Focus assessment in dynamically focused laser system

1. A method for use in a three-axis galvanometric scanning system (three-axis GSS) having a laser device to generate a laser beam, an X-Y scan head module to position the laser beam on a work piece, and a dynamic focus module to synchronize movement of a lens relative to the laser device with positioning of the laser beam by the X-Y scan head module, the method including assessing whether the dynamic focus module is associated with a focus calibration error, the method further comprising:

identifying a reference layer associated with a surface of the work piece, and positive and negative offset distances each a different distance above or below the reference layer, respectively;

selecting a target pattern based on the offset distances, wherein the selected pattern includes an individual line for each offset distance; and

commanding the three-axis GSS to draw the selected pattern on the work piece, wherein during operation of the three-axis GSS based on the commanding the dynamic focus module controls movement of the lens to maintain focus of the laser beam in a focus layer;

wherein the assessing whether the dynamic focus module is associated with the focus calibration error is based on correlating laser marking artifacts on the work piece to ones of the individual lines of the selected pattern.

2. The method of claim 1 , further comprising estimating a distance between the focus layer and the reference layer using the offset distances of the correlated individual lines.

3. The method of claim 2 , wherein estimating the distance between the focus layer and the reference layer using the offset distances of the correlated individual lines further comprises identifying a median one of the offset distances of the correlated individual lines or averaging more than one of the offset distances.

4. The method of claim 3 , wherein averaging the more than one of the offset distances comprises averaging the most distant ones of the offset distances.

5. The method of claim 1 , wherein the selected pattern comprises concentric geometries or individual lines of the selected pattern comprises parallel individual lines.

6. The method of claim 5 , wherein the concentric geometries comprise concentric ellipses or arcs, and wherein each individual line of the selected pattern defines a corresponding one of the concentric ellipses or arcs.

7. The method of claim 5 , wherein the concentric geometries comprises concentric polygons.

8. The method of claim 1 , wherein correlating laser marking artifacts on the work piece to ones of the individual lines of the selected pattern further comprises filtering the laser marking artifacts based on a parameter of an imaging system or ranking the laser marking artifacts based on comparative evaluation.

9. The method of claim 8 , wherein filtering the laser marking artifacts based on a parameter of an imaging system further comprises:

configuring the imaging system to ignore brightness below a brightness threshold, the imaging system including a camera and a processor to control the camera;

following the operation of the three-axis GSS and the configuring the imaging system, imaging the work piece using the imaging system to generate an image, wherein at least one of the laser mark artifacts is not represented in the generated image; and

recognizing one or more laser scoring features in the generated image using the processor;

wherein correlating laser marking artifacts on the work piece to ones of the individual lines of the selected pattern is by correlating the one or more laser scoring features to the ones of the individual lines of the selected pattern.

10. The method of claim 9 , wherein the imaging system comprises an integrated optical coordinate measurement machine (CMM) of the three-axis GSS.

11. The method of claim 9 , wherein the processor is configured to estimate a distance between the focus layer and the reference layer using the offset distances of the ones of the individual lines of the selected pattern.

12. The method of claim 9 , wherein the processor is configured to:

select an outermost one of the laser scoring features or one of the laser scoring features closest to a first edge of the generated image;

select an innermost one of the laser scoring features or one of the laser scoring features closest to a second opposite edge of the generated image; and

calculate an average of ones of the offset distances that are correlated with the selected laser scoring features; and

estimate a distance between the focus layer and the reference layer using the average.

13. The method of claim 8 , wherein ranking the laser marking artifacts based on comparative evaluation comprises:

displaying a computer generated image of the work piece at a location remote from a location of the three-axis GSS, wherein the computer generated image is transmitted over an electronic network, wherein the displayed computer generated image includes representations of the laser mark artifacts; and

manually inspecting the representations of the laser mark artifacts based on edge quality comparisons of the representations.

14. The method of claim 8 , wherein ranking the laser marking artifacts based on comparative evaluation comprises:

directly manually inspecting the work piece following the operation of the three-axis GSS based on edge quality comparisons of the laser mark artifacts.

15. The method of claim 1 , wherein the work piece comprises a planar surface, and wherein the reference layer comprises a reference plane associated with the planar surface.