Multi-layered substrates for waveguide displays
A waveguide includes an input area, a multi-layered substrate, and an output area. The multi-layered substrate includes a plurality of layers of at least a substrate and at least one partially reflective layers. The input area in-couples light in a first band into the waveguide. The one or more partially reflective layers are partially reflective to light in the first band. Each of the one or more partially reflective layers are located between respective layers of the plurality of layers of the substrate. The output area out-couples light from the waveguide. The pupil replication density of the out-coupled light is based in part on a number of the one or more partially reflective layers and respective locations of the one or more partially reflective layers in the waveguide.
1. A waveguide comprising:
an input area configured to in-couple light in a first band into the waveguide;
a plurality of layers of at least a first film and a second film that is formed from a liquid resin associated with a high refractive index, the second film being partially reflective to light in the first band; and
an output area configured to out-couple light from the waveguide,
wherein a pupil replication density of the out-coupled light is based in part on a number of the plurality of layers of the first film and the second film and respective locations of the plurality of layers of the first film and the second film in the waveguide.
2. The waveguide of claim 1 , wherein the liquid resin has a refractive index in a range of 1.43 to 2.15.
3. The waveguide of claim 1 , wherein the liquid resin is deposited on the first film and undergoes a compression between a first surface and a second surface opposite to the first surface, each of the first surface and the second surface being an optically flat surface.
4. The waveguide of claim 1 , wherein the liquid resin undergoes a curing by at least one of a UV radiation process or an annealing process.
5. The waveguide of claim 1 , wherein the first film is one or more layers of silicon dioxide.
6. The waveguide of claim 1 , wherein the first film has a thickness in a range of 50 nm to 300 nm.
7. The waveguide of claim 1 , wherein the first film is deposited by at least one of plasma enhanced chemical vapor deposition (PECVD), sputtering, spin-coating, or evaporation.
8. The waveguide of claim 1 , further comprising a substrate, wherein the first film is deposited on the substrate.
9. The waveguide of claim 8 , wherein the substrate is a wafer composed of at least one of polymer or glass.
10. The waveguide of claim 8 , wherein the substrate has a thickness in a range of 200 to 800 microns.
11. A waveguide display comprising:
a light source configured to emit light of a first band;
a waveguide including an input area, a plurality of layers of at least a first film and a second film that is formed from a liquid resin associated with a high refractive index, the second film being partially reflective to light in the first band, and an output area, the waveguide coupled to receive the light of the first band at the input area, expand the received light to form image light and output the image light using the output area; and
a controller configured to generate scanning instructions and provide the scanning instructions to the light source,
wherein a pupil replication density of the image light is based in part on a number of the plurality of layers of the first film and the second film and respective locations of the plurality of layers of the first film and the second film in the waveguide.
12. The waveguide display of claim 11 , wherein the liquid resin has a refractive index in a range of 1.43 to 2.15.
13. The waveguide display of claim 11 , wherein the liquid resin is deposited on the first film and undergoes a compression between a first surface and a second surface opposite to the first surface, each of the first surface and the second surface being an optically flat surface.
14. The waveguide display of claim 11 , wherein the liquid resin undergoes a curing by at least one of a UV radiation process or an annealing process.
15. The waveguide display of claim 11 , wherein the first film is one or more layers of silicon dioxide.
16. The waveguide display of claim 11 , wherein the first film has a thickness in a range of 50 nm to 300 nm.
17. The waveguide display of claim 11 , wherein the first film is deposited by at least one of plasma enhanced chemical vapor deposition (PECVD), sputtering, spin-coating, or evaporation.
18. The waveguide display of claim 11 , further comprising a substrate, wherein the first film is deposited on the substrate.
19. The waveguide display of claim 18 , wherein the substrate is a wafer composed of at least one of polymer or glass.
20. The waveguide display of claim 18 , wherein the substrate has a thickness in a range of 200 to 800 microns.