Chalcogenosilacyclopentanes
A new class of compounds known as chalcogenosilacyclopentanes is described. These compounds are five-membered ring structures containing a silicon-selenium or silicon-tellurium bond, as shown in Formulas (I) and (II). In these compounds, the substituents on the silicon and on the ring carbons may be hydrogen, alkyl, alkoxy, aromatic, or ether groups. The chalcogenosilacyclopentane compounds undergo ring-opening reactions with hydroxyl and other protic functionalities and may be used to prepare substrates that are amenable to thin film deposition techniques such as ALD and CVD.
1. A chalcogenosilacyclopentane having formula (I) or (II), wherein R a , R b , R c , R d , R e , and R f are each independently selected from the group consisting of hydrogen, an alkyl group having one to about eight carbon atoms, an alkoxy group having one to about eight carbon atoms, an aromatic group, and an ether group, wherein in formula (I), R and R′ are each independently selected from the group consisting of hydrogen, an alkyl group having one carbon atom, an alkoxy group having one to about eight carbon atoms, an aromatic group, and an ether group, and wherein in formula (II), R and R′ are each independently selected from the group consisting of hydrogen, an alkyl group having one to about eight carbon atoms, an alkoxy group having one to about eight carbon atoms, an aromatic group, and an ether group
2. The chalcogenosilacyclopentane according to claim 1 , wherein R a , R b , R c , R d , R e , and R f are each independently selected from the group consisting of hydrogen, an alkyl group having one to about eight carbon atoms, and an alkoxy group having one to about eight carbon atoms, wherein in formula (I), R and R′ are each independently selected from the group consisting of hydrogen, an alkyl group having one carbon atom, and an alkoxy group having one to about eight carbon atoms, and wherein in formula (II), R and R′ are each independently selected from the group consisting of hydrogen, an alkyl group having one to about eight carbon atoms, and an alkoxy group having one to about eight carbon atoms.
3. The chalcogenosilacyclopentane according to claim 1 , having formula (III):
4. The chalcogenosilacyclopentane according to claim 1 , having formula (IV):
5. The chalcogenosilacyclopentane according to claim 1 , having formula (V):
6. The chalcogenosilacyclopentane according to claim 1 , having formula (VI):
7. The chalcogenosilacyclopentane according to claim 1 , having a structure selected from:
8. A reaction product of a chalcogenosilacyclopentane according to claim 1 with a protic substance.
9. The reaction product according to claim 7 , wherein the protic substance is a substrate.
10. A method for forming an initiating layer for ALD on a protic substrate, the method comprising reacting the protic substrate with a chalcogenosilacyclopentane according to claim 1 .