Integrated pump control for dynamic control of plasma field
A pump and a pump controller which uses an algorithm to quickly achieve and maintain a stable plasma field in a surgical site are provided. The algorithm calculates an electrical characteristic value to determine if a suction rate by the pump should be increased or decreased to achieve the stable plasma field. A method of using the pump and the pump controller is also provided.
1. A method of controlling a surgical pump system, the method comprising the steps of:
providing a pump system for motivating fluid to and from a surgical site during a surgical procedure;
providing a pump controller connected to the pump system for controlling a fluid rate inflow to the surgical site and for controlling suction of the fluid from the surgical site;
providing a surgical device for performing the surgical procedure, the surgical device having an associated electrical characteristic value at a given time;
providing a predetermined upper threshold electrical characteristic value and a predetermined lower threshold electrical characteristic value and communicating the predetermined upper threshold electrical characteristic value and the predetermined lower threshold electrical characteristic value to the pump controller;
providing a low suction amount value and communicating the low suction amount value to the pump controller; and
the pump controller performing the following steps:
(a) retrieving and recording a sampling of surgical device electrical characteristic values during a sample duration,
(b) determining whether the sampled duration has met a predetermined length of time,
(c) calculating an average electrical characteristic value based on the sampling of the surgical device electrical characteristic values if the sampled duration has met the predetermined length,
(d) increasing an amount of the suction if the average electrical characteristic value is greater t ha n the predetermined upper threshold electrical characteristic value, and
(e) decreasing the amount of the suction if the average electrical characteristic value is less than the predetermined lower threshold electrical characteristic value.
2. The method of controlling the surgical pump system according to claim 1 , and further comprising the step of initializing a suction value to zero if the surgical device was just activated.
3. The method of controlling the surgical pump system according to claim 1 , and further comprising the step of the pump controller setting a suction increment value.
4. The method of controlling the surgical pump system according to claim 3 , wherein the step of increasing the amount of suction comprises increasing the suction using the suction increment value.
5. The method of controlling the surgical pump system according to claim 3 , wherein the step of decreasing the amount of the suction comprises decreasing the amount of the suction using the suction increment value.
6. The method of controlling the surgical pump system according to claim 5 , wherein the amount of suction is decreased to a rate not less than the low suction amount value.
7. The method of controlling the surgical pump system according to claim 1 , wherein the step of decreasing the amount of suction comprises decreasing the amount of the suction to the low suction amount value.
8. The method of controlling the surgical pump system according to claim 7 , wherein the low suction amount level is maintained until the pump controller detects a stable plasma field.
9. The method of controlling the surgical pump system according to claim 1 , wherein if the calculated average electrical characteristic value is between the predetermined lower threshold electrical characteristic value and the predetermined upper threshold electrical characteristic value, the pump controller maintains a current suction rate.
10. The method of controlling the surgical pump system according to claim 1 , wherein if the average electrical characteristic value calculated is lower than the predetermined lower threshold electrical characteristic value, then a suction rate is incrementally decreased until a stable plasma field is achieved.