IP Library Granted Patent US 11,094,426
Granted Patent B2
US 11,094,426 · App. 16/796,849 · Granted Aug 17, 2021

Vacuum chamber arrangement for charged particle beam generator

Inventors: Alexander Hendrik Vincent Van Veen (Rotterdam, NL); Willem Henk Urbanus (Delft, NL); Marco Jan-Jaco Wieland (Delft, NL)
Assignee: ASML Netherlands B.V.
G21K5/04G21K1/02H01J37/12H01J37/16H01J37/3007H01J37/3177H01J2237/002H01J2237/024H01J2237/0213H01J2237/0216H01J2237/0262H01J2237/032H01J2237/1207H01J2237/1215H01J2237/16H01J2237/1825H01J2237/30472
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Quick Facts
Patent No.
US 11,094,426
App. No.
16/796,849
Granted
Aug 17, 2021
Kind
B2
Abstract

The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

Claims (39)

1. A charged particle beam generator, comprising:

a beam source for generating a charged particle beam; and

an electrode stack including a plurality of stacked electrodes for manipulating the charged particle beam;

wherein the plurality of stacked electrodes include a first electrode comprising a first electrode body that accommodates a first cooling conduit inside the electrode body for transferring a cooling liquid,

wherein the first cooling conduit comprises a first opening for connection to a liquid supply structure and a second opening for connection to a liquid discharge structure, the first opening and the second opening being located at a same side of the first electrode body, and

wherein the charged particle beam generator is formed to be insertable into, supportable by, and removable from an external reference frame provided inside a vacuum chamber of a charged particle projection system.

2. The charged particle beam generator of claim 1 , wherein the first electrode body is provided with a central electrode aperture, and wherein the beam source and the central electrode aperture are coaxially aligned such that the charged particle beam passes the central electrode aperture.

3. The charged particle beam generator of claim 1 , wherein the first opening and the second opening are located in a side surface of the first electrode.

4. The charged particle beam generator of claim 2 , wherein the first cooling conduit interconnects the first opening and the second opening via a conduit trajectory provided inside the first electrode body and around the central electrode aperture.

5. The charged particle beam generator of claim 1 , wherein the first cooling conduit is connected to an electrically insulating conduit member provided outside of an outer perimeter of the electrode body.

6. The charged particle beam generator of claim 1 , wherein the plurality of stacked electrodes include a second electrode comprising a second electrode body that accommodates a second cooling conduit, and the first cooling conduit and the second cooling conduit are connected in series.

7. The charged particle beam generator of claim 6 , wherein the cooling liquid is conveyed from the second electrode to the first electrode and wherein the second electrode is located downstream from the first electrode in the electrode stack.

8. The charged particle beam generator of claim 1 , wherein the electrode body has a disk shape or an oblate ring shape.

9. A charged particle beam generator, comprising:

a beam source for generating a charged particle beam;

an electrode stack including a plurality of stacked electrodes for manipulating the charged particle beam; and

a support member connected to a region of the electrode stack at a first end and to an external reference frame at a second end to support the electrode stack with respect to an external reference frame,

wherein the charged particle beam generator is formed to be insertable into, supportable by, and removable from the external reference frame provided inside a vacuum chamber of a charged particle projection system.

10. The charged particle beam generator of claim 9 , wherein the external reference frame is suspended inside the vacuum chamber.

11. The charged particle beam generator of claim 9 , wherein the plurality of stacked electrodes include a first electrode in the region of the electrode stack,

wherein the first electrode comprises a ring-shaped electrode body provided with a top surface and a bottom surface, the bottom surface and the top surface being connected to each other via a side surface defining an outer electrode perimeter.

12. The charged particle beam generator of claim 11 , wherein the first electrode comprises a support portion along the electrode perimeter, and

wherein the support portion is configured to accommodate a spacing support member that is configured to maintain a predetermined distance between the first electrode and an adjacent electrode among the plurality of stacked electrodes.

13. The charged particle beam generator 31 , wherein the first electrode comprises an electrode support arm, and

wherein the electrode support arm interconnects the outer electrode perimeter with the support portion.

14. The charged particle beam generator 32 , wherein the electrode support arm is radially movable along the outer electrode perimeter.

15. The charged particle beam generator 33 , wherein the electrode support arm comprises a radially elongated body that is connected at one end to the outer electrode perimeter and connected at an opposite end to the support portion.

16. A charged particle beam generator, comprising:

a beam source for generating a charged particle beam;

an electrode stack including a plurality of stacked electrodes for manipulating the charged particle beam; and

a support member connected to a region of the electrode stack at a first end and to an external reference frame at a second end to support the electrode stack with respect to an external reference frame,

wherein the charged particle beam generator is formed to be insertable into, supportable by, and removable from the external reference frame provided inside a vacuum chamber of a charged particle projection system,

wherein the plurality of stacked electrodes include a first electrode comprising an electrode body that accommodates a cooling conduit inside the electrode body for transferring a cooling liquid, and

wherein the cooling conduit comprises a first opening for connection to a liquid supply structure and a second opening for connection to a liquid discharge structure.

17. The charged particle beam generator of claim 16 , wherein the first electrode comprises a ring-shaped electrode body provided with a top surface and a bottom surface, the bottom surface and the top surface being connected to each other via a side surface defining an outer electrode perimeter.

18. The charged particle beam generator of claim 17 , wherein the first electrode comprises a support portion along the electrode perimeter, and

wherein the support portion is configured to accommodate a spacing support member that is configured to maintain a predetermined distance between the first electrode and an adjacent electrode among the plurality of stacked electrodes.

19. The charged particle beam generator of claim 17 , wherein the top surface of the electrode body is provided with a recess having a shape corresponding to the cooling conduit that is formed as a conduit tube, and wherein the conduit tube is located inside the recess.

20. The charged particle beam generator of claim 17 , wherein the first electrode comprises a radially movable electrode support arm along the outer electrode perimeter, and wherein the electrode support arm interconnects the outer electrode perimeter with the support portion.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 20, 2020
From: WIELAND, MARCO JAN-JACO; VAN VEEN, ALEXANDER HENDRIK VINCENT; URBANUS, WILLEM HENK
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 051882/0656 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 20, 2020
From: WIELAND, MARCO JAN-JACO; URBANUS, WILLEM HENK
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 051882/0684 →
COURT APPOINTMENT Recorded Feb 20, 2020
From: MAPPER LITHOGRAPHY HOLDING B.V.; MAPPER LITHOGRAPHY IP B.V.; MAPPER LITHOGRAPHY B.V.
To: J.J. WITTEKAMP
Reel/Frame 051985/0731 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 20, 2020
From: J.J. WITTEKAMP
To: ASML NETHERLANDS B.V.
Reel/Frame 051985/0742 →