Laser diode
A laser diode having a semiconductor layer sequence based on a nitride compound semiconductor material includes an n-type cladding layer, a first waveguide layer, a second waveguide layer and an active layer, and a p-type cladding layer including a first partial layer and a second partial layer, wherein the first partial layer includes Al x1 Ga 1-x1 N with 0≤x1≤1 or Al x1 In y1 Ga 1-x1-y1 N with 0≤x1≤1, 0≤y1<1 and x1+y1≤1, the aluminum content x1 decreases in a direction pointing away from the active layer so that the aluminum content has a maximum value x1 max and a minimum value x1 min <x1 max , and the second partial layer includes Al x2 Ga 1-x2 N with 0≤x2≤x1 min or Al x2 In y2 Ga 1-x2-y2 N with 0≤x2≤x1 min , 0≤y2<1 and x2+y2≤1.
1. A laser diode having a semiconductor layer sequence based on a nitride compound semiconductor material, comprising
an n-type cladding layer,
a first waveguide layer, a second waveguide layer and an active layer that generates laser radiation disposed between the first waveguide layer and the second waveguide layer, and
a p-type cladding layer comprising a first partial layer facing the active layer and a second partial layer facing away from the active layer, wherein
the first partial layer comprises Al x1 Ga 1-x1 N with 0≤x1≤1 or Al x1 In y1 Ga 1-x1-y1 N with 0≤x1≤1, 0≤y1<1 and x1+y1≤1,
the aluminum content x1 decreases in a direction pointing away from the active layer so that the aluminum content has a maximum value x1 max on a side facing the active layer and a minimum value x1 min <x1 max on a side remote from the active layer, and
the second partial layer comprises Al x2 Ga 1-x2 N with 0≤x2≤x1 min or Al x2 In y2 Ga 1-x2-y2 N with 0≤x2≤x1 min , 0≤y2<1 and x2+y2≤1.
2. The laser diode according to claim 1 , wherein the first partial layer has an aluminum content of 0.05≤x1 max ≤0.35 on a side facing the active layer.
3. The laser diode according to claim 1 , wherein the first partial layer has an aluminum content of 0.08≤x1 max ≤0.25 on a side facing the active layer.
4. The laser diode according to claim 1 , wherein the first partial layer has an aluminum content of 0.12≤x1 max ≤0.20 on a side facing the active layer.
5. The laser diode according to claim 1 , wherein the first partial layer has an aluminum content of 0≤x1 min ≤0.30 on a side remote from the active layer.
6. The laser diode according to claim 1 , wherein the first partial layer has an aluminum content of 0.03≤x1 min ≤0.15 on a side remote from the active layer.
7. The laser diode according to claim 1 , wherein the first partial layer has an aluminum content of 0.05≤x1 min ≤0.10 on a side remote from the active layer.
8. The laser diode according to claim 1 , wherein the second partial layer comprises Al x2 Ga 1-x2 N with 0≤x2≤0.1.
9. The laser diode according to claim 1 , wherein the second partial layer comprises GaN.
10. The laser diode according to claim 1 , wherein the first partial layer is less than 300 nm thick.
11. The laser diode according to claim 1 , wherein a transparent conductive oxide layer is disposed on a side of the p-type cladding layer remote from the active layer.
12. The laser diode according to claim 1 , wherein an electron barrier layer is disposed between the second waveguide layer and the p-type cladding layer, the electron barrier layer comprises Al z Ga 1-z N, and the aluminum content z is greater than the aluminum content x1 max of the first partial layer on a side facing the electron barrier layer.
13. The laser diode according to claim 1 , wherein at least the first waveguide layer or the second waveguide layer comprises In y Ga 1-y N with 0.005≤y≤0.1.
14. The laser diode according to claim 1 , wherein at least the first waveguide layer or the second waveguide layer comprises In y Ga 1-y N with 0.02≤y≤0.07.
15. The laser diode according to claim 1 , wherein at least the first waveguide layer or the second waveguide layer comprises In y Ga 1-y N with 0.03≤y≤0.05.
16. The laser diode according to claim 1 , wherein the dopant concentration in the second partial layer is higher or rises to a higher value at least in some areas than in the first partial layer.
17. The laser diode according to claim 1 , wherein the first partial layer is less than 100 nm thick and the second partial layer is a GaN layer.
18. A laser diode having a semiconductor layer sequence based on a nitride compound semiconductor material, comprising
an n-type cladding layer,
a first waveguide layer, a second waveguide layer and an active layer that generates laser radiation disposed between the first waveguide layer and the second waveguide layer, and
a p-type cladding layer comprising a first partial layer facing the active layer and a second partial layer facing away from the active layer, wherein
the first partial layer comprises Al x1 Ga 1-x1 N with 0≤x1≤1 or Al x1 In y1 Ga 1-x1-y1 N with 0≤x1≤1, 0≤y1<1 and x1+y≤1,
the aluminum content x1 decreases in a direction pointing away from the active layer so that the aluminum content has a maximum value x1 max on a side facing the active layer and a minimum value x1 min ≤X1 max on a side remote from the active layer,
the second partial layer comprises Al x2 Ga 1-x2 N with 0≤x2≤x1 min or Al x2 In y2 Ga 1-x2-y2 N with 0≤x2≤x1 min , 0≤y2<1 and x2+y2≤1, and
the dopant concentration in the second partial layer is higher or rises to a higher value at least in some areas than in the first partial layer.