IP Library Granted Patent US 11,554,539
Granted Patent B2
US 11,554,539 · App. 16/627,955 · Granted Jan 17, 2023

Photocurable composition for three-dimensional stereolithography and three-dimensional object

Inventors: Christophe Provin (Kawasaki, JP); Akiko Miyakawa (Sagamihara, JP)
Assignees: NIKON CORPORATION; ESSILOR INTERNATIONAL
B29C64/129B33Y70/00B33Y80/00G03F7/0037
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Quick Facts
Patent No.
US 11,554,539
App. No.
16/627,955
Granted
Jan 17, 2023
Kind
B2
Abstract

A photocurable composition for three-dimensional stereolithography which has a lower viscosity and from which a cured product having a high refractive index is obtained, and a three-dimensional object formed by using the composition. The composition is a photocurable composition for three-dimensional stereolithography containing a fluorene monomer, a carbazole monomer, a diluent monomer, and a photopolymerization initiator, the carbazole monomer being contained in an amount of less than 30 wt % with respect to the total amount of the fluorene monomer and the carbazole monomer, and the diluent monomer being contained in an amount of at least 20 wt % with respect to total solids.

Claims (29)

1. A photocurable composition for three-dimensional stereolithography comprising:

a fluorene monomer;

a carbazole monomer;

a diluent monomer; and

a photopolymerization initiator,

wherein the carbazole monomer is contained in an amount in a range of 5 to 25 wt % with respect to a total amount of the fluorene monomer and the carbazole monomer, and

the diluent monomer is contained in an amount of at least 20 wt % with respect to total solids.

2. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the fluorene monomer and the carbazole monomer are contained in a total amount of 30-80 wt % with respect to total monomers.

3. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the diluent monomer has a refractive index of at least 1.47.

4. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the diluent monomer has a viscosity of up to 500 mPa·s.

5. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the diluent monomer contains:

a compound (1) as a compound represented by formula (D1) provided that no substituent is included, and

a compound (2) as a compound represented by formula (D1) provided that a hydroxy group is included as a substituent,

with formula (D1) being:

W-L-P (D1)

where, in formula (D1), W represents an alicyclic hydrocarbon group or an aromatic hydrocarbon group, provided that fluorenyl group is not included, L represents a single bond or a divalent linking group, P represents a polymerizable group, and W, L, and P may each have a substituent.

6. The photocurable composition for three-dimensional stereolithography according to claim 1 , having a viscosity of up to 900 mPa·s.

7. The photocurable composition for three-dimensional stereolithography according to claim 1 , having, when cured, a transmittance of at least 85%.

8. A three-dimensional object formed by using the photocurable composition for three-dimensional stereolithography according to claim 7 .

9. The three-dimensional object according to claim 8 , being an optical element.

10. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the carbazole monomer is contained in an amount in a range of 10 to 25 wt % with respect to the total amount of the fluorene monomer and the carbazole monomer.

11. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the carbazole monomer is contained in an amount in a range of 15 to 25 wt % with respect to the total amount of the fluorene monomer and the carbazole monomer.

12. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the carbazole monomer is contained in an amount in a range of 5 to 15 wt % with respect to the total amount of the fluorene monomer and the carbazole monomer.

13. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the diluent monomer is contained in an amount in a range of 20 to 90 wt % with respect to total solids.

14. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the diluent monomer is contained in an amount in a range of 20 to 80 wt % with respect to total solids.

15. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the diluent monomer is contained in an amount in a range of 40 to 70 wt % with respect to total solids.

16. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the diluent monomer is contained in an amount in a range of 44 to 60 wt % with respect to total solids.

17. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the carbazole monomer includes at least one polymerizable group.

18. The photocurable composition for three-dimensional stereolithography according to claim 1 , wherein the total solids includes all ingredients excluding solvents other than an alcohol used as an anti-yellowing agent.

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE FIRST ASSIGNEE'S ADDRESS PREVIOUSLY RECORDED ON REEL 051457 FRAME 0340. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Jan 31, 2020
From: PROVIN, CHRISTOPHE; MIYAKAWA, AKIKO
To: NIKON CORPORATION; ESSILOR INTERNATIONAL
Reel/Frame 051765/0383 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 31, 2019
From: PROVIN, CHRISTOPHE; MIYAKAWA, AKIKO
To: NIKON CORPORATION; ESSILOR INTERNATIONAL
Reel/Frame 051457/0340 →
Continuity (1)
Related Publication 20200180214A1 · Jun 11, 2020
Cited By (1)
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