Method for preparing a conductive, transparent and flexible membrane
The technique relates to a method for preparing a nanomesh metal membrane 5 transferable on a very wide variety of supports of different types and shapes comprising at least one step of de-alloying 1 a thin layer 6 of a metal alloy deposited on a substrate 7 , said method being characterized in that said thin layer 6 has a thickness less than 100 nm, and in that said de-alloying step 1 is carried out by exposing said thin layer 6 to an acid vapor in the gas phase 8 , in order to form said nanomesh metal membrane 5.
1. A preparation method for a continuous nanomesh metal membrane comprising a nanostructure comprising a network of nanomesh metal domains in the form of interconnected metallic nanoligaments, the nanomesh metal domains each having a size less than 10,000 square micrometers, and having a thickness between 1 and 80 nm, said method comprising:
de-alloying a thin layer of a metal alloy deposited on a substrate, wherein said thin layer has a thickness between 1 and 80 nm, wherein said de-alloying step is carried out by exposing said thin layer to an acid vapor in order to form a nanomesh metal membrane, and wherein said metal alloy comprises at least a first metal element contributing to the composition of said membrane, and at least one second metal element to be etched chemically on said substrate,
detaching said nanomesh membrane from said substrate by immersion in a detaching solution, and
subsequently transferring said nanomesh membrane on an object by immersion of a surface portion of said object in said detaching solution causing the percolation of nanomesh domains, thus forming said continuous nanomesh metal membrane.
2. The preparation method according to claim 1 , wherein the standard redox potential of said first metal element with an acid being greater than the standard redox potential of the at least one second metal element with an acid, the atomic concentration of said second metal element in said thin metal alloy layer being greater than a predetermined threshold below which the chemical etching of said at least one second metal element on said substrate is reduced.
3. The preparation method according to claim 1 , wherein said metal alloy comprises a plurality of first metal elements contributing to the composition of said nanomesh metal membrane.
4. The preparation method according to claim 1 , comprising a step of depositing said thin metal alloy layer on said substrate implemented by cathodic magnetron sputtering, cathodic sputtering of an alloy, evaporation, co-evaporation, chemical vapor deposition or laser ablation.
5. A method of conducting electricity comprising coating an object with a continuous nanomesh metal membrane of claim 1 , wherein the nanomesh metal membrane is a transparent coating.
6. A method of detecting cracks or tears on a surface comprising coating the surface with a continuous nanomesh metal membrane of claim 1 .
7. The preparation method according to claim 1 , wherein said thin layer has a thickness between 3 and 50 nm.
8. The preparation method according to claim 1 , wherein said thin layer has a thickness between 5 and 20 nm.
9. The preparation method according to claim 1 , wherein the nanomesh metal membrane is a transparent coating.
10. The preparation method according to claim 1 , wherein the surface of the object is flat, developable or non-developable left as is; or the surface of the object has planar, non-planar, developable and/or non-developable left as is portions.
11. The preparation method according to claim 10 , wherein the object is a cylinder, a cone, a sphere or an ellipsoid.
12. The preparation method according to claim 10 , wherein the surface of the object is that of a bottle or a tube.
13. The preparation method according to claim 12 , wherein the bottle or tube comprises glass or a polymer.