AlGaInPAs-based semiconductor laser device and method for producing same
An AlGaInPAs-based semiconductor laser device includes a substrate, an n-type clad layer, an n-type guide layer, an active layer, a p-type guide layer composed of AlGaInP containing Mg as a dopant, a p-type clad layer composed of AlInP containing Mg as a dopant, and a p-type cap layer composed of GaAs. Further, the semiconductor laser device has, between the p-type guide layer and the p-type clad layer, a Mg-atomic concentration peak which suppresses inflow of electrons, moving from the n-type clad layer to the active layer, into the p-type guide layer or the p-type clad layer.
1. An AlGaInPAs-based semiconductor laser device comprising:
a substrate;
an n-type clad layer;
an n-type guide layer;
an active layer;
a p-type guide layer composed of AlGaInP containing Mg as a dopant;
a p-type clad layer composed of AlInP containing Mg as a dopant, and the p-type clad layer including a p-type lower clad layer and a p-type upper clad layer on a part of the p-type lower clad layer;
a p-type cap layer, on the p-type upper clad layer, composed of GaAs; and
a dielectric film covering an upper surface of the p-type lower clad layer, a side surface of the p-type upper clad layer, and a side surface of the p-type cap layer,
wherein the semiconductor laser device has, between the p-type guide layer and the p-type clad layer, a Mg-atomic concentration peak which suppresses inflow of electrons moving from the n-type clad layer to the active layer, and into the p-type guide layer or the p-type clad layer.
2. The AlGaInPAs-based semiconductor laser device according to claim 1 , wherein the p-type cap layer contains C as a dopant.
3. The AlGaInPAs-based semiconductor laser device according to claim 1 , wherein the Mg-atomic concentration peak is present at an interface between the p-type guide layer and the p-type clad layer.
4. The AlGaInPAs-based semiconductor laser device according to claim 3 , wherein a Mg-atomic concentration at the interface between the p-type guide layer and the p-type clad layer is 1.0×10 18 cm −3 or more and 6.0×10 18 cm −3 or less.
5. The AlGaInPAs-based semiconductor laser device according to claim 1 , wherein a Mg-atomic concentration in the active layer is 5.0×10 17 cm −3 or less.
6. The AlGaInPAs-based semiconductor laser device according to claim 1 , wherein a Mg-atomic concentration at an interface between the p-type guide layer and the active layer is 3.0×10 18 cm −3 or less.