IP Library Granted Patent US 11,129,267
Granted Patent B2
US 11,129,267 · App. 16/619,269 · Granted Sep 21, 2021

Active gas generation apparatus

Inventors: Kensuke Watanabe (Tokyo, JP); Ren Arita (Tokyo, JP)
Assignee: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
H05H1/2406H01J37/32348H01J37/32568H05H1/2443
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Quick Facts
Patent No.
US 11,129,267
App. No.
16/619,269
Granted
Sep 21, 2021
Kind
B2
Abstract

A gas passing groove, a high-voltage electrode groove, and a ground electrode groove provided to an electrode unit base are each helical in plan view. An electrode unit lid is placed on a front surface of the electrode unit base so that a high-voltage conduction hole and a high-voltage conduction point coincide with each other in plan view. An electrode cooling plate is placed on a front surface of the electrode unit lid so that a high-voltage opening includes the high-voltage conduction hole as a whole in plan view. The electrode unit lid and the electrode cooling plate are placed on the front surface of the electrode unit base so that a ground conduction groove, a ground conduction hole, and a ground conduction point coincide with one another in plan view.

Claims (25)

1. An active gas generation apparatus generating an active gas by activating a source gas supplied to a discharge space in which a dielectric barrier discharge occurs, the active gas generation apparatus comprising:

an electrode unit base including a first electrode and a second electrode, and externally receiving an AC voltage;

an electrode unit lid located on a front surface of said electrode unit base;

an electrode pressing plate located on a front surface of said electrode unit lid, said electrode pressing plate pressing said electrode unit lid with a pressing force applied from above said electrode pressing plate; and

an apparatus housing containing said electrode unit base, said electrode unit lid, and said electrode pressing plate, wherein

said electrode unit base includes:

a first electrode groove and a second electrode groove each having a predetermined formation depth from the front surface of said electrode unit base;

said first electrode and said second electrode embedded respectively in said first electrode groove and said second electrode groove, said first electrode and said second electrode each having conductivity; and

an internal gas flow path located in said electrode unit base, and allowing the source gas to pass therethrough, said internal gas flow path being disposed to be helical in plan view, said first electrode and said second electrode each being disposed to be helical in plan view along with said internal gas flow path,

said first electrode and said second electrode respectively have a first conduction point and a second conduction point at ends thereof,

said first electrode and said second electrode are arranged on opposite sides of said internal gas flow path to oppose each other with a part of said electrode unit base and said internal gas flow path therebetween, a region in said internal gas flow path between said first electrode and said second electrode being said discharge space, the dielectric barrier discharge occurring in said discharge space upon reception of said AC voltage,

said electrode unit base further includes at least one gas jet located below said discharge space to communicate with said internal gas flow path, the active gas acquired by activating the source gas supplied to said discharge space being jetted from said at least one gas jet,

said electrode unit lid has a gas relay hole leading to said internal gas flow path in said electrode unit base, and a first through hole and a second through hole located respectively in a region coinciding with said first conduction point and a region coinciding with said second conduction point in plan view, and

said electrode pressing plate has an opening including said first through hole in plan view and having a wider shape than said first through hole, and a gas supply hole located in a region coinciding with said gas relay hole in plan view, and said electrode pressing plate is electrically connected to said second conduction point through said second through hole.

2. The active gas generation apparatus according to claim 1 , wherein

said second electrode is set to ground level, and said AC voltage is applied to said first electrode, and

said first electrode and said second electrode are arranged so that said second electrode is located on an outermost periphery of said electrode unit base in plan view.

3. The active gas generation apparatus according to claim 2 , further comprising

a cooling medium circulation mechanism supporting said electrode unit base from a side of a rear surface, and circulating a cooling medium in said electrode pressing plate, wherein

said electrode pressing plate has a cooling function to cool said electrode unit base from a side of said electrode unit lid.

4. The active gas generation apparatus according to claim 3 , wherein

said electrode unit base, said electrode unit lid, said electrode pressing plate, and said cooling medium circulation mechanism are integrally joined together.

5. The active gas generation apparatus according to claim 2 , further comprising

an AC voltage supply terminal attached to a top portion of said apparatus housing and supplying said AC voltage, wherein

said AC voltage supply terminal is electrically connected to said first conduction point through said opening and said first through hole.

Assignments (2)
CHANGE OF NAME Recorded Apr 26, 2024
From: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
To: TMEIC CORPORATION
Reel/Frame 067244/0359 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 4, 2019
From: WATANABE, KENSUKE; ARITA, REN
To: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
Reel/Frame 051176/0398 →
Continuity (1)
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