IP Library Granted Patent US 11,986,775
Granted Patent B2
US 11,986,775 · App. 16/788,733 · Granted May 21, 2024

Methods and apparatus for forming apertures in a solid state membrane using dielectric breakdown

Inventors: Ping Xie (Needham, MA); Ken Healy (Oxford, GB); Justin Millis (Oxford, GB)
Assignee: Oxford Nanopore Technologies PLC
B01D67/0062B01D69/02B01D69/06B01D69/12C12Q1/6869C25F3/02C25F3/14C25F7/00G01N33/48721B01D2323/42B01D2325/021B01D2325/06B82Y40/00
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Quick Facts
Patent No.
US 11,986,775
App. No.
16/788,733
Granted
May 21, 2024
Kind
B2
Abstract

Methods and apparatus for forming apertures in a solid state membrane using dielectric breakdown are provided. In one disclosed arrangement a plurality of apertures are formed. The membrane comprises a first surface area portion on one side of the membrane and a second surface area portion on the other side of the membrane. Each of a plurality of target regions comprises a recess or a fluidic passage opening out into the first or second surface area portion. The method comprises contacting all of the first surface area portion of the membrane with a first bath comprising ionic solution and all of the second surface area portion with a second bath comprising ionic solution. A voltage is applied across the membrane via first and second electrodes in respective contact with the first and second baths comprising ionic solutions to form an aperture at each of a plurality of the target regions in the membrane.

Claims (9)

1. A method of forming a plurality of apertures in a solid state membrane using dielectric breakdown, wherein the membrane comprises a first surface area portion on one side of the membrane and a second surface area portion on the other side of the membrane, and each of a plurality of target regions comprises a recess or fluidic passage in the membrane that opens out into the first or second surface area portion, the method comprising:

contacting all of the first surface area portion of the membrane with a first bath comprising ionic solution and all of the second surface area portion with a second bath comprising ionic solution; and

applying a voltage across the membrane via first and second electrodes in respective contact with the first and second baths comprising ionic solutions to form an aperture at each of a plurality of the target regions in the membrane;

wherein:

the membrane comprises a first layer and a second layer; and

the formation of an aperture at each of the plurality of target regions occurs by dielectric breakdown through at least a portion of the second layer, wherein the second layer is formed by atomic layer deposition;

wherein the second layer comprises a plurality of sub-layers, each sub-layer formed by atomic layer deposition, wherein the plurality of sublayers comprises a sequence of sub-layers that repeats a plurality of times, each repeating sequence comprising at least a first sub-layer and a second sub-layer directly adjacent to the first sub-layer;

wherein the first sub-layers are non-epitaxial with respect to the second sub-layers;

wherein the first sub-layers comprise HfO 2 and the second sub-layers comprise Al 2 O 3 .

Assignments (4)
CHANGE OF NAME Recorded Jan 14, 2022
From: OXFORD NANOPORE TECHNOLOGIES LIMITED
To: OXFORD NANOPORE TECHNOLOGIES PLC
Reel/Frame 058737/0664 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 21, 2021
From: OXFORD NANOPORE TECHNOLOGIES INC.
To: OXFORD NANOPORE TECHNOLOGIES LTD.
Reel/Frame 055987/0776 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 18, 2021
From: OXFORD NANOPORE TECHNOLOGIES LTD.
To: OXFORD NANOPORE TECHNOLOGIES INC.
Reel/Frame 055317/0522 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 6, 2020
From: XIE, PING; HEALY, KEN; MILLIS, JUSTIN
To: OXFORD NANOPORE TECHNOLOGIES INC.
Reel/Frame 052036/0326 →
Priority Claims (1)
GB 1508669 · May 20, 2015 · national
Continuity (2)
Continuation 15575798
Related Publication 20200179880A1 · Jun 11, 2020