IP Library Granted Patent US 10,847,665
Granted Patent B2
US 10,847,665 · App. 16/699,363 · Granted Nov 24, 2020

Germanium metal-contact-free near-IR photodetector

Inventors: Thomas Baehr-Jones (Arcadia, CA); Yi Zhang (Jersey City, NJ); Michael J. Hochberg (New York, NY); Ari Novack (New York, NY)
Assignee: Elenion Technologies, LLC
H01L31/0352H01L27/14638H01L27/14649H01L27/14685H01L27/14698H01L31/028H01L31/0256H01L31/105H01L31/107H01L31/1808Y02E10/547
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,847,665
App. No.
16/699,363
Granted
Nov 24, 2020
Kind
B2
Abstract

A Ge-on-Si photodetector constructed without doping or contacting Germanium by metal is described. Despite the simplified fabrication process, the device has responsivity of 1.24 A/W, corresponding to 99.2% quantum efficiency. Dark current is 40 nA at −4 V reverse bias. 3-dB bandwidth is 30 GHz.

Claims (28)

1. A photodetector, comprising:

a substrate;

a silicon film layer on the substrate, including an input waveguide;

a light absorber on the silicon film layer forming a hybrid waveguide with the input waveguide,

a first doped semiconductor contact in the silicon film layer underneath a first end of the light absorber;

a second doped semiconductor contact in the silicon film layer underneath a second end of the light absorber, opposite to the first end;

a first metal terminal, in electrical communication with the first contact and in electrical communication with external circuitry; and

a second metal terminal, in electrical communication with the second contact and in electrical communication with the external circuitry.

2. The photodetector according to claim 1 , wherein the first doped semiconductor contact comprises: a first slab underneath the light absorber, a second slab underneath the first metal terminal, and a first connecting slab extending in the silicon film layer between the first slab and the second slab; and

wherein the second contact comprises: a third slab underneath the light absorber, a fourth slab underneath the second metal terminal, and a second connecting slab extending in the silicon film layer between the third slab and the fourth slab.

3. The photodetector according to claim 2 , wherein the first connecting slab comprises a higher doping level than the first slab.

4. The photodetector according to claim 2 , wherein the first connecting slab comprises a doping level intermediate the respective first slab and the second slab.

5. The photodetector according to claim 2 , wherein a sheet resistance of the second slab is an order of magnitude smaller than a sheet resistance of the first connecting slab.

6. The photodetector according to claim 1 , wherein the substrate comprises a buried oxide layer under the silicon film layer.

7. The photodetector according to claim 1 , wherein the first doped semiconductor contact includes p-type doping; and wherein the second doped semiconductor contact includes n-type doping.

8. The photodetector according to claim 1 , wherein the first doped semiconductor contact includes boron doping; and wherein the second doped semiconductor contact includes phosphorus doping.

9. The photodetector according to claim 1 , wherein the light absorber consists of an intrinsic semiconductor.

10. The photodetector according to claim 1 , wherein the light absorber comprises germanium.

11. The photodetector according to claim 1 , wherein the light absorber consists of intrinsic germanium.

12. The photodetector according to claim 1 , wherein the light absorber comprises a plurality of facets providing a non-planar faceted shape.

13. The photodetector according to claim 12 , wherein the light absorber comprises a triangular cross section.

14. The photodetector according to claim 12 , wherein one of the plurality of facets is oriented at an angle between 15 degrees and 75 degrees to a surface of the substrate.

15. The photodetector according to claim 1 , wherein the light absorber includes a sidewall at a 25° angle to the silicon film layer.

16. The photodetector according to claim 1 , wherein the light absorber comprises a taper configured to adiabatically convert light from the input waveguide to the hybrid waveguide.

17. The photodetector according to claim 1 , wherein the light absorber includes a planarized surface; and further comprising a third doped semiconductor contact in electrical communication with the planarized surface.

18. The photodetector according to claim 1 , configured as an avalanche photodetector, wherein photomultiplication occurs in the light absorber.

19. The photodetector according to claim 1 , wherein the hybrid waveguide is configured to couple light into a single mode.

20. The photodetector according to claim 1 , further comprising a heater for keeping the photodetector at an elevated temperature to improve performance.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 6, 2022
From: ELENION TECHNOLOGIES LLC
To: NOKIA SOLUTIONS AND NETWORKS OY
Reel/Frame 058708/0603 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 29, 2019
From: BAEHR-JONES, THOMAS; ZHANG, YI; HOCHBERG, MICHAEL J.; NOVACK, ARI
To: CORIANT ADVANCED TECHNOLOGY, LLC
Reel/Frame 051138/0240 →
CHANGE OF NAME Recorded Nov 29, 2019
From: CORIANT ADVANCED TECHNOLOGY, LLC
To: ELENION TECHNOLOGIES, LLC
Reel/Frame 051144/0833 →
Cited By (1)
US 12,660,332