Diode-pumped solid-state laser apparatus for laser annealing
Laser annealing apparatus includes a plurality of frequency-tripled solid-state lasers, each delivering an output beam of radiation at a wavelength between 340 nm and 360 nm. Each output beam has a beam-quality factor (M 2 ) greater of than 50 in one transverse axis and greater than 20 in another transverse axis. The output beams are combined and formed into a line-beam that is projected on a substrate being annealed. Each output beam contributes to the length of the line-beam.
1. Optical apparatus for annealing a layer on a substrate, comprising:
a plurality of repetitively-pulsed solid-state lasers, each laser thereof configured for delivering an output beam having a wavelength in the ultraviolet region of the electromagnetic spectrum, and each laser thereof including:
a laser resonator and the laser resonator including a gain crystal in a form of a slab that is energized by optical pumping to provide a gain volume in the gain crystal,
wherein the gain crystal is end pumped by pump radiation along a propagation axis in the gain crystal to provide the gain volume,
wherein mutually-orthogonal first and second transverse axes are orthogonal to the propagation axis,
wherein the gain volume has first and second dimensions respectively in the first and second transverse axes, and
wherein the energized laser resonator produces a fundamental radiation beam along the propagation axis, wherein the fundamental radiation beam is frequency converted into the output beam,
each output beam having a cross-section in the first and second transverse axes, a beam-quality factor M 2 in the first transverse axis greater than 50, a beam-quality factor M 2 in the second transverse axis greater than 20, laser pulses having a pulse-energy greater than 100millijoules, and a pulse-repetition frequency greater than 100 hertz; and
a line-projector arranged to receive the output beams, form the output beams into a line-beam, and project the line-beam onto the layer, the line-beam having a length and a width on the layer.
2. The apparatus of claim 1 , wherein the line projector includes at least one beam homogenizer configured such that each output beam contributes to the entire length of the line-beam.
3. The apparatus of claim 1 , wherein, the pump radiation in each frequency-converted repetitively-pulsed solid-state laser is provided by one or more diode-laser arrays.
4. The apparatus of claim 3 , wherein the pump radiation is elongated in each frequency-converted repetitively-pulsed solid-state laser such that the first transverse axis dimension is greater than or equal to three-times the second transverse axis-dimension, a gain area defined by the first and second dimensions acting a soft aperture within the laser resonator.
5. The apparatus of claim 4 , wherein the laser-resonator is formed between first and second resonator mirrors having optical power in the second transverse axis only.
6. The apparatus of claim 3 , wherein the laser resonator is formed between first and second resonator mirrors, and the fundamental radiation beam has a wavelength in the near-infrared region of the electromagnetic spectrum being characteristic of the gain crystal, the laser-resonator being configured such that it delivers the fundamental radiation beam to first and second optically nonlinear crystals in numeric sequence, the first optically nonlinear crystal being arranged to generate a second-harmonic radiation beam from the fundamental radiation beam, the second optically nonlinear crystal being arranged to generate the output beam by sum-frequency mixing the second-harmonic radiation beam with a residual fundamental-radiation beam after the generation of the second-harmonic radiation beam.
7. The apparatus of claim 6 , wherein the gain crystal in each frequency-converted repetitively-pulsed solid-state laser is one of ytterbium doped yttrium aluminum garnet (YAG) or yttrium orthovanadate (YVO 4 ) such that the output beam has a wavelength in a range from 340 nanometers to 360 nanometers.
8. The apparatus of claim 1 , wherein the gain crystal in each frequency-converted repetitively-pulsed solid-state laser is located between a high-reflection resonator mirror and an output-coupling resonator mirror, and a reflectivity of the output-coupling resonator mirror is selected such that the laser pulses have a full-width at half maximum pulse-duration greater than 10 nanoseconds.
9. The apparatus of claim 1 , wherein each frequency-converted repetitively-pulsed solid-state laser includes a polarizer located in the resonator such that the output beam is linearly polarized.
10. The apparatus of claim 6 , wherein each frequency-converted repetitively-pulsed solid-state laser has a resonator length between the first and second resonator mirrors, optical powers of the first and second resonator mirrors, and a propagation distance in the first optically nonlinear crystal selected such that the M 2 value of the second-harmonic radiation beam in the first transverse axis is at least twice the M 2 value of the fundamental radiation beam in the first transverse axis, and the M 2 value of the second-harmonic radiation beam in the second transverse axis is greater than the M 2 value of the fundamental radiation beam in the second transverse axis.
11. The apparatus of claim 10 , wherein each frequency-converted repetitively-pulsed solid-state laser has a propagation distance in the second optically nonlinear crystal selected such that the beam-quality factor M 2 of the output beam in the first transverse axis is greater than 200.
12. The apparatus of claim 10 , wherein each frequency-converted repetitively-pulsed solid-state laser has a propagation distance in the second optically nonlinear crystal selected such that the M 2 values of the output beam in the first and second transverse axes are greater than the corresponding values of the second harmonic radiation beam.
13. The apparatus of claim 10 , wherein each frequency-converted repetitively-pulsed solid-state laser has a propagation distance in the second optically nonlinear crystal selected such that the M 2 value of the output beam in the first transverse axis is greater than 1.5-times the M 2 value of the second-harmonic radiation in the first transverse axis.
14. The apparatus of claim 10 , wherein each frequency-converted repetitively-pulsed solid-state laser has a propagation distance in the second optically nonlinear crystal selected such that the M 2 value of the output beam in the first transverse axis is greater than 1.5-times the M 2 value of the residual fundamental radiation beam in the first transverse axis.