IP Library Granted Patent US 11,228,161
Granted Patent B2
US 11,228,161 · App. 16/757,774 · Granted Jan 18, 2022

Semiconductor laser array and semiconductor laser array circuit arrangement

Inventors: Martin Mueller (Bernhardswald, DE); Guenther Groenninger (Seubersdorf, DE)
Assignee: OSRAM OLED GMBH
H01S5/3095H01S5/042H01S5/0425H01S5/3054H01S5/4043H01S5/026
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Quick Facts
Patent No.
US 11,228,161
App. No.
16/757,774
Granted
Jan 18, 2022
Kind
B2
Abstract

A semiconductor laser array may include a plurality of semiconductor lasers and a common substrate configured as a common anode of said plurality of semiconductor lasers. Each semiconductor laser may have a pn junction region between the common anode and a cathode contact layer. The pn junction region may include a p-doped layer and an n-doped layer. The p-doped layer of the pn junction region may face the substrate. The semiconductor laser array circuit arrangement may include a semiconductor laser array, each laser may be controlled by a driver with an n-MOSFET.

Claims (27)

1. A semiconductor laser array comprising:

a plurality of semiconductor lasers;

a common substrate configured as a common anode of said plurality of semiconductor lasers;

wherein each semiconductor laser comprises a pn junction region between the common anode and a cathode contact layer, and wherein the pn junction region comprises a p-doped layer and an n-doped layer, and wherein the p-doped layer faces the substrate.

2. The semiconductor laser array according to claim 1 , wherein the pn junction region of at least one semiconductor laser of the plurality of semiconductor lasers comprises a plurality of pn junction regions,

and wherein a tunnel diode is arranged between two adjacent pn junction regions.

3. The semiconductor laser array according to claim 1 , wherein the substrate is an n-doped substrate.

4. The semiconductor laser array according to claim 3 , wherein a tunnel diode is arranged between the n-doped substrate and the adjacent pn junction region.

5. The semiconductor laser array according to claim 1 , wherein the substrate is a p-doped substrate.

6. The semiconductor laser array according to claim 1 ,

wherein the cathode contact layer is n-doped.

7. The semiconductor laser array according to claim 1 ,

wherein each semiconductor laser of the plurality of semiconductor lasers comprises a semiconductor layer stack arranged on the substrate,

wherein the semiconductor layer stack comprises:

the pn junction where the n-doped layer is arranged above the p-doped layer,

and a p-doped tunnel diode layer arranged above an n-doped tunnel diode layer,

wherein the n-doped layer faces the n-doped tunnel diode layer, the p-doped layer faces the p-doped tunnel diode layer, or combinations thereof.

8. The semiconductor laser array according to claim 7 , wherein the plurality of semiconductor lasers are separated from each other by trenches.

9. A semiconductor laser array circuit arrangement comprising a semiconductor laser array according to claim 1 , wherein each semiconductor laser of the plurality of semiconductor lasers are configured to be controlled by a driver with an n-MOSFET.

10. The semiconductor laser array circuit arrangement according to claim 9 ,

wherein the driver comprises a source circuit of the n-MOSFET; wherein the n-MOSFET comprises a drain contact and a source contact wherein the drain contact is electrically conductively connected to the cathode contact layer of one semiconductor laser of the plurality of the semiconductor lasers; wherein the source contact is electrically conductively connected to a reference potential.

11. The semiconductor laser array circuit arrangement according to claim 10 ,

wherein the common anode is connected to a supply potential.

12. A semiconductor laser array comprising:

a plurality of semiconductor lasers; and

a common substrate configured as a common anode of said plurality of semiconductor lasers;

wherein each semiconductor laser comprises a pn junction region between the common anode and a cathode contact layer, wherein the pn junction region comprises a p-doped layer and an n-doped layer, and wherein the p-doped layer of the pn junction region faces the substrate, and wherein the cathode contact layer is p-doped and a tunnel diode is arranged between the cathode contact layer and the adjacent pn junction region.

Assignments (2)
MERGER Recorded Feb 17, 2026
From: OSRAM OLED GMBH
To: AMS-OSRAM INTERNATIONAL GMBH
Reel/Frame 074881/0104 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 10, 2020
From: MUELLER, MARTIN; GROENNINGER, GUENTHER
To: OSRAM OLED GMBH
Reel/Frame 052888/0615 →