Fabricating unique chips using a charged particle multi-beamlet lithography system
Method of manufacturing electronic devices using a maskless lithographic exposure system using a maskless pattern writer. The method comprises generating beamlet control data for controlling the maskless pattern writer to expose a wafer for creation of the electronic devices, wherein the beamlet control data is generated based on a feature data set defining features selectable for individualizing the electronic devices, wherein exposure of the wafer according to the beamlet control data results in exposing a pattern having a different selection of the features from the feature data set for different subsets of the electronic devices.
1. A computer-implemented method for generating a feature data set, the method comprising:
generating the feature data set by defining features selectable for individualizing electronic devices,
selecting a plurality of subsets of the features of the feature data set, the plurality of subsets having a different selection of features for different subsets of the electronic devices, and
generating, based on the selected plurality of subsets of the features, control data for exposing a pattern having the selected plurality of subsets of the features corresponding to the subsets of the electronic devices onto a wafer.
2. The method of claim 1 , wherein the feature data set is generated by defining a plurality of features selectable for complementing structures defined in a design layout data defining structures applicable for all the electronic devices to be manufactured from the wafer.
3. The method of claim 1 , wherein the feature data set is generated as a plurality of data files, wherein each data file comprises a subset among the plurality of subsets of the features applicable to one of the different subsets of the electronic devices.
4. The method of claim 1 , wherein the feature data set is generated as a data file, wherein the data file comprises the plurality of subsets of the features, wherein each subset of the features is applicable to one of the different subsets of the electronic devices.
5. The method of claim 1 , further comprising generating selection data by defining a selection of the features of the feature data set for individualizing the electronic devices, the selection data defining a different selection of the features for different subsets of the electronic devices to be manufactured from the wafer.
6. The method of claim 5 , further comprising generating feature meta data by specifying a location where the features from the feature data set are to be created for individualizing the electronic devices.
7. A data processing system comprising a processor configured to perform a computer-implemented method for generating a feature data set, the method comprising:
generating the feature data set by defining features selectable for individualizing electronic devices,
selecting a plurality of subsets of the features defined by the feature data set, the plurality of subsets having a different selection of features for different subsets of electronic devices, and
generating, based on the selected plurality of subsets of the features, control data for exposing a pattern having the selected plurality of subsets of features onto a wafer.