IP Library Granted Patent US 11,241,659
Granted Patent B2
US 11,241,659 · App. 16/755,969 · Granted Feb 8, 2022

Method for manufacturing gas separation membrane and gas separation membrane manufactured thereby

Inventors: Byoungsoo Lee (Daejeon, KR); Sora Bang (Daejeon, KR); Chong Kyu Shin (Daejeon, KR); Keun Won Song (Daejeon, KR); Hyungbae Gil (Daejeon, KR)
Assignee: LG CHEM, LTD.
B01D67/0002B01D53/228B01D69/10B01D71/22B01D2323/02
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Quick Facts
Patent No.
US 11,241,659
App. No.
16/755,969
Granted
Feb 8, 2022
Kind
B2
Abstract

Provided is a method for preparing a gas separation membrane, the method including forming a porous layer by coating a hydrophilic polymer solution on a porous substrate; and forming an active layer by coating a composition for forming an active layer including a polymer of Chemical Formula 1 on the porous layer, wherein in Chemical Formula 1, n is the number of a repeating unit, and is an integer of 500 to 3,000, and R1 to R5 are the same as or different from each other, and each independently is hydrogen, an alkyl group, or —(C═O)R6, and R6 is an alkyl group, wherein the polymer of Chemical Formula 1 is included in an amount from 1% by weight to 5% by weight based on the composition for forming an active layer, and a gas separation membrane prepared using the same.

Claims (26)

1. A method for preparing a gas separation membrane, comprising:

forming a porous layer by coating a hydrophilic polymer solution on a porous substrate; and

forming an active layer by coating a composition for forming an active layer including a polymer of the following Chemical Formula 1 on the porous layer,

wherein the polymer of Chemical Formula 1 is included in an amount from 1% by weight to 5% by weight based on the composition for forming an active layer:

wherein in Chemical Formula 1:

n is a number of a repeating unit, and is an integer of 500 to 3,000; and

R1 to R5 are the same as or different from each other, and each independently is hydrogen, an alkyl group, or —(C═O)R6, and R6 is an alkyl group.

2. The method of claim 1 , wherein the composition for forming an active layer further includes nitromethane.

3. The method of claim 1 , wherein the coating of the composition for forming an active layer is performed using slot coating.

4. The method of claim 1 , wherein each of R1 and R3 to R5 is an alkyl group, and R2 is —(C═O)R6.

5. The method of claim 1 , wherein the hydrophilic polymer is polysulfone, polyethersulfone, polycarbonate, polyethylene oxide, polyimide, polyetherimide, polyetheretherketone, polypropylene, polymethylpentene, polymethyl chloride or polyvinylidene fluoride.

6. The method of claim 1 , wherein the polymer of Chemical Formula 1 has a weight average molecular weight (Mw) of 100,000 to 700,000 g/mol.

7. The method of claim 1 , wherein the polymer of Chemical Formula 1 has a number average molecular weight (Mn) of 80,000 to 400,000 g/mol.

8. The method of claim 1 , further comprising preparing a gutter layer on the porous layer after the forming of the porous layer and before the forming of the active layer.

9. The method of claim 1 , further comprising preparing a protective layer on the active layer after the forming of the active layer.

10. A gas separation membrane comprising:

a porous layer; and

an active layer including a polymer of the following Chemical Formula 1 formed on the porous layer,

wherein the gas separation membrane has a carbon dioxide selectivity of 5 to 30 based on methane:

wherein in Chemical Formula 1:

n is the number of a repeating unit, and is an integer of 500 to 3,000;

R1 and R3 to R5 are the same as or different from each other, and each independently, is an alkyl group having 1 to 10 carbon atoms; and

R2 is —(C═O)R6, and R6 is an alkyl group.

11. The gas separation membrane of claim 10 , which has a carbon dioxide selectivity of 10 to 26.7 based on the methane.

12. The gas separation membrane of claim 10 , wherein R1 and R3 to R5 are a methyl group.

13. The gas separation membrane of claim 10 , wherein R6 is an ethyl group.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 24, 2025
From: LG CHEM, LTD.
To: NANOH2O CO., LTD.
Reel/Frame 073784/0326 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 29, 2020
From: LEE, BYOUNGSOO; SHIN, CHONG KYU; SONG, KEUN WON; GIL, HYUNGBAE; BANG, SORA
To: LG CHEM, LTD.
Reel/Frame 052530/0381 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 14, 2020
From: LEE, BYOUNGSOO; BANG, SORA; SHIN, CHONG KYU; SONG, KEUN WON; GIL, HYUNGBAE
To: LG CHEM, LTD.
Reel/Frame 052391/0153 →
Priority Claims (1)
KR 10-2017-0147530 · Nov 7, 2017 · national
Continuity (1)
Related Publication 20200238219A1 · Jul 30, 2020