Methods for producing perovskite-containing devices
The present disclosure relates to a method that includes applying a first perovskite precursor solution to a substrate to form a first liquid film of the first perovskite precursor solution on the substrate; from the first liquid film, forming a first intermediate solid perovskite layer on the substrate; repeating at least once, both the applying and the forming, resulting in the creation of at least one additional intermediate solid perovskite layer; and treating a last intermediate solid perovskite layer, resulting from the at least one additional applying and the at least one additional forming, to create a final solid perovskite layer.
1. A method comprising:
a series of applying and converting steps comprising:
a first applying of a first liquid layer of a first solution comprising a perovskite precursor to a substrate;
a first converting of the first liquid layer to a first solid perovskite layer;
a second applying of a second liquid layer of a second solution comprising a perovskite precursor to the first solid perovskite layer; and
a second converting of the second liquid layer to a second solid perovskite layer
wherein:
the second solution dissolves a first portion of the first solid perovskite layer,
a second non-dissolved portion of the first solid perovskite layer remains on the substrate upon which the second solid perovskite layer nucleates and forms, and
the series of applying and converting steps results in a final solid perovskite layer.
2. The method of claim 1 , further comprising:
a third applying of a third liquid layer of a third solution comprising a perovskite precursor to the second solid perovskite layer; and
a third converting of the third liquid layer to a third solid perovskite layer.
3. The method of claim 1 , wherein:
the perovskite precursor of the first solution comprises a precursor for a perovskite defined by ABX 3 ,
A is a first cation, B is a second cation, and X is an anion.
4. The method of claim 3 , wherein:
the perovskite precursor of the first solution comprises at least one of CsPbI 3 , FAPbI 3 , MAPbBr 3 , PbI 2 , or PbBr 2 , FA is formamidinium, and MA is methylammonium.
5. The method of claim 4 , wherein the final solid perovskite layer comprises Cs (1-x-y) FA x MA y PbI (3-z) Br z , 0≤x≤1, 0≤y≤1, and 0≤z≤3.
6. The method of claim 3 , wherein the first solution further comprises a polar solvent.
7. The method of claim 6 , wherein the polar solvent comprises at least one of dimethyl formamide (DMF)/dimethyl sulfoxide (DMSO), NN-dimethylformamide, γ-butyrolactone, dimethylacetamide, acrylonitrile, tetrahydrofuran, N-methyl-2-pyrrolidone, 1,3-dimethylimidazolidin-2-one, or 1,3-dimethyl-3,4,5,6-tetrahydropyrimidin-2(1H)-one.
8. The method of claim 1 , wherein the perovskite precursor of the first solution comprises a perovskite quantum dot.
9. The method of claim 1 , wherein the first solution used during the first applying comprises a first perovskite precursor.
10. The method of claim 9 , wherein the second solution used during a second applying comprises a second perovskite precursor that is different from the first perovskite precursor.
11. The method of claim 1 , wherein each applying is performed by at least one of a liquid phase processing method, a vapor phase processing method, or a gas phase processing method.
12. The method of claim 1 , wherein the final solid perovskite layer comprises at least one of a physical property or a performance metric that is measurably better than the corresponding physical property or the performance metric of the first solid perovskite layer.
13. The method of claim 1 , wherein the at least one of the first converting or the second converting is performed by contacting at least one of the first liquid layer or the second liquid layer with a solvent.
14. The method of claim 13 , wherein the solvent comprises chlorobenzene.
15. The method of claim 1 , further comprising treating the second solid perovskite layer to form the final solid perovskite layer.
16. The method of claim 15 , wherein the treating comprises annealing the second solid perovskite layer.
17. The method of claim 7 , wherein the polar solvent comprises DMF and DMSO at a volume ratio of about 4 : 1 (DMF:DMSO).
18. The method of claim 12 , wherein the at least one of the physical property or the performance metric comprises at least one of a grain size, a carrier lifetime, a mobility, a defect density, a device efficiency, or a device stability.
19. The method of claim 18 , wherein the at least one physical property or performance metric is measurable by at least one of XRD, time-resolved microwave conductivity, transient absorption, space-charge-limited current, scanning electron microscopy, TRPL, or photocurrent density-voltage.
20. The method of claim 1 , wherein:
the final solid perovskite layer comprises a gradient layer, and
the second non-dissolved portion of the first solid perovskite layer is positioned between the substrate and the gradient layer.