Devices and Methods to improve background equivalent concentrations of elemental species
Methods and systems that can use a gas comprising a nitrogen center that is introduced upstream of a plasma sustained in a torch are described. In some configurations, the gas comprising the nitrogen center can be introduced as a gas upstream of the plasma and through a sample introduction device. Mass spectrometers and optical emission systems that can use the gas comprising the nitrogen center are also described.
1. A method comprising:
introducing a gas comprising a nitrogen center upstream of an inductively coupled plasma sustained in a torch, wherein the torch is configured to sustain the inductively coupled plasma using a plasma gas introduced into the torch, and wherein elements in a sample introduced into the sustained inductively coupled plasma are ionized by the sustained inductively coupled plasma; and
discontinuing introduction of the gas comprising the nitrogen center when the sample introduced into the sustained inductively coupled plasma comprises a hard-to-ionize element, wherein the sustained inductively coupled plasma ionizes the hard-to-ionize element in the introduced sample, and wherein the hard-to-ionize element comprises beryllium, zinc, selenium or arsenic.
2. The method of claim 1 , wherein the gas comprising the nitrogen center is introduced into the torch in a gas flow that is separate from the plasma gas provided to the torch and is separate from any cooling gases provided to the torch to cool glassware of the torch.
3. The method of claim 1 , further comprising introducing the gas comprising the nitrogen center into a spray chamber positioned upstream of the torch and fluidically coupled to a sample inlet of the torch.
4. The method of claim 3 , wherein the gas comprising the nitrogen center is introduced through a secondary port of the spray chamber.
5. The method of claim 4 , wherein the secondary port of the spray chamber is positioned perpendicular to a longitudinal axis of the spray chamber.
6. The method of claim 3 , further comprising switching on the introduction of the gas comprising the nitrogen center into the spray chamber when an element other than a hard-to-ionize element is being analyzed using the inductively coupled plasma.
7. The method of claim 3 , further comprising configuring the introduced gas comprising the nitrogen center to comprise up to about 50% by volume of a total gas flow introduced into the torch.
8. The method of claim 1 , wherein the gas comprising the nitrogen center is nitrogen gas, ammonia gas, nitrous oxide, nitrogen dioxide or a gas comprising ammonium ions.
9. The method of claim 1 , further comprising introducing the gas comprising the nitrogen center into a port of the torch that provides the plasma gas to sustain the inductively coupled plasma in the torch.
10. A mass spectrometer system comprising:
a sample introduction device comprising a first port and a second port, wherein the first port receives a first gas and the second port receives a second gas different from the first gas, and wherein the second gas comprises a nitrogen center;
a torch fluidically coupled to the sample introduction device and configured to receive sample from the sample introduction device at a sample inlet of the torch;
an induction device configured to provide radio frequency energy into the torch to sustain an inductively coupled plasma in the torch to ionize the sample;
a mass analyzer fluidically coupled to a sample outlet of the torch and configured to receive ions from the torch;
a detector fluidically coupled to the mass analyzer; and
a processor configured to prevent introduction of the second gas into the sample introduction device when a sample comprising a hard-to-ionize element is being analyzed using the mass spectrometer system and permit entry of the second gas into the sample introduction device when an element other than a hard-to-ionize element is being analyzed using the mass spectrometer system, wherein the hard-to-ionize element of the sample comprises beryllium, zinc, selenium or arsenic.
11. The mass spectrometer system of claim 10 , wherein the sample introduction device comprises a spray chamber positioned upstream of the torch and fluidically coupled to a sample inlet of the torch.
12. The mass spectrometer system of claim 11 , wherein the spray chamber comprises the second port through which the second gas is introduced and comprises the first port through which the first gas is introduced.
13. The mass spectrometer system of claim 12 , wherein the second port of the spray chamber is positioned perpendicular to a longitudinal axis of the spray chamber.
14. The mass spectrometer system of claim 10 , wherein the processor is further configured to control an amount of the second gas comprising the nitrogen center introduced into the sample introduction device.
15. An optical emission spectrometer system comprising:
a sample introduction device comprising a first port and a second port, wherein the first port receives a first gas and the second port receives a second gas different from the first gas, and wherein the second gas comprises a nitrogen center;
a torch fluidically coupled to the sample introduction device and configured to receive sample from the sample introduction device at a sample inlet of the torch;
an induction device configured to provide radio frequency energy into the torch to sustain an inductively coupled plasma in the torch to ionize the sample;
an optical detector configured to detect optical emissions of excited analyte in the torch; and
a processor configured to prevent introduction of the second gas into the sample introduction device when a sample comprising a hard-to-ionize element is being analyzed using the optical emission spectrometer system and permit entry of the second gas into the sample introduction device when an element other than a hard-to-ionize element is being analyzed using the optical emission spectrometer system, wherein the hard-to-ionize element of the sample comprises beryllium, zinc, selenium or arsenic.
16. The optical emission spectrometer system of claim 15 , wherein the sample introduction device comprises a spray chamber positioned upstream of the torch and fluidically coupled to a sample inlet of the torch.
17. The optical emission spectrometer system of claim 16 , wherein the spray chamber comprises the second port through which the second gas is introduced and comprises the first port through which the first gas is introduced.
18. The optical emission spectrometer system of claim 17 , wherein the second port of the spray chamber is positioned perpendicular to a longitudinal axis of the spray chamber.
19. The optical emission spectrometer system of claim 15 , wherein the processor is further configured to control an amount of the second gas comprising the nitrogen center introduced into the sample introduction device.