IP Library Granted Patent US 11,591,270
Granted Patent B2
US 11,591,270 · App. 16/785,142 · Granted Feb 28, 2023

Doped silicon carbide ceramic matrix composite

Inventors: Ying She (East Hartford, CT); Andrew J. Lazur (Laguna Beach, CA); Kathryn S. Read (Marlborough, CT)
Assignee: Raytheon Technologies Corporation
C04B41/87C04B35/565C04B2235/5212C04B2235/5244
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,591,270
App. No.
16/785,142
Granted
Feb 28, 2023
Kind
B2
Abstract

A method for forming ceramic matrix composite (CMC) component includes forming a fiber preform, positioning the fiber preform into a chemical vapor infiltration reactor chamber, and densifying the fiber preform. Densification includes infiltrating the fiber preform with a first gas comprising precursors of silicon carbide and infiltrating the fiber preform with a second gas comprising a first rare earth element, wherein the steps of infiltrating the fiber preform with the first gas and infiltrating the fiber preform with the second gas are conducted simultaneously to produce a first rare earth-doped silicon carbide matrix in a first region of the component.

Claims (48)

1. A method for forming ceramic matrix composite (CMC) component, the method comprising:

forming a fiber preform;

positioning the fiber preform into a chemical vapor infiltration reactor chamber; and

densifying the fiber preform, wherein densification comprises:

infiltrating the fiber preform with a first gas comprising precursors of silicon carbide;

infiltrating the fiber preform with a second gas comprising a first rare earth element;

wherein the steps of infiltrating the fiber preform with the first gas and infiltrating the fiber preform with the second gas are conducted simultaneously to produce a first rare earth-doped silicon carbide matrix in a first region of the component;

discontinuing flow of the second gas to the reactor chamber;

infiltrating the fiber preform with only the first gas to form a first silicon carbide matrix in a second region outward from the first region;

infiltrating the fiber preform with the first gas and the second gas to form the first rare earth-doped silicon carbide matrix in a third region outward from the second region;

discontinuing flow of the second gas to the reactor chamber; and

infiltrating the fiber preform with the first gas to form a second silicon carbide matrix in a fourth region adjacent to and outward from the third region and forming an outermost layer of the matrix.

2. The method of claim 1 , wherein the second gas comprises an organometallic compound.

3. The method of claim 2 , wherein the organometallic compound is tris- cyclopentadienyl ytterbium.

4. The method of claim 1 , wherein the rare earth-doped matrix in the first region comprises between 1 and 25 percent of the first rare earth element by atomic percent.

5. The method of claim 4 , and further comprising varying a flow rate of the second gas into the reactor chamber to vary a concentration of the rare earth element in the doped silicon carbide matrix.

6. The method of claim 5 , wherein the flow rate of the second gas is varied to provide a doped silicon carbide matrix region comprising a continuous gradient of the first rare earth element.

7. The method of claim 6 , wherein the flow rate of the second gas is decreased as densification progresses outward from fibers of the fiber preform.

8. The method of claim 6 , wherein the flow rate of the second gas is increased as densification progresses toward an outer boundary of the fiber preform.

9. The method of claim 1 , and further comprising:

discontinuing flow of the second gas to the reactor chamber; and

infiltrating the fiber preform with the first gas and a third gas, the third gas comprising a second rare earth element different from the first rare earth element, to form a second rare earth-doped silicon carbide matrix in a fifth region outward from the first region.

10. The method of claim 1 , and further comprising providing an interface coating on the fibers of the fiber preform prior to densification.

11. A method for forming ceramic matrix composite (CMC) component, the method comprising:

forming a fiber preform;

positioning the fiber preform into a chemical vapor infiltration reactor chamber; and

densifying the fiber preform, wherein densification comprises:

infiltrating the fiber preform with a first gas comprising precursors of silicon carbide; and

infiltrating the fiber preform with a second gas comprising a first rare earth element;

wherein the steps of infiltrating the fiber preform with the first gas and infiltrating the fiber preform with the second gas are conducted simultaneously to produce a first rare earth-doped silicon carbide matrix in a first region of the component;

discontinuing flow of the second gas to the reactor chamber; and

infiltrating the fiber preform with the first gas and a third gas, the third gas comprising a second rare earth element different from the first rare earth element, to form a second rare earth-doped silicon carbide matrix in a second region outward from the first region.

12. The method of claim 11 , wherein the steps of infiltrating the fiber preform with the first gas and second gas and infiltrating the fiber preform with the first gas and third gas are separated by a step of infiltrating the fiber preform with only the first gas to form a first silicon carbide matrix in a third region that separates the first and second regions.

13. The method of claim 12 , and further comprising:

discontinuing flow of the third gas to the reactor chamber; and

infiltrating the fiber preform with the first gas to form a second silicon carbide matrix in a fourth region adjacent to and outward from the second region and forming an outermost layer of the matrix.

14. The method of claim 11 , wherein the first gas comprises a first organometallic compound and the second gas comprises a second organometallic compound.

15. A method for forming ceramic matrix composite (CMC) component, the method comprising:

forming a fiber preform;

positioning the fiber preform into a chemical vapor infiltration reactor chamber; and

densifying the fiber preform, wherein densification comprises:

infiltrating the fiber preform with a first gas comprising precursors of silicon carbide;

infiltrating the fiber preform with a second gas comprising a first rare earth element;

wherein the steps of infiltrating the fiber preform with the first gas and infiltrating the fiber preform with the second gas are conducted simultaneously to produce a first rare earth-doped silicon carbide matrix in a first region of the component;

decreasing a flow rate of the second gas as densification progresses outward from fibers of the fiber preform to form a matrix in a second region outward from the first region, wherein the first region adjacent to the fibers has a higher concentration of the first rare earth element than the second region; and

increasing the flow rate of the second gas as densification progresses toward an outer boundary of the fiber preform to form a matrix in a third region having a higher concentration of the first rare earth element than the second region, wherein the second region is disposed between the first and third regions.

16. The method of claim 15 , wherein the second gas comprises tris-cyclopentadienyl ytterbium.

17. The method of claim 15 , wherein the first rare earth-doped matrix in the first region comprises between 1 and 25 percent of the first rare earth element by atomic percent.

Assignments (4)
CHANGE OF NAME Recorded Jul 27, 2023
From: RAYTHEON TECHNOLOGIES CORPORATION
To: RTX CORPORATION
Reel/Frame 064714/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE SPELLING ON THE ADDRESS 10 FARM SPRINGD ROAD FARMINGTONCONNECTICUT 06032 PREVIOUSLY RECORDED ON REEL 057190 FRAME 0719. ASSIGNOR(S) HEREBY CONFIRMS THE CORRECT SPELLING OF THE ADDRESS 10 FARM SPRINGS ROAD FARMINGTON CONNECTICUT 06032. Recorded Aug 19, 2021
From: UNITED TECHNOLOGIES CORPORATION
To: RAYTHEON TECHNOLOGIES CORPORATION
Reel/Frame 057226/0390 →
CHANGE OF NAME Recorded Aug 16, 2021
From: UNITED TECHNOLOGIES CORPORATION
To: RAYTHEON TECHNOLOGIES CORPORATION
Reel/Frame 057190/0719 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 7, 2020
From: SHE, YING; LAZUR, ANDREW J.; READ, KATHRYN S.
To: UNITED TECHNOLOGIES CORPORATION
Reel/Frame 051755/0255 →