Techniques for contamination detection in additive fabrication and related systems and methods
According to some aspects, techniques are provided for identifying contamination in additive fabrication devices by measuring light interacting with the contamination using one or more light sensors. Contamination located between a light source and a target of a light source can affect the uniformity and intensity of the light source when incident upon the target. For instance, in an inverse stereolithography device, contamination located between a light source and a liquid photopolymer resin that is to be cured can affect the quality of the fabricated object when the light is scattered or blocked by the contamination. Identifying the presence of contamination between the light source and the liquid photopolymer resin and alerting the user prior to initiating a fabrication process may increase the quality of the resulting fabricated object and improve the user experience by saving time and photocurable liquid.
1. A device comprising:
a container;
a movable stage arranged below the container and configured to move in a first direction below the container, the movable stage comprising:
an optical window;
a light source below the optical window arranged to direct light towards the optical window; and
at least one light sensor below the optical window arranged to receive light emitted by the light source and reflected through the optical window;
at least one processor; and
at least one computer readable medium comprising instructions that, when executed by the at least one processor:
control the light source to direct light onto the optical window; and
identify contamination on the optical window based at least in part on the light received by the at least one light sensor.
2. The device of claim 1 , wherein the instructions, when executed by the at least one processor, further identify contamination on the optical window based at least in part on a known calibration pattern.
3. The device of claim 2 , wherein the known calibration pattern comprises at least one light scattering area and at least one light absorbing area.
4. The device of claim 1 , wherein the light source is a laser.
5. The device of claim 1 , wherein the light sensor is a photodiode.
6. The device of claim 1 , wherein identifying contamination on the optical window based at least in part on the light received by the at least one light sensor comprises:
identifying contamination on the optical window based at least in part on a known calibration pattern;
filtering out false indications of contamination based at least in part on the known calibration pattern; and
categorizing contamination as scattering or absorptive based at least in part on the known calibration pattern.
7. The device of claim 1 , wherein the instructions, when executed by the at least one processor, further move the movable stage along the first direction whilst operating at least one optical component to direct the light from the light source along a second direction perpendicular to the first direction, thereby scanning the light from the light source over a two-dimensional region.
8. The device of claim 1 , wherein the instructions, when executed by the at least one processor, further operate at least one optical component to direct the light from the light source back and forth through a plurality of locations along the first direction and a second direction perpendicular to the first direction, thereby scanning the light over a two-dimensional area.
9. The device of claim 1 , wherein the device is an additive fabrication device configured to form layers of solid material on a build surface by directing light through the optical window onto a liquid photopolymer.
10. The device of claim 9 , wherein the additive fabrication device is configured to form the layers of solid material by directing light other than light from the light source through the optical window onto the liquid photopolymer.