Polarization-adjusted beam operation for materials processing
Systems and techniques for optimizing the operation of a beam emitter during material processing maintain an optimal polarization of the beam with respect to the material throughout processing—e.g., even as the beam path varies or the nature or thickness of the material changes.
1. A system for processing a workpiece along a path extending across at least a portion of a surface of the workpiece, the system comprising:
a beam emitter;
a positioning device for varying a position, of a beam of the beam emitter, at which the beam is emitted onto a surface of the workpiece;
a variable polarizer for varying a polarization of the beam; and
a controller, coupled to the positioning device and the polarizer, for (i) operating the beam emitter to cause the beam to traverse the path for processing of the workpiece, and (ii) maintaining a consistent polarization of the beam with respect to the workpiece along the path, the controller being configured to alter the polarization of the beam at one or more points along the path at which a direction of the path across the surface of the workpiece changes.
2. The system of claim 1 , wherein the path is curvilinear.
3. The system of claim 1 , wherein the variable polarizer comprises a wave plate and a rotation element, the rotation element being operated by the controller.
4. The system of claim 3 , wherein the wave plate is a half-wave plate.
5. The system of claim 3 , wherein the wave plate is a quarter-wave plate.
6. The system of claim 3 , wherein the beam is linearly polarized and the controller operates the rotation element to maintain a polarization direction parallel to the path.
7. The system of claim 1 , wherein the beam is linearly polarized and the controller is configured to maintain a polarization direction of the beam parallel to the path.
8. The system of claim 1 , further comprising:
a memory, accessible to the controller, for storing data corresponding to the path; and
a database for storing polarization data for a plurality of materials,
wherein the controller is configured to query the database to obtain the polarization data for a material of the workpiece, the polarization data determining the consistent polarization of the beam.
9. The system of claim 1 , wherein the variable polarizer is disposed within a laser head component configured to emit the beam onto the surface of the workpiece, further comprising an optical fiber for delivering the beam from the beam emitter to the laser head component.
10. The system of claim 1 , wherein the beam emitter emits a plurality of beams.
11. The system of claim 1 , wherein the beam emitter emits a multi-wavelength beam.
12. A method of processing a workpiece using an optical beam, the method comprising:
receiving a desired one-dimensional processing path extending across at least a portion of a surface of the workpiece;
computationally determining a consistent polarization for the beam along the path based at least in part on one or more changes of a processing direction along the path;
operating a beam emitter to direct the beam along the path to process the workpiece, the beam having an output polarization; and
controlling the output polarization of the beam so as to maintain the consistent polarization of the beam as the beam traverses the path.
13. The method of claim 12 , wherein the path is curvilinear.
14. The method of claim 12 , wherein computationally determining the consistent polarization for the beam along the path comprises querying a database storing beam parameters associated with processing types and/or material compositions.
15. The method of claim 12 , wherein processing the workpiece comprises at least one of cutting, welding, soldering, drilling, or etching the workpiece.
16. The method of claim 12 , wherein the controlling step comprises directing the beam through a wave plate and varying a rotation angle of the wave plate with respect to the beam.
17. The method of claim 16 , wherein the wave plate is a half-wave plate.
18. The method of claim 16 , wherein the wave plate is a quarter-wave plate.
19. The method of claim 12 , wherein the beam is linearly polarized and the controlling step maintains a polarization direction of the beam parallel to the path.
20. The method of claim 12 , further comprising, while the beam is being directed along the path, (i) receiving feedback from one or more sensors regarding a position and/or processing efficacy of the beam relative to the workpiece, and (ii) altering the path and/or the output polarization of the beam in response to the feedback.