Color filter substrate and method of manufacturing the same, and display device

1. A method of manufacturing a color filter substrate, comprising:

providing a base substrate;

forming a black matrix on the base substrate, the black matrix comprising a plurality of openings and a bank surrounding each opening;

forming a color filter layer in the plurality of openings;

forming a first planarization layer covering the color filter layer so that the bank protrudes relative to the first planarization layer in a direction away from the base substrate;

forming a second planarization layer covering both the first planarization layer and the bank, the second planarization layer comprising a first surface distal to the base substrate; and

forming a grating layer on the second planarization layer,

wherein the first surface of the second planarization layer comprises a first portion and a second portion, an orthographic projection of the first portion on the base substrate at least partially overlaps with an orthographic projection of the plurality of openings on the base substrate, an orthographic projection of the second portion on the base substrate at least partially overlaps with an orthographic projection of the bank on the base substrate, and a vertical distance between the first portion and a surface of the base substrate close to the second planarization layer is greater than a vertical distance between the second portion and the surface of the base substrate close to the second planarization layer, and

wherein the forming the second planarization layer comprises:

coating a liquid film-forming material; and

curing the liquid film-forming material to form the second planarization layer covering both the first planarization layer and the bank,

wherein a contact angle between the liquid film-forming material and the bank is greater than a contact angle between the liquid film-forming material and the first planarization layer.

2. The method according to claim 1 , further comprising: before forming the second planarization layer, performing a lyophilic treatment on the first planarization layer and/or performing a lyophobic treatment on the bank.

3. The method according to claim 1 , further comprising: performing an ashing treatment on the first planarization layer and the bank before forming the second planarization layer.

4. The method according to claim 1 , wherein the forming the color filter layer comprises: forming a red color filter layer, a green color filter layer, and a blue color filter layer, and

the method further comprises: forming a red quantum dot material layer on a side of the red color filter layer distal to the base substrate; and forming a green quantum dot material layer on a side of the green color filter layer distal to the base substrate.

5. The method according to claim 1 , wherein the forming the grating layer comprises:

forming an aluminum foil layer on a side of the second planarization layer distal to the base substrate;

forming a hard mask layer on a side of the aluminum foil layer distal to the base substrate;

performing a nano-imprint lithography on the hard mask layer; and

etching the aluminum foil layer to form the grating layer.