Films for use as interleaves between substrates

1. A film for use as an interleaf between substrates, the film comprising:

a first side having a first micro-embossed surface and a first formed pattern;

a second side having a second micro-embossed surface and a second formed pattern;

a basis weight of between about 35 gsm and about 80 gsm;

a Low Load Thickness of between about 150 micrometers and 400 micrometers according to the Low Load Thickness Test; and

a flexural stiffness of between about 150 grams and about 500 grams according to the Circular Bend Stiffness Test,

wherein the first formed pattern and the second formed pattern are complementary to each other,

wherein the first formed pattern comprises a plurality of first peaks and a plurality of first valleys extending in a first direction, wherein the first peaks alternate with the first valleys in a second direction, perpendicular to the first direction,

wherein the second formed pattern comprises a plurality of second peaks and a plurality of second valleys extending in the first direction, wherein the second peaks alternate with the second valleys in the second direction,

wherein each first peak on the first side of the film is opposite to a second valley on the second side of the film, each first valley on the first side of the film is opposite a second peak on the second side of the film, and a cross-section of the film taken along the second direction has an undulating configuration, and

wherein the interleaf is removable from between the substrates.

2. The film according to claim 1 , wherein the first direction is a machine direction, and wherein the second direction is a transverse direction.

3. The film according to claim 2 , wherein the first side of the film further comprises a third formed pattern comprising a plurality of third peaks and a plurality of third valleys extending in the transverse direction, wherein the third peaks alternate with the third valleys in the machine direction, and wherein the second side of the film further comprises a fourth formed pattern comprising a plurality of fourth peaks and a plurality of fourth valleys extending in the transverse direction, wherein the fourth peaks alternate with the fourth valleys in the machine direction.

4. The film according to claim 3 , wherein each third peak on the first side of the film is opposite to a fourth valley on the second side of the film.

5. The film according to claim 1 , wherein the first direction is a transverse direction, and wherein the second direction is a machine direction.

6. The film according to claim 1 , wherein the flexural stiffness is between about 300 grams and about 350 grams according to the Circular Bend Stiffness Test.

7. The film according to claim 1 , further comprising a Compressibility of between about 20% and about 60%.

8. The film according to claim 1 , further comprising a Resiliency of between about 80% and about 95%.

9. The film according to claim 1 , further comprising a core layer, a first skin layer on one side of the core layer, and a second skin layer on an opposite side of the core layer.

10. The film according to claim 9 , wherein the first skin layer and/or the second skin layer is foamed.

11. The film according to claim 9 , wherein the core layer is foamed.

12. The film according to claim 1 , wherein the film comprises a polyolefin.

13. The film according to claim 12 , wherein the polyolefin comprises polyethylene, high density polyethylene, low density polyethylene, linear low density polyethylene, polypropylene, high crystallinity polypropylene, homopolymer polypropylene, nucleated polypropylene, copolymer polypropylene, or blends thereof.

14. The film according to claim 12 , further comprising at least one additive selected from the group consisting of a slip agent, a nucleating agent, an antioxidant stabilizer, and a surfactant.

15. The film according to claim 1 , wherein the first micro-embossed surface and the second micro-embossed surface each has an average surface roughness Ra in the range of about 0.1 micrometers to about 18.0 micrometers.

16. The film according to claim 1 , wherein the first micro-embossed surface and the second micro-embossed surface each has a surface roughness Rz in the range of about 10 micrometers to about 30 micrometers.