Atomic layer polishing method and device therefor
An atomic layer polishing method is described. The method includes: scanning the surface of a specimen to measure a peak site on the specimen surface; spraying toward the measured peak site a gas containing an element capable of binding to a first atom, which is an ingredient of the material of the specimen to form a first reaction gas layer in which the first reaction gas binds to the first atom on the surface of the peak; and projecting ions of inert gas to the peak site on which the first reaction gas layer is deposited to separate the first atom bound to the first reaction gas from the specimen.
1. An atomic layer polishing method comprising:
scanning a surface of a specimen to determine a peak position of the specimen surface;
removing a first atomic layer from the surface of the specimen, wherein removal of the first atomic layer comprises:
spraying a first reactive gas toward the determined peak position such that a first reactive gas layer is formed in a surface of the peak, wherein the first reactive gas is capable of bonding to a first atom as a component of the specimen, wherein the first reactive gas bonds to the first atom to form the first reactive gas layer;
applying energy to the peak position where the first reactive gas layer is deposited, thereby separating the first atom bonded to the first reactive gas from the specimen;
removing a second atomic layer from the surface of the specimen, wherein removal of the second atomic layer comprises:
spraying a second reactive gas toward the determined peak position such that a second reactive gas layer is formed in a surface of the peak, wherein the second reactive gas is capable of bonding to a second atom as a component of the specimen, wherein the second reactive gas bonds to the second atom to form the second reactive gas layer, wherein the second reactive gas has a higher bonding ability to the second atom than to other atoms than the second atom; and
applying energy to the peak position where the second reactive gas layer is deposited, thereby separating the second atom bonded to the second reactive gas from the specimen,
wherein the first and second atoms are different.
2. The method of claim 1 , wherein the method further comprises repeating separation of the second atom from the first reactive gas layer to increase a smoothness of the surface of the specimen.
3. The method of claim 1 , wherein the method further comprises,
between separating the first atom and forming the second reactive gas layer, removing the first reactive gas layer remaining on the specimen.
4. The method of claim 2 , wherein the method further comprises:
between separating the first atom and forming the second reactive gas layer, removing the first reactive gas layer remaining on the specimen; and
between separating the second atom and forming the first reactive gas layer, removing the second reactive gas layer remaining on the specimen.
5. The method of claim 3 , wherein removing the first and/or second reactive gas layer includes irradiating plasma of a gas capable of reacting with the first and/or second reactive gas.
6. The method of claim 1 , wherein the first and second reactive gases bond to the first and second atoms, respectively to form a volatile gas.
7. The method of claim 1 , wherein applying the energy includes irradiating ions of an inert gas.
8. The method of claim 7 , wherein the irradiation of the ions of the inert gas is carried out at an energy level controlled such that sputtering does not occur.
9. The method of claim 8 , wherein the energy level is in a range of 1 to 100 eV.
10. The method of claim 7 , wherein the inert gas is selected from argon, helium and xenon.
11. The method of claim 1 , wherein applying the energy includes irradiating electrons.
12. The method of claim 1 , wherein applying the energy includes irradiating light energy.
13. The method of claim 1 , wherein applying the energy includes irradiating neutral particles of an inert gas.
14. The method of claim 1 , wherein the method further comprises, after the formation of the first and/or second reactive gas layer, exhausting the chamber such that only the first and/or second reactive gas bonded to the first and/or second atoms of the specimen respectively remains.
15. A silicon carbide planarization method using the atomic layer polishing method of claim 1 , wherein the specimen is made of silicon carbide, wherein the first reactive gas contains fluorine, wherein the second reactive gas contains oxygen.
16. The silicon carbide planarization method of claim 15 , wherein the first reactive gas containing fluorine is first sprayed, and, then, the second reactive gas containing oxygen is sprayed.