Display substrate and manufacturing method thereof including depositing different quantum dot solutions wettable to different material layers
The present disclosure relates to a display substrate and a manufacturing method thereof, and a display device. The display substrate includes a plurality of pixel units each including a first sub-pixel and a second sub-pixel. The method includes: forming a first material layer and a patterned second material layer, the first material layer including a portion corresponding to an area between the first and second sub-pixels, and the second material layer has a first opening exposing the portion of the first material layer, corresponding to the area between the first and second sub-pixels; and forming a first quantum dot solution in a first area corresponding to the first sub-pixel, on the second material layer to form a first color filter sublayer, wherein wettability of the second material layer to the first quantum dot solution is greater than wettability of the first material layer to the first quantum dot solution.
1. A method of manufacturing a display substrate, the display substrate comprising a plurality of pixel units, each of the plurality of pixel units comprising a first sub-pixel and a second sub-pixel, and the method comprising:
forming a first material layer and a second material layer, wherein the first material layer comprises a portion corresponding to an area between the first sub-pixel and the second sub-pixel, and the second material layer has a first opening exposing the portion of the first material layer, corresponding to the area between the first sub-pixel and the second sub-pixel; and
forming a first quantum dot solution in a first area corresponding to the first sub-pixel on the second material layer to form a first color filter sublayer, wherein wettability of the second material layer to the first quantum dot solution is greater than wettability of the first material layer to the first quantum dot solution.
2. The method according to claim 1 , further comprises at least one of:
performing surface treatment on the second material layer to form a second surface layer on a surface of the second material layer before the step of forming, wherein wettability of the second surface layer to the first quantum dot solution is greater than wettability of the second material layer to the first quantum dot solution; or
performing surface treatment on the the exposed portion of the first material layer to form a first surface layer on a surface of the the exposed portion of the first material layer before the step of forming, wherein wettability of the first surface layer to the first quantum dot solution is smaller than wettability of the first material layer to the first quantum dot solution.
3. The method according to claim 2 , wherein the surface treatment is performed using CFx plasma.
4. The method according to claim 1 , wherein the first material layer further comprises a first portion and a second portion corresponding to the first sub-pixel and the second sub-pixel, respectively.
5. The method according to claim 1 , wherein the second material layer comprises an organic material layer and the first material layer comprises a thin film encapsulation layer.
6. The method according to claim 1 , wherein the second material layer comprises: a first filtering material layer for filtering out light with a wavelength of 500 nm or more.
7. The method according to claim 1 , further comprising:
forming a second quantum dot solution in a second area corresponding to the second sub-pixel, on the second material layer to form a second color filter sublayer, wherein wettability of the second material layer to the second quantum dot solution is greater than wettability of the first material layer to the second quantum dot solution.
8. The method according to claim 7 , further comprising:
forming a second filtering material layer that covers the first color filter sublayer and the second color filter sublayer, for filtering out light with a wavelength of 500 nm or less.
9. The method according to claim 1 , wherein the first material layer is hydrophilic, the second material layer is hydrophobic, and the first quantum dot solution is hydrophobic.
10. The method according to claim 8 , wherein:
each of the plurality of pixel units further comprises a third sub-pixel, the second sub-pixel being located between the first sub-pixel and the third sub-pixel;
the first material layer further comprises a third portion corresponding to the third sub-pixel; and
the second material layer further has a second opening exposing the third portion corresponding to the third sub-pixel, of the first material layer.
11. A display substrate comprising a plurality of pixel units, each of the plurality of pixel units comprising a first sub-pixel and a second sub-pixel, and the display substrate comprising:
a first material layer located on a base substrate and comprising a portion corresponding to an area between the first sub-pixel and the second sub-pixel;
a second material layer located on the base substrate, wherein the second material layer has a first opening exposing the portion of the first material layer, corresponding to the area between the first sub-pixel and the second sub-pixel; and
a first color filter sublayer located in a first area corresponding to the first sub-pixel, on the second material layer,
wherein wettability of the second material layer to a quantum dot solution for forming the first color filter sublayer is greater than wettability of the first material layer to the quantum dot solution.
12. The display substrate according to claim 11 , further comprising at least one of a first surface layer or a second surface layer, wherein:
the first surface layer is located on a surface on a side of the first material layer away from the base substrate, and wettability of the first surface layer to the quantum dot solution is smaller than wettability of the first material layer to the quantum dot solution; and
the second surface layer is located on a surface on a side of the second material layer away from the base substrate, and wettability of the second surface layer to the quantum dot solution is greater than wettability of the second material layer to the quantum dot solution.
13. The display substrate according to claim 11 , wherein the first material layer further comprises a first portion and a second portion corresponding to the first sub-pixel and the second sub-pixel, respectively.
14. The display substrate according to claim 11 , wherein the second material layer comprises an organic material layer and the first material layer comprises a thin film encapsulation layer.
15. The display substrate according to claim 14 , wherein the second material layer comprises: a first filtering material layer for filtering out light with a wavelength of 500 nm or more.
16. The display substrate according to claim 11 , further comprising:
a second color filter sublayer located in a second area corresponding to the second sub-pixel, on the second material layer.
17. The display substrate according to claim 16 , further comprising: a second filtering material layer that covers the first color filter sublayer and the second color filter sublayer, for filtering out light with a wavelength of 500 nm or less.
18. The display substrate according to claim 17 , wherein:
each of the plurality of pixel units further comprises a third sub-pixel, the second sub-pixel being located between the first sub-pixel and the third sub-pixel;
the first material layer further comprises a third portion corresponding to the third sub-pixel; and
the second material layer further has a second opening exposing the third portion corresponding to the third sub-pixel, of the first material layer.
19. The display substrate according to claim 11 , further comprising:
a light-emitting unit located on the base substrate, wherein the first color filter sublayer is arranged on a light-emitting side of the light-emitting unit.
20. A display device, comprising the display substrate according to claim 11 .