Method for manufacturing perovskite silicon tandem solar cell
The present disclosure relates to a method for manufacturing a monolithic tandem solar cell in which a perovskite solar cell is laminated and bonded on a silicon solar cell. According to the present disclosure, a first microporous precursor thin film is formed through a sputtering method on a substrate having an unevenly structured texture and then a halide thin film is formed on the first microporous precursor thin film to form a perovskite absorption layer, whereby light reflectance can be reduced and a path of light can be increased, and accordingly a light absorption rate can be increased.
1. A method of manufacturing a perovskite/silicon tandem solar cell, the method comprising:
performing a RF (radio frequency) sputtering process of forming a microporous first precursor thin film on a substrate including a texture structure; and
performing a process of forming a halide thin film on the microporous first precursor thin film,
wherein the microporous first precursor thin film has a BX 2 structure, and
wherein B includes one or more among Pb 2+ , Sn 2+ , Cu 2+ , Ca 2+ , Sr 2+ , Cd 2+ , Ni 2+ , Mn 2+ , Fe 2+ ,Co 2+ , Pd 2+ , Ge 2+ , Yb 2+ , and Eu 2+ , and X includes one or more among F−, Cl−, Br−, and I−.
2. The method of claim 1 , wherein the microporous first precursor thin film has a porosity of 10% to 50% by volume.
3. The method of claim 1 , wherein the halide thin film includes an organic halide.
4. The method of claim 1 , wherein the halide thin film has an AX structure, wherein A consists of one or more among a monovalent C1-C20 alkyl group, an alkyl group substituted with an amine group, an organic amidinium, and an alkali metal, and X consists of one or more among F−, Cl−, Br−, and I−.
5. The method of claim 1 , wherein the performing of the process of forming the halide thin film includes performing any one method among a thermal evaporation method, a sputtering method, a spin coating method, a dip coating method, a chemical vapor deposition method, and a spraying method.
6. The method of claim 1 further comprising performing a post-thermal process after the performing of the process of forming the halide thin film.
7. The method of claim 6 , wherein the post-thermal process is carried out at a temperature of 25° C. to 200° C. for at most three hours.
8. The method of claim 6 , wherein a thin film formed by the post-thermal process has a thickness of 50 nm to 10 μm.
9. The method of claim 1 , wherein the RF sputtering process sputters a BX 2 compound of the BX 2 structure as a target material.
10. The method of claim 1 , wherein the substrate is a monocrystalline silicon substrate, and
wherein the texture structure is formed of pyramidal irregularities.
11. The method of claim 1 , wherein the performing of the RE sputtering process transfers a contour of the textured structure of the substrate to the microporous first precursor thin film.
12. The method of claim 1 , wherein the BX 2 structure is formed entirely by the RE sputtering process.