Composition for interfacial polymerization of polyamide and manufacturing method for water treatment separation membrane using same
Provided is a composition for interfacial polymerizing polyamide including an amine compound; and one or more types of compounds selected from among a purine-based compound and a pyrimidine-based compound of Chemical Formula 1: wherein, in Chemical Formula 1: X is N or NH; Y is O or OH; Z is O, OH or NH 2 ; R1 and R2 are each hydrogen or a substituted or unsubstituted alkyl group; and is a single bond or a double bond, and a method for manufacturing a water-treatment membrane and a water-treatment membrane using the same.
1. A composition for interfacial polymerizing polyamide comprising:
an amine compound; and
one or more types of compounds selected from among a purine-based compound and a pyrimidine-based compound,
wherein the purine-based compound is one or more selected from among purine, adenine, guanine, hypoxanthine, xanthine, theobromine, caffeine, uric acid and isoguanine,
wherein the pyrimidine-based compound is one or more selected from among uracil, cytosine and thymine,
wherein the purine-based compound is present in an amount from 0.001 wt % to 1 wt % based on 100 wt % of the composition,
wherein the pyrimidine-based compound is present in an amount from 0.001 wt % to 1 wt % based on 100 wt % of the composition; and
wherein, when the composition is contacted with an organic solution containing an acyl halide, an interfacial polymerization forms a polyamide active layer.
2. The composition of claim 1 comprising the purine-based compound and the pyrimidine-based compound, wherein a total amount of the purine-based compound and the pyrimidine-based compound is from 0.01 wt % to 0.2 wt % based on 100 wt % of the composition.
3. The composition of claim 1 , wherein the amine compound is present in an amount from 0.1 wt % to 20 wt % based on 100 wt % of the composition.
4. The composition claim 1 , further comprising a surfactant, wherein the surfactant is present in an amount from 0.01 wt % to 1 wt % based on 100 wt % of the composition.