Semiconductor optical element and semiconductor optical device comprising the same
A semiconductor optical element is configured to emit or absorb light and includes a lower structure that includes a multiple quantum well layer; an upper mesa structure that is disposed on the lower structure; a current injection structure that is disposed on the upper mesa structure, when seen from an optical axis of the emitted or absorbed light, a width of a portion of the current injection structure in contact with the upper mesa structure is smaller than a width of the upper mesa structure, the portion of the current injection structure in contact with the upper mesa structure consisting of InP, and an average refractive index of the upper mesa structure is higher than a refractive index of the InP forming the current injection structure; and an insulating film covering both side surfaces of the upper mesa structure and a part of an upper surface of the upper mesa structure.
1. A semiconductor optical element configured to emit or absorb light, the semiconductor optical element comprising:
a lower structure that includes a multiple quantum well layer;
an upper mesa structure that is disposed on the lower structure;
a current injection structure that is disposed on the upper mesa structure,
when seen from an optical axis of the emitted or absorbed light, a width of a portion of the current injection structure in contact with the upper mesa structure is smaller than a width of the upper mesa structure,
the portion of the current injection structure in contact with the upper mesa structure consisting of InP, and
an average refractive index of the upper mesa structure is higher than a refractive index of the InP forming the current injection structure; and
an insulating film covering both side surfaces of the upper mesa structure and a part of an upper surface of the upper mesa structure.
2. The semiconductor optical element of claim 1 , wherein
the upper mesa structure includes a diffraction grating layer,
the lower structure forms not the upper mesa structure and one mesa structure, and
the semiconductor optical element further comprises:
a buried semiconductor layer that buries both side surfaces of the lower structure.
3. The semiconductor optical element of claim 2 , wherein the diffraction grating layer is formed of InGaAsP.
4. The semiconductor optical element of claim 1 , wherein
the lower structure includes a lower separate confinement heterostructure layer that is provided above the multiple quantum well layer and has a bandgap greater than a bandgap of the multiple quantum well layer,
the upper mesa structure includes an upper separate confinement heterostructure layer that is provided above the lower separate confinement heterostructure layer and has a bandgap greater than a bandgap of the multiple quantum well layer, and
the semiconductor optical element further comprises:
a buried semiconductor layer that buries both side surfaces of the lower structure.
5. The semiconductor optical element of claim 4 , wherein the upper separate confinement heterostructure layer and the lower separate confinement heterostructure layer are formed of InGaAsP.
6. The semiconductor optical element of claim 1 , wherein the current injection structure is narrower than a width of the upper mesa structure by 0.05 μm or greater.
7. The semiconductor optical element of claim 6 , wherein the current injection structure has a width in a range of 0.1 μm to 0.7 μm.
8. The semiconductor optical element of claim 7 , wherein a height of the current injection structure is less than 1 μm.
9. The semiconductor optical element of claim 1 , wherein the current injection structure is one of at least two current injection structures.
10. The semiconductor optical element of claim 1 , wherein the multiple quantum well layer is a layer consisting of multiple elements including Al.
11. The semiconductor optical element of claim 1 , wherein the upper mesa structure further includes a separate confinement heterostructure layer having a higher refractive index than the current injection structure.
12. The semiconductor optical element of claim 11 , wherein the separate confinement heterostructure layer is formed of InGaAsP.
13. A semiconductor optical device comprising:
a semiconductor optical element configured to emit or absorb light, the semiconductor optical element comprising:
a lower structure that includes a multiple quantum well layer;
an upper mesa structure that is disposed on the lower structure;
a current injection structure that is disposed on the upper mesa structure,
when seen from an optical axis of the emitted or absorbed light, a width of a portion of the current injection structure in contact with the upper mesa structure is smaller than a width of the upper mesa structure,
the portion of the current injection structure in contact with the upper mesa structure consisting of InP, and
an average refractive index of the upper mesa structure is higher than a refractive index of the InP forming the current injection structure; and
an insulating film covering both side surfaces of the upper mesa structure and a part of an upper surface of the upper mesa structure; and
a semiconductor laser integrated with the semiconductor optical element.
14. The semiconductor optical device of claim 13 , wherein
the upper mesa structure includes a diffraction grating layer,
the lower structure forms not the upper mesa structure and one mesa structure, and
the semiconductor optical element further comprises:
a buried semiconductor layer that buries both side surfaces of the lower structure.
15. The semiconductor optical device of claim 14 , wherein the diffraction grating layer is formed of InGaAsP.
16. The semiconductor optical device of claim 13 , wherein
the lower structure includes a lower separate confinement heterostructure layer that is provided above the multiple quantum well layer and has a bandgap greater than a bandgap of the multiple quantum well layer,
the upper mesa structure includes an upper separate confinement heterostructure layer that is provided above the lower separate confinement heterostructure layer and has a bandgap greater than a bandgap of the multiple quantum well layer, and
the semiconductor optical element further comprises:
a buried semiconductor layer that buries both side surfaces of the lower structure.
17. The semiconductor optical device of claim 13 , wherein the current injection structure is narrower than a width of the upper mesa structure by 0.05 μm or greater.
18. The semiconductor optical device of claim 13 , wherein the current injection structure is one of at least two current injection structures.
19. The semiconductor optical device of claim 13 , wherein the multiple quantum well layer is a layer consisting of multiple elements including Al.
20. The semiconductor optical device of claim 13 , wherein the upper mesa structure further includes a separate confinement heterostructure layer having a higher refractive index than the current injection structure.