IP Library Granted Patent US 10,859,519
Granted Patent B2
US 10,859,519 · App. 16/686,953 · Granted Dec 8, 2020

Methods and systems for measuring periodic structures using multi-angle x-ray reflectance scatterometry (XRS)

Inventors: Heath A. Pois (Fremont, CA); David A. Reed (Belmont, CA); Bruno W. Schueler (San Jose, CA); Rodney Smedt (Los Gatos, CA); Jeffrey T. Fanton (Los Altos, CA)
Assignee: NOVA MEASURING INSTRUMENTS, INC.
G01N23/201G01N23/207G01N2223/054H01L22/12
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Quick Facts
Patent No.
US 10,859,519
App. No.
16/686,953
Granted
Dec 8, 2020
Kind
B2
Abstract

Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) are disclosed. For example, a method of measuring a sample by X-ray reflectance scatterometry involves impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles. The method also involves collecting at least a portion of the scattered X-ray beam.

Claims (31)

1. A method of characterizing a sample by X-ray reflectance scatterometry, the method comprising:

impinging an incident X-ray beam having an energy of 1 keV or less on a sample having a periodic structure to generate X-ray scattering having multiple diffraction orders, while configuring the incident X-ray beam to converge in an incidence and azimuth planes to thereby simultaneously provide a plurality of incident angles and a plurality of azimuthal angles and thereby cause angular separation of the multiple diffraction orders of the X-ray scattering; and,

sampling an intensity of at least a portion of the X-ray scattering.

2. A system for measuring a sample by X-ray reflectance scatterometry, the system comprising:

an X-ray source for generating an X-ray beam having an energy of approximately 1 keV or less;

a sample holder for positioning a sample having a periodic structure;

a monochromator positioned between the X-ray source and the sample holder, the monochromator for focusing the X-ray beam to provide an incident X-ray beam to the sample holder, the incident X-ray beam simultaneously having a plurality of incident angles and a plurality of azimuthal angles, the monochromator configured to focus the X-ray beam so as to cause multiple orders of X-ray diffraction from the sample to be spatially separated; and

a detector for collecting at least a portion of a scattered X-ray beam from the sample.

3. The method of claim 1 , wherein sampling the intensity is done simultaneously for the multiple diffraction orders.

4. The method of claim 3 , wherein the multiple diffraction orders include zero and first orders.

5. The method of claim 1 , wherein sampling the intensity is done by collecting at least a portion of a scattered X-ray beam onto a two-dimensional detector.

6. The method of claim 1 , wherein sampling the intensity is done by scanning a a slit for the detector.

7. The method of claim 1 , wherein configuring the incident X-ray beam to converge comprises converging to an angle in the range from 20 degrees to 40 degrees.

8. The method of claim 1 , wherein configuring the incident X-ray beam to converge comprises converging such that a central axis of the incident X-ray beam has a fixed non-zero incident angle in a range of 10 degrees to 15 degrees from a horizontal plane.

9. The method of claim 1 , wherein configuring the incident X-ray beam to converge comprises passing the X-ray beam through a monochromator.

10. The method of claim 9 , further comprising configuring the monochromator to assure the sampling is substantially free of scattering order-overlap.

11. The method of claim 9 , wherein the incident X-ray beam is not collimated between the passing the X-ray beam through a monochromator and the impinging on the sample.

12. The method of claim 1 , wherein the range of the plurality of incident angles is less than an angle of a nominal first-order angle at zero degrees.

13. The method of claim 1 , further comprising: estimating a shape of the periodic structure of the sample by inversion of scattering solutions relative to the sampled scattered signal intensity.

14. The method of claim 1 , wherein the converging incident X-ray beam has a wavelength that is less than a periodicity of the periodic structure.

15. The method of claim 1 , wherein the incident X-ray beam is generated from an X-ray source selected from the group consisting of carbon (C), molybdenum (Mo) and Rhodium (Rh).

16. The system of claim 2 , wherein the detector samples the intensity simultaneously for the multiple diffraction orders.

17. The system of claim 2 , wherein the detector comprises a two-dimensional detector.

18. The system of claim 2 , further comprising a scanning slit.

19. The system of claim 2 , wherein the monochromator focuses the X-ray beam to have converging angle in a range of from 20 degrees to 40 degrees.

20. The system of claim 2 , wherein the monochromator is configured to assure detected signal is substantially free of scattering order-overlap.

21. The system of claim 2 , wherein the incident X-ray beam is not collimated between the monochromator and the sample.

22. The system of claim 2 , wherein the range of the plurality of incident angles is less than an angle of a nominal first-order angle at zero degrees.

23. The system of claim 2 , further comprising a controller estimating a shape of the periodic structure of the sample by inversion of scattering solutions relative to the sampled scattered signal intensity.

24. The system of claim 2 , wherein the converging incident X-ray beam has a wavelength that is less than a periodicity of the periodic structure.

25. The system of claim 2 , wherein the X-ray source for generating an X-ray beam selected from the group consisting of carbon (C), molybdenum (Mo) and Rhodium (Rh).

Continuity (4)
Continuation 16181287 · Nov 5, 2018
Continuation 15451104 · Mar 6, 2017
Continuation 14161942 · Jan 23, 2014
Related Publication 20200088656A1 · Mar 19, 2020
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