IP Library Granted Patent US 10,941,091
Granted Patent B2
US 10,941,091 · App. 16/683,924 · Granted Mar 9, 2021

Processes for producing high-purity trifluoroiodomethane

Inventors: Christian Jungong (Depew, NY); Daniel C. Merkel (Orchard Park, NY); Haiyou Wang (Amherst, NY); Terris Yang (East Amherst, NY); Pascal Bolomey (Solon, OH)
Assignee: Honeywell International Inc.
C07C17/389B01D3/143B01D53/04B01D53/1456B01D53/1493B01J20/08
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Quick Facts
Patent No.
US 10,941,091
App. No.
16/683,924
Granted
Mar 9, 2021
Kind
B2
Abstract

The present disclosure provides a method for purifying trifluoroiodomethane. The method includes providing a process stream comprising trifluoroiodomethane, organic impurities, and acid impurities; reacting the process stream with a basic aqueous solution, the basic aqueous solution comprising water and at least one base selected from the group of an alkali metal carbonate and an alkali metal hydroxide; and separating at least some of the organic impurities from the process stream.

Claims (28)

1. A method for purifying trifluoroiodomethane, the method comprising:

providing a process stream comprising trifluoroiodomethane, organic impurities, and acid impurities;

reacting the process stream with a basic aqueous solution, the basic aqueous solution comprising water and an alkali metal carbonate, wherein a concentration of the alkali metal carbonate in the basic aqueous solution is from about 0.5 wt. % to about 5 wt. %; and

separating at least some of the organic impurities from the process stream.

2. The method of claim 1 , wherein the alkali metal carbonate comprises sodium carbonate.

3. The method of claim 1 , wherein in the reacting step, a temperature of the process stream is from about 5° C. to about 80° C. and a pressure of the process stream is from about 1 psig to about 100 psig.

4. The method of claim 1 , wherein in the providing step, the organic impurities include methyl iodide, and a concentration of the methyl iodide in the process stream, in GC area % of total organic compounds, is reduced by from about 1% to about 70% by the reacting step.

5. The method of claim 1 , further comprising an additional step of drying to remove at least some of the water from the process stream immediately after the reacting step.

6. The method of claim 5 , wherein after the reacting step, the drying step, and the separation step, the process stream includes at least about 99 wt. % trifluoroiodomethane, less than about 50 ppm methyl iodide, less than about 100 ppm water, and less than about 20 ppm acid impurities.

7. A method for purifying trifluoroiodomethane, the method comprising:

providing a process stream comprising trifluoroiodomethane, organic impurities, and acid impurities;

contacting the process stream with an acid reactive agent; and

separating at least some of the organic impurities from the process stream.

8. The method of claim 7 , wherein the acid reactive agent comprises an alumina adsorbent.

9. The method of claim 7 , wherein in the contacting step, the process stream is in a liquid phase, a temperature of the process stream is from about −50° C. to about 50° C. and a pressure of the process stream is from about 1 psig to about 100 psig.

10. The method of claim 7 , wherein in the contacting step, the process stream is in a gas phase, a temperature of the process stream is from about −20° C. to about 60° C. and a pressure of the process stream is from about 1 psig to about 100 psig.

11. The method of claim 7 , wherein the contacting step precedes the separation step.

12. The method of claim 7 , further comprising an additional step of drying to remove at least some of the water from the process stream immediately after the contacting step.

13. The method of claim 12 , wherein after the contacting step, the drying step, and the separation step, the process stream includes at least about 99 wt. % trifluoroiodomethane, less than about 50 ppm methyl iodide, less than about 100 ppm water, and less than about 20 ppm acid impurities.

14. A method for purifying trifluoroiodomethane, the method comprising:

providing a process stream comprising trifluoroiodomethane, organic impurities, and acid impurities;

reacting the process stream with a basic aqueous solution, the basic aqueous solution comprising water and an alkali metal hydroxide, wherein a concentration of the alkali metal hydroxide in the basic aqueous solution is from about 0.01 wt. % to about 0.5 wt. %; and

separating at least some of the organic impurities from the process stream.

15. The method of claim 14 , wherein the alkali metal hydroxide includes potassium hydroxide.

16. The method of claim 14 , wherein in the reacting step, a temperature of the process stream is from about 5° C. to about 80° C. and a pressure of the process stream is from about 1 psig to about 100 psig.

17. The method of claim 14 , wherein in the providing step, the organic impurities include methyl iodide, and a concentration of the methyl iodide in the process stream, in GC area % of total organic compounds, is reduced by from about 1% to about 70% by the reacting step.

18. The method of claim 14 , further comprising an additional step of drying to remove at least some of the water from the process stream immediately after the reacting step.

19. The method of claim 18 , wherein after the reacting step, the drying step, and the separation step, the process stream includes at least about 99 wt. % trifluoroiodomethane, less than about 50 ppm methyl iodide, less than about 100 ppm water, and less than about 20 ppm acid impurities.

Assignments (3)
NUNC PRO TUNC ASSIGNMENT Recorded Apr 12, 2026
From: HONEYWELL INTERNATIONAL INC.
To: SOLSTICE ADVANCED MATERIALS US, INC.
Reel/Frame 074344/0066 →
SECURITY INTEREST Recorded Jan 12, 2026
From: SOLSTICE ADVANCED MATERIALS US, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 074569/0260 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 29, 2020
From: JUNGONG, CHRISTIAN; MERKEL, DANIEL C.; WANG, HAIYOU; YANG, TERRIS; BOLOMEY, PASCAL
To: HONEYWELL INTERNATIONAL INC.
Reel/Frame 054483/0625 →
Continuity (2)
Provisional Application 62774520 · Dec 3, 2018
Related Publication 20200172457A1 · Jun 4, 2020