CURABLE FORMULATION WITH HIGH REFRACTIVE INDEX AND ITS APPLICATION IN SURFACE RELIEF GRATING USING NANOIMPRINTING LITHOGRAPHY
Disclosed herein are materials for nanoimprinting lithography (NIL) and devices molded from the materials using NIL processes. According to certain aspects, an NIL material includes a mixture including a light-sensitive base resin and nanoparticles. The light-sensitive base resin is characterized by a first refractive index ranging from 1.58 to 1.77. The nanoparticles are characterized by a second refractive index greater than the first refractive index of the light-sensitive base resin. The mixture is curable to form a cured material characterized by a third refractive index greater than 1.78. The nanoparticles include from 45 wt. % to 90 wt. % of the cured material.
1 . An optical component, comprising:
a binder including a base resin; and
nanoparticles dispersed in the binder;
wherein:
the base resin is characterized by a first refractive index ranging from 1.58 to 1.77;
the nanoparticles are characterized by a second refractive index greater than the first refractive index of the base resin;
the nanoparticles comprise from 45 wt. % to 90 wt. % of a combined weight of the base resin and the nanoparticles; and
the optical component is characterized by a third refractive index greater than 1.78.
2 . The optical component of claim 1 , wherein the optical component comprises a grating, and wherein the grating is characterized by at least one of: a depth greater than 100 nm, a high aspect ratio greater than 3:1, a duty cycle between 10% and 90%, or a slant angle greater than 30°.
3 . The optical component of claim 1 , wherein the third refractive index of the optical component is greater than 1.8, greater than 1.85, or greater than 1.9.
4 . The optical component of claim 1 , wherein a decrease in the first refractive index of the base resin corresponds to an increase in the third refractive index of the optical component.
5 . The optical component of claim 1 , wherein the base resin comprises an organic base resin that is free of silicon.
6 . The optical component of claim 1 , wherein the base resin comprises a light-sensitive base resin, and wherein the light-sensitive base resin comprises a cross-linking group, and wherein the cross-linking group comprises an ethylenically unsaturated group or an oxirane ring.
7 . The optical component of claim 1 , wherein the base resin comprises at least one derivative of bisfluorene, dithiolane, thianthrene, biphenol, o-phenylphenol, phenoxy benzyl, bisphenol A, bisphenol F, benzyl, or phenol.
8 . The optical component of claim 1 , wherein the nanoparticles comprise from 45 wt. % to 85 wt. %, 45 wt. % to 80 wt. %, or 45 wt. % to 75 wt. % of the combined weight of the base resin and the nanoparticles.
9 . The optical component of claim 1 , wherein the nanoparticles comprise at least one of titanium oxide, zirconium oxide, hafnium oxide, tungsten oxide, zinc tellurium, gallium phosphide, or a derivative of any of the preceding materials.
10 . A nanoimprint lithography (NIL) material, comprising:
a mixture including:
a light-sensitive base resin characterized by a first refractive index ranging from 1.58 to 1.77; and
nanoparticles characterized by a second refractive index greater than the first refractive index of the light-sensitive base resin;
wherein:
the mixture is curable to form a cured material characterized by a third refractive index greater than 1.78; and
the nanoparticles comprise from 45 wt. % to 90 wt. % of the cured material.
11 . The NIL material of claim 10 , wherein the mixture is characterized in that a decrease in the first refractive index of the light-sensitive base resin corresponds to an increase in the third refractive index of the cured material.
12 . The NIL material of claim 10 , wherein the first refractive index of the light-sensitive base resin ranges from 1.6 to 1.73.
13 . The NIL material of claim 10 , wherein the light-sensitive base resin comprises a cross-linking group, and wherein the cross-linking group comprises one of an ethylenically unsaturated group or an oxirane ring.
14 . The NIL material of claim 10 , wherein the light-sensitive base resin comprises at least one derivative of bisfluorene, dithiolane, thianthrene, biphenol, o-phenylphenol, phenoxy benzyl, bisphenol A, bisphenol F, benzyl, or phenol.
15 . The NIL material of claim 10 , wherein the nanoparticles comprise at least one of titanium oxide, zirconium oxide, hafnium oxide, tungsten oxide, zinc tellurium, gallium phosphide, or a derivative of any of the preceding materials.
16 . The NIL material of claim 10 , wherein the mixture further comprises at least one of a photo radical generator or a photo acid generator.
17 . The NIL material of claim 10 , wherein the mixture is flowable at room temperature.
18 . An optical component, comprising:
a binder including an organic base resin; and
nanoparticles dispersed in the binder;
wherein:
the organic base resin is characterized by a first refractive index ranging from 1.45 to 1.8;
the nanoparticles are characterized by a second refractive index greater than the first refractive index of the organic base resin;
the nanoparticles comprise from 45 wt. % to 90 wt. % of a combined weight of the organic base resin and the nanoparticles; and
the optical component is characterized by a third refractive index greater than 1.78.
19 . The optical component of claim 18 , wherein the nanoparticles comprises at least one of titanium oxide, zirconium oxide, hafnium oxide, tungsten oxide, zinc tellurium, gallium phosphide, or a derivative of any of the preceding materials.
20 . The optical component of claim 18 , wherein the organic base resin comprises at least one derivative of bisfluorene, dithiolane, thianthrene, biphenol, o-phenylphenol, phenoxy benzyl, bisphenol A, bisphenol F, benzyl, or phenol.