SUBSTRATE MOUNT
A substrate mount for a plasma processing apparatus comprising: a frame; an aperture within the frame, configured to accommodate an insert, the insert being configured to support a substrate for processing by the plasma processing apparatus; a releasable securing mechanism configured to releasably secure the insert within the aperture such that the insert can be replaced.
1 . A substrate mount for a plasma processing apparatus comprising:
a frame;
an aperture within the frame, configured to accommodate an insert, the insert being configured to support a substrate for processing by the plasma processing apparatus;
a releasable securing mechanism configured to releasably secure the insert within the aperture such that the insert can be replaced.
2 . The substrate mount of claim 1 , wherein the frame is formed from a single part.
3 . The substrate mount of claim 1 wherein the frame comprises first and second frame parts, the first and second frame parts being configured to sandwich the insert therebetween.
4 . The substrate mount of claim 3 , wherein the releasable securing mechanism is configured to releasably secure the first frame part to the second frame part.
5 . The substrate mount according to claim 1 , wherein the releasable securing mechanism is configured to releasably secure the insert to the frame.
6 . The substrate mount of claim 1 wherein the securing mechanism comprises a spring element configured to provide a securing force.
7 . The substrate mount of claim 6 , wherein the securing mechanism comprises an abutment member configured to apply the securing force therethrough.
8 . The substrate mount of claim 7 , wherein the abutment member is also the spring element.
9 . The substrate mount of claim 7 , wherein the spring element is separate from but connected to the abutment member.
10 . (canceled)
11 . The substrate mount of claim 1 , wherein the releasable securing mechanism is selectably configurable between a first arrangement configured to secure the insert and a second arrangement configured not to secure the insert.
12 . The substrate mount of claim 11 , wherein the releasable securing mechanism is configured to rotate between the first arrangement and the second arrangement.
13 . The substrate mount of claim 11 , wherein the releasable securing mechanism is configured to slide linearly between the first arrangement and the second arrangement.
14 . (canceled)
15 . (canceled)
16 . (canceled)
17 . (canceled)
18 . The substrate mount of claim 1 further comprising an insert comprising an aperture for accommodating the substrate.
19 . The substrate mount of claim 18 , comprising a first insert part and a second insert part, the first and second insert parts being configured to sandwich the substrate therebetween.
20 . The substrate mount of claim 19 , comprising an alignment member configured to align the first and second insert parts and, optionally, the substrate.
21 . The substrate mount of claim 20 , wherein the alignment member is a rod configured to pass through through-holes in each of the first and second insert parts and, optionally, the substrate.
22 . The substrate mount of claim 18 , comprising a mask formed from a first material and configured to support the substrate such that a portion of the substrate is masked so as not to be processed by the plasma processing apparatus.
23 . The substrate mount of claim 22 , wherein the first material is a flexible material.
24 . The substrate mount of claim 18 , further comprising an insert frame formed from a second material and configured to support the mask.
25 . The substrate mount of claim 24 , wherein the second material is a rigid material.
26 . (canceled)
27 . (canceled)
28 . (canceled)