WET CHEMICAL DIE SINGULATION SYSTEMS AND RELATED METHODS
Implementations of methods for singulating die from a wafer may include: providing a semiconductor wafer having a first side and a second side. The first side may include a plurality of die and a plurality of die streets between each of the plurality of die. The method may include applying a mask over the plurality of die and around the plurality of die streets. The method may also include wet etching through the semiconductor wafer at the plurality of die streets to singulate the plurality of die.
1 . A method for singulating die from a wafer comprising:
providing a semiconductor wafer comprising a first side and a second side, the first side comprising a plurality of die and a plurality of die streets between each of the plurality of die;
applying a mask over the plurality of die and around the plurality of streets;
only wet etching through the semiconductor wafer at the plurality of die streets to singulate the plurality of die.
2 . The method of claim 1 , wherein the semiconductor wafer has a thickness of 25 microns to 50 microns.
3 . The method of claim 1 , wherein the wet etching comprises applying an etchant to one of the first side of the wafer or the second side of the wafer.
4 . The method of claim 1 , further comprising mounting the semiconductor wafer to a picking tape.
5 . The method of claim 1 , further comprising mounting the wafer to a carrier.
6 . The method of claim 1 , wherein wet etching comprises one of submerging the semiconductor wafer into an etchant bath, spraying the semiconductor wafer with an etchant, or puddling the etchant onto the semiconductor wafer.
7 . The method of claim 1 , wherein the mask is one of temporarily present or sacrificially removed.
8 . The method of claim 1 , further comprising regulating a rate of the wet etching by controlling a temperature of an etchant.
9 . A method for singulating die from a wafer comprising:
providing a semiconductor wafer comprising a first side and a second side, the first side comprising a plurality of die and a plurality of die streets between each of the plurality of die;
coupling the semiconductor wafer to a tape wherein the tape is coupled with a film frame;
applying a mask over the plurality of die and around the plurality of streets; and
only wet etching through the semiconductor wafer at the plurality of die streets to singulate the plurality of die;
wherein the wafer has a thickness of between 10 microns to 50 microns.
10 . The method of claim 9 , further comprising singulating the plurality of die through jet ablation.
11 . The method of claim 9 , wherein the wet etching comprises applying an etchant to one of the first side of the wafer or the second side of the wafer.
12 . The method of claim 9 , wherein wet etching comprises one of submerging the semiconductor wafer into an etchant bath, spraying the semiconductor wafer with an etchant, or puddling the etchant onto the semiconductor wafer.
13 . The method of claim 9 , wherein the mask is one of temporarily present or sacrificially removed.
14 . The method of claim 9 , further comprising regulating a rate of the wet etching by controlling a temperature of an etchant.
15 . A method for singulating die from a wafer comprising:
providing a semiconductor substrate comprising a first side and a second side and a thickness between the first side and the second side, the first side comprising a plurality of die and a plurality of die streets between each of the plurality of die;
coupling a back metal to the second side of the semiconductor wafer;
applying a mask over the plurality of die and around the plurality of streets; and
wet etching through the thickness at the plurality of die streets;
wherein the wafer has a thickness of between 10 microns to 100 microns.
16 . The method of claim 15 , further comprising singulating the plurality of die through jet ablation.
17 . The method of claim 15 , wherein the wet etching comprises applying an etchant to one of the first side of the wafer or the second side of the wafer.
18 . The method of claim 15 , wherein wet etching comprises one of submerging the semiconductor wafer into an etchant bath, spraying the semiconductor wafer with an etchant, or puddling the etchant onto the semiconductor wafer.
19 . The method of claim 15 , further comprising removing the mask during wet etching.
20 . The method of claim 15 , further comprising wet etching the back metal.