Plasma Assisted Parylene Deposition
A method for depositing parylene onto a substrate includes utilizing a vaporization chamber and a pyrolysis chamber to crack a dimer into a monomer gas, directly ionizing the monomer gas by passing the monomer gas through a plasma generation chamber comprising plasma prior to injection of the monomer gas into a deposition chamber, and polymerizing the ionized monomer in the deposition chamber to create a polymer and a protective coating on a substrate.
1 . A method for depositing parylene onto a substrate, comprising:
utilizing a vaporization chamber and a pyrolysis chamber to crack a dimer into a monomer gas;
directly ionizing the monomer gas by passing the monomer gas through a plasma generation chamber comprising plasma prior to injection of the monomer gas into a deposition chamber;
polymerizing the ionized monomer in the deposition chamber to create a polymer and a protective coating on a substrate.
2 . The method of claim 1 , further comprising modifying radicals of the monomer gas with the plasma, wherein the modification increases the reactivity of the radicals.
3 . The method of claim 1 , wherein the monomer gas is ionized between the pyrolysis chamber and the deposition chamber.
4 . The method of claim 1 , wherein the plasma is generated by a plasma generation system, where the plasma generation system is a radio frequency plasma generation system.
5 . The method of claim 1 , wherein the plasma is generated by a plasma generation system, where the plasma generation system is a pulsed direct current plasma generation system.
6 . The method of claim 1 , wherein the polymer on the substrate is a parylene N coating.
7 . The method of claim 1 , wherein the polymer on the substrate is a parylene F coating.
8 . The method of claim 8 , wherein the monomer is a parylene monomer.
9 . A method for depositing parylene onto a substrate, comprising:
injecting a monomer gas into a deposition chamber;
injecting a plasma into the deposition chamber, the plasma generated in a plasma generation chamber;
ionizing the monomer gas with the plasma to generate ionized monomer; and
polymerizing the ionized monomer to create a polymer and a protective coating on a substrate.
10 . The method of claim 9 , further comprising modifying radicals of the monomer gas with the plasma, wherein the modification increases the reactivity of the radicals.
11 . The method of claim 9 , wherein the plasma is generated by a plasma generation system, where the plasma generation system is a radio frequency plasma generation system.
12 . The method of claim 9 , wherein the plasma is generated by a plasma generation system, where the plasma generation system is a pulsed direct current plasma generation system.
13 . The method of claim 9 , wherein the polymer on the substrate is a parylene N or parylene F coating.
14 . The method of claim 9 , further comprising energizing the monomer gas after cracking dimer.
15 . The method of claim 9 , further comprising utilizing a vaporization chamber and a pyrolysis chamber to crack a dimer into a monomer gas, and wherein the monomer is a parylene monomer.
16 . A system comprising:
a pyrolysis chamber configured to crack a dimer into a monomer gas;
a plasma generation system configured to generate a plasma;
a deposition chamber configured to facilitate polymerization of an ionized monomer gas into a polymer and a protective coating on a substrate.
17 . The system of claim 16 , wherein the plasma generation system is coupled to a plasma generation chamber, wherein the plasm generation chamber is positioned between the pyrolysis chamber and the deposition chamber.
18 . The system of claim 16 , wherein the plasma generation system is a radio frequency plasma generation system.
19 . The system of claim 16 , wherein the plasma generation system is a pulsed direct current plasma generation system.
20 . The system of claim 16 , wherein the plasma generation system is coupled to deposition chamber, wherein the plasma generation system is configured to inject plasma into the deposition chamber.