Invisible fingerprint coatings and process for forming same
A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH-POSS) nanoparticles.
1. An invisible fingerprint coating material, comprising: at least one alkyl silane material, and a hydroxylated POSS material having a water contact angle in a range of 75-85 degrees and a diiodomethane contact angle in a range of 30-40 degrees, wherein the hydroxylated POSS material has the structure of the formula
wherein R is —(CH 2 ) n —OH, and
n in —(CH 2 ) n —OH is an integer selected from a range of 1 to 5,
and a ratio of the at least one alkyl silane material to the hydroxylated POSS material is in a ratio of 5:1.
2. The invisible fingerprint coating material of claim 1 , wherein the hydroxylated POSS material has an n of 1.
3. The invisible fingerprint coating material of claim 1 , wherein the water contact angle is 80 degrees and the diiodomethane contact angle is 40 degrees.
4. The invisible fingerprint coating material of claim 1 , further comprising a solvent comprising a material selected from the group comprising an aqueous acid, a nonaqueous acid, an aqueous base, and a nonaqueous base.
5. The invisible fingerprint coating material of claim 4 , wherein the solvent is an aqueous acid or aqueous base.
6. The invisible fingerprint coating material of claim 4 , wherein the solvent is ammonium hydroxide.
7. The invisible fingerprint coating material of claim 1 , wherein the alkyl silane material has the structure of the formula
CH 3 —(CH 2 ) n —Si(X) 3-p (R) p
wherein n in CH 3 —(CH 2 ) n —Si(X) 3-p (R) p is an integer from 0 to 15,
p is an integer of 0 or 2,
R is an alkyl group or a hydrogen atom,
and X is a hydrolysable group consisting of a halide group or an alkoxy group.
8. The invisible fingerprint coating alkyl silane material of claim 7 , wherein alkyl silane material has the structure of the formula
CH 3 —(CH 2 ) n —Si(X) 3-p (R) p
wherein n in CH 3 —(CH 2 ) n —Si(X) 3-p (R) p is an integer from 3 to 10,
p is an integer of 0, and
X is an alkoxy group.
9. The invisible fingerprint coating material of claim 7 , wherein the alkyl silane is C 8 H 17 Si(OEt) 3 .