provided along a side surface of the stacked structure, an upper end of the first insulating layer being located at a position lower than an upper end of a side surface of the second magnetic layer; and

a second insulating layer covering the first insulating layer, an upper end of the second insulating layer being located at a position higher than the upper end of the first insulating layer.

2. The device of claim 1 , wherein the second magnetic layer includes a first magnetic material part formed of a magnetic material, a nonmagnetic material part provided on the first magnetic material part and formed of a nonmagnetic material, and a second magnetic material part provided on the nonmagnetic material part and formed of a magnetic material.

3. The device of claim 2 , wherein the second magnetic material part is thicker than the first magnetic material part.

4. The device of claim 2 , wherein a thickness of the second magnetic material part is at least ten times as large as a thickness of the first magnetic material part.

5. The device of claim 1 , wherein the first magnetic layer has perpendicular magnetization, and the second magnetic layer has perpendicular magnetization.

6. The device of claim 1 , wherein the stacked structure forms a spin transfer torque (STT) magnetoresistive element.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Jan 31, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 058905/0582 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 27, 2019
From: KUMURA, YOSHINORI
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 051139/0926 →