IP Library Granted Patent US 11,239,059
Granted Patent B2
US 11,239,059 · App. 16/764,898 · Granted Feb 1, 2022

Active gas generation apparatus

Inventors: Kensuke Watanabe (Tokyo, JP); Shinichi Nishimura (Tokyo, JP); Ren Arita (Tokyo, JP); Yoshihito Yamada (Tokyo, JP); Yoichiro Tabata (Tokyo, JP)
Assignee: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
H01J37/32568C23C16/452C23C16/455C23C16/50H01J37/3244H01J37/32082H01J37/32348H01J2237/002H01J2237/332
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Quick Facts
Patent No.
US 11,239,059
App. No.
16/764,898
Granted
Feb 1, 2022
Kind
B2
Abstract

The present invention has features (1) to (3). The feature (1) is that “an active gas generation electrode group is formed in such a manner that a ground side electrode component supports a high-voltage side electrode component”. The feature (2) is that “stepped parts are provided in a discharge space outside region of a dielectric electrode in the high-voltage side electrode component, and project downward, and by a formation height of these stepped parts, the gap length of a discharge space is defined”. The feature (3) is that “the high-voltage side electrode component and the ground side electrode component are formed to have the thickness of a discharge space formation region relatively thin and the thickness of a discharge space outside region relatively thick”.

Claims (24)

1. An active gas generation apparatus comprising active gas generation electrodes and an alternating-current power source, said active gas generation electrodes including a first electrode and a second electrode provided below said first electrode, said alternating-current power source being configured to apply alternating-current voltage to said first and second electrodes so that said first electrode is at a high voltage,

said first electrode including a first dielectric film and a first metal electrode on an upper surface of said first dielectric film, said second electrode including a second dielectric film and a second metal electrode on a lower surface of said second dielectric film, a space in which said first and second metal electrodes overlap each other in plan view defining a discharge space,

a material gas supply path to provide a material gas to the discharge space from an external material gas supply, wherein

an application of said alternating-current voltage by said alternating-current power source causing a discharge phenomenon in said discharge space, with the material gas therein, to generate an active gas, said active gas being ejected through a gas ejection port in said second electrode,

each of said first and second dielectric films overlap said discharge space and a discharge exclusion space that is other than said discharge space, and

said active gas generation apparatus further comprising:

a first auxiliary member provided surrounding a side surface and an upper surface of said active gas generation electrodes; and

a second auxiliary member having a main surface of an upper part on which said active gas generation electrodes and said first auxiliary member are arranged,

an alternating-current voltage application space, separated from said discharge space, between said active gas generation electrodes and each of said first and second auxiliary members, said second auxiliary member including an auxiliary member gas discharge port through which active gas ejected from said gas ejection port passes, said first and second auxiliary members being integrally coupled, and

said active gas generation apparatus further comprising:

a housing of metal including a hollow space that houses all of said active gas generation electrodes and said second auxiliary member and at least part of said first auxiliary member, said housing including a housing gas discharge port through which the active gas passing through said auxiliary member gas discharge port is discharged to outside of said active gas generation apparatus, and a housing contact space between said housing and each of said first and second auxiliary members,

wherein said first and second auxiliary members form part of the material gas supply path, through which externally supplied material gas is guided to said discharge space, independently from said alternating-current voltage application space so that gas flow in said discharge space and gas flow in said alternating-current voltage application space are separated from each other, and

said active gas generation apparatus has features (1) to (5) below:

(1) said second electrode supports said first electrode,

(2) said first dielectric film includes a stepped part projecting downward in said discharge exclusion space, and a gap length of said discharge space is defined by a height of said stepped part,

(3) a thickness of said discharge space is less than that of said discharge exclusion space,

(4) said housing is fastened to said first auxiliary member only in an upper surface outside the hollow space to form said housing contact space in the hollow space without contacting a side surface of said first auxiliary member and a bottom surface of said second auxiliary member, and

(5) all of said first and second auxiliary members are formed of metal material.

2. The active gas generation apparatus according to claim 1 ,

wherein said first and second auxiliary members include a cooling water path for a cooling water circulation path that guides cooling water supplied from outside of said active gas generation apparatus to said second auxiliary member.

3. The active gas generation apparatus according to claim 1 ,

wherein said first auxiliary member further includes a second gas supply port through which second gas other than the material gas is externally supplied to said alternating-current voltage application space, and said second gas supply port is provided independently from said material gas supply path.

4. The active gas generation apparatus according to claim 1 ,

wherein pressure in said alternating-current voltage application space is higher than pressure in said discharge space.

Assignments (2)
CHANGE OF NAME Recorded Apr 26, 2024
From: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
To: TMEIC CORPORATION
Reel/Frame 067244/0359 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 18, 2020
From: WATANABE, KENSUKE; NISHIMURA, SHINICHI; ARITA, REN; YAMADA, YOSHIHITO; TABATA, YOICHIRO
To: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
Reel/Frame 052682/0001 →
Continuity (1)
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