Microfluidic-based apparatus and method for vaporization of liquids
Methods and apparatus for vaporizing liquid into the surrounding environment, including directing liquid from a liquid source to a vaporization port where the vaporization port has lateral dimensions varying from 10 um to 300 um, applying heat to the liquid in the vaporization port with an at least one heating element located in thermal communication to the vaporization port, and releasing vaporized liquid from the vaporization port into the surrounding environment so that fluid is transported through the depth of the structure.
1. A vaporization apparatus that is placed within a surrounding environment to vaporize liquid into the surrounding environment, comprising;
at least one liquid source;
a plurality of vaporization ports formed in a planar structure comprising a through hole, the through hole with lateral dimensions ranging from 10 um to 300 um, that is in fluid communication with the liquid source on a first side and the surrounding environment on a second side, wherein fluid is transported from the first side of the structure to the second side of the structure through the through hole;
at least one planar heating element formed on the second side of the planar structure and disposed around a plurality of vaporization ports; and,
a wicking structure in fluid communication with the liquid source;
wherein;
the at least one planar heating element and the plurality of vaporization ports are microfabricated,
the dimension of the vaporization ports and the planar structure materials are selected to wick liquid from the liquid source by surface tension, and
heat applied from the heating element, through the planar structure to liquid that is in direct contact with the planar structure, vaporizes the liquid thereby releasing vapor through the vaporization ports into the surrounding environment.
2. Apparatus of claim 1 , wherein a protective layer is formed on the structure that surrounds the heating element.
3. Apparatus of claim 2 , wherein the protective layer comprises deposited silicon dioxide, amorphous silicon, silicon nitride, or other material.
4. Apparatus of claim 1 , wherein the heating element is a thin-film resistive heating element.
5. Apparatus of claim 1 , wherein the resistances of the resistive heating elements are varied to provide a controlled thermal distribution.
6. Apparatus of claim 5 , wherein the resistive heating elements, are electrically connected in parallel and series combination.
7. A vaporization apparatus that is placed within a surrounding environment to vaporize liquid into the surrounding environment, comprising;
at least one liquid source;
a plurality of vaporization ports formed in a planar structure comprising a through hole, the through hole with lateral dimensions ranging from 10 um to 300 um, that is in fluid communication with the liquid source on a first side and the surrounding environment on a second side, wherein fluid is transported from the first side of the structure to the second side of the structure through the through hole; and,
at least one planar heating element formed on the second side of the planar structure and disposed around a plurality of vaporization ports;
wherein;
the apparatus is in mechanical contact with an interposer body and an interposer retaining ring;
the at least one planar heating element and the plurality of vaporization ports are microfabricated,
the dimension of the vaporization ports and the planar structure materials are selected to wick liquid from the liquid source by surface tension, and
heat applied from the heating element, through the planar structure to liquid that is in direct contact with the planar structure, vaporizes the liquid thereby releasing vapor through the vaporization ports into the surrounding environment.
8. Apparatus of claim 7 , wherein an electrical interconnect is in mechanical contact with the interposer retaining ring, wherein the electrical interconnect is in electrical communication with a vaporization structure.
9. Apparatus of claim 7 , wherein a protective layer is formed on the structure that surrounds the heating element.
10. Apparatus of claim 9 , wherein the protective layer comprises deposited silicon dioxide, amorphous silicon, silicon nitride, or other material.
11. Apparatus of claim 7 , wherein the heating element is a thin-film resistive heating element.
12. Apparatus of claim 7 , wherein the resistances of the resistive heating elements are varied to provide a controlled thermal distribution.
13. Apparatus of claim 12 , wherein the resistive heating elements, are electrically connected in parallel and series combination.
14. A vaporization apparatus that is placed within a surrounding environment to vaporize liquid into the surrounding environment, comprising;
at least one liquid source;
a plurality of vaporization ports formed in a planar structure comprising a through hole, the through hole with lateral dimensions ranging from 10 um to 300 um, that is in fluid communication with the liquid source on a first side and the surrounding environment on a second side, wherein fluid is transported from the first side of the structure to the second side of the structure through the through hole; and,
at least one planar heating element formed on the second side of the planar structure and disposed around a plurality of vaporization ports;
wherein;
the vaporization ports are grouped into a plurality of clusters;
the at least one planar heating element and the plurality of vaporization ports are microfabricated,
the dimension of the vaporization ports and the planar structure materials are selected to wick liquid from the liquid source by surface tension, and
heat applied from the heating element, through the planar structure to liquid that is in direct contact with the planar structure, vaporizes the liquid thereby releasing vapor through the vaporization ports into the surrounding environment.
15. Apparatus of claim 14 , wherein at least one of the plurality of clusters contain resistive elements that are electrically connected in parallel and series combination.
16. Apparatus of claim 15 , wherein at least one of the plurality of clusters comprises seven vaporization ports.
17. Apparatus of claim 14 , wherein a protective layer is formed on the structure that surrounds the heating element.
18. Apparatus of claim 14 , wherein the protective layer comprises deposited silicon dioxide, amorphous silicon, silicon nitride, or other material.
19. Apparatus of claim 14 , wherein the heating element is a thin-film resistive heating element.
20. Apparatus of claim 14 , wherein the resistances of the resistive heating elements are varied to provide a controlled thermal distribution.
21. Apparatus of claim 20 , wherein the resistive heating elements, are electrically connected in parallel and series combination.