IP Library Granted Patent US 11,402,627
Granted Patent B2
US 11,402,627 · App. 16/685,506 · Granted Aug 2, 2022

System and method for limiting laser exposure of arbitrary laser template projection

Inventor: Kurt D. Rueb (Kitchener, CA)
Assignee: VIRTEK VISION INTERNATIONAL INC.
G02B26/105G02B27/18
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Quick Facts
Patent No.
US 11,402,627
App. No.
16/685,506
Granted
Aug 2, 2022
Kind
B2
Abstract

A laser projection system for projecting laser image onto a work surface providing optimized laser energy includes laser source and an electronic circuit for modulating an output power level. A galvanometer assembly includes a scanning mirror operated a mirror control circuit for redirecting the laser beam onto the work surface along a scanning path for generating the laser image. The galvanometer assembly is electronically connected to the electronic circuit for signaling an angular velocity of the scanning mirror to the electronic circuit. A controller includes a scanning path input module for generating a simulation of the angular velocity of the scanning mirror along the scanning path for estimating a concentration of laser energy along areas of the scanning path of the laser beam. The electronic circuit modulates energy concentration of the laser beam in response to the estimated concentration of laser energy and the angular velocity of the scanning mirror.

Claims (30)

1. A laser projection system for projecting laser image onto a work surface providing optimized laser energy; comprises:

a laser source generating a laser beam for projecting a laser image onto a work surface;

an electronic circuit for modulating an output power level of said laser source;

a galvanometer assembly including a scanning mirror being operable by a mirror control circuit for redirecting the laser beam onto the work surface along a scanning path thereby generating the laser image, said galvanometer assembly being electronically connected to said electronic circuit for signaling an angular velocity of said scanning mirror to said electronic circuit;

a controller including a scanning path input module for generating a simulation of the angular velocity of said scanning mirror along the scanning path while generating the laser template thereby estimating a concentration of laser energy along areas of the scanning path of the laser beam; and

said electronic circuit modulating energy concentration of the laser beam along areas of the scanning path in response to the estimated concentration of laser energy along the scanning path and the angular velocity of said scanning mirror thereby maintaining a concentration of laser energy below a predetermined threshold.

2. The system set forth in claim 1 , wherein said galvanometer assembly includes a second scanning mirror being operable by a second mirror control circuit, said first mirror control circuit being cooperable with said second mirror control circuit for redirecting the laser beam onto the work surface along a scanning path.

3. The system set forth in claim 1 , including a laser sensor for sensing laser energy concentration and being electrically connected to a control circuit for terminating projection of the laser beam when energy concentration of the laser beam along areas of the scanning path exceed a predetermined limit.

4. The system set forth in claim 1 , wherein said controller includes an active monitor being electronically connected to said scanning path input module, said active monitor receiving power limiting instructions from said scanning path input module for limiting laser energy along areas of the scanning path for concentration of laser energy along areas of the scanning path thereby maintaining concentration of laser energy a predetermined limit.

5. The system set forth in claim 2 , wherein said first mirror control circuit and said second mirror control circuit are electronically connected to a power control circuit signalling said power control circuit a location of the laser beam on the scanning path and said power control circuit controlling power to said laser projector based upon the location of the laser beam on the scanning path.

6. The system set forth in claim 1 , wherein said laser projector is adapted to project arbitrary laser templates and said scanning path input module and said electronic circuit modulate energy concentration of the laser beam along areas of the scanning path in response to estimated concentration of the laser beam.

7. The system set forth in claim 1 , wherein said controller includes an active monitor includes a power supervisor for modulating laser power beneath a predetermined level based upon the simulation of average energy exposure of the laser beam along areas of the scanning path.

8. The system set forth in claim 3 , wherein said sensor is electronically connected to said active monitor and said active monitor is programmed to compare actual laser energy concentration with said simulated laser energy concentration for modulating output power level when the actual laser energy concentration exceeds simulated laser energy concentration.

9. The system set forth in claim 3 , wherein said scanning path input module includes a prediction element for generating predictive algorithms of the arbitrary laser patterns.

10. The system set forth in claim 3 , wherein said scanning path input module includes a rehearsal element for generating the simulation of the angular velocity of said scanning mirror along the scanning path while generating the laser template.

11. A method of projecting a laser image providing optimized laser energy, comprising the steps of:

providing a laser projector for projecting a laser beam and a galvanometer assembly for directing the laser beam along a scanning path thereby generating a laser image;

providing an electronic circuit for modulating an output power level of said laser source;

predetermining a maximum concentration of laser energy;

predicting concentration of laser energy along the scanning path while generating the laser image based upon a simulation of the projection of the laser beam along the scanning path; and

said electronic circuit modulating concentration of laser energy while said laser beam traverses the scanning path for optimizing illumination of the laser image while monitoring concentration of laser energy for determining if the concentration of laser energy is below the predetermined maximum concentration of laser energy based upon the simulation of the projection of the laser beam along the scanning path.

12. The method set forth in claim 11 , wherein said step of predicting concentration of laser energy is further defined by estimating concentration of laser energy along areas of the scanning path of the laser beam.

13. The method set forth in claim 11 , further including a step of simulating angular velocity of said galvanometer assembly for estimating concentration of laser energy along areas of the scanning path of the laser beam.

14. The method set forth in claim 11 , wherein said step of providing a galvanometer assembly is further defined by providing a first mirror control circuit and a second mirror control circuit and simulating angular velocity by simulating angular velocity of said first mirror control circuit and said second mirror control circuit.

15. The method set forth in claim 11 , further including a step of sensing concentration of laser energy generated by said laser projector for terminating projection of the laser beam when the concentration of laser energy exceeds a predetermined limit.

16. The method set forth in claim 11 , further including a step of actively monitoring simulation of a scanning path and moderating actual concentration of laser energy from the simulation of the scanning path.

17. The method set forth in claim 11 , further including a step of said galvanometer assembly signalling a location of the laser beam to said controller on the scanning path thereby enabling said electronic circuit to synchronize the actual location of the laser beam on the scanning path with a simulated location of the laser beam on the scanning path.

18. The method set forth in claim 11 , further including a step of said electronic circuit comparing the actual concentration of laser energy with the simulated concentration of laser energy and modulating output power level of said laser projector when actual concentration of laser energy exceed simulated concentration of laser energy.

19. The method set forth in claim 11 , wherein said step of directing the laser beam along a scanning path thereby generating a laser image is further defined by directing the laser beam along an arbitrary scanning path thereby generating a laser image.

20. The method set forth in claim 11 , further including a step of rehearsing projection of the laser beam along a scanning path for generating the simulation of the angular velocity of said galvanometer assembly while generating the laser image.

Assignments (4)
RELEASE OF SECURITY INTEREST Recorded Oct 23, 2024
From: ALLY BANK
To: VIRTEK VISION INTERNATIONAL INC.
Reel/Frame 068985/0533 →
CHANGE OF NAME Recorded Aug 22, 2024
From: VIRTEK VISION INTERNATIONAL ULC
To: VIRTEK VISION INTERNATIONAL INC.
Reel/Frame 068749/0543 →
SECURITY AGREEMENT Recorded Jun 1, 2021
From: VIRTEK VISION INTERNATIONAL INC.
To: ALLY BANK, AS COLLATERAL AGENT
Reel/Frame 056447/0532 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 19, 2019
From: RUEB, KURT D
To: VIRTEK VISION INTERNATIONAL ULC
Reel/Frame 051047/0735 →