REACTIVITY ENHANCEMENT IN ION BEAM ETCHER
A chemically assisted reactive ion beam etching (CAME) system for fabricating a slanted surface-relief structure in a material layer includes an reactive ion source generator configured to generate a plasma using a first reactive gas; one or more aligned collimator grids configured to extract and accelerate at least some of the reactive ions in the plasma to form a collimated reactive ion beam towards the material layer; and a gas ring configured to inject a second reactive gas onto the material layer. The plasma includes reactive ions of the first reactive gas that react with the material layer to generate volatile materials. The second reactive gas also reacts with the material layer. The collimated reactive ion beam and the second reactive gas etch the material layer both physically and chemically to form the slanted surface-relief structure in the material layer.
1 . A chemically assisted reactive ion beam etching (CARIBE) system for fabricating a slanted surface-relief structure in a material layer, the CARIBE system comprising:
an reactive ion source generator configured to generate a plasma using a first reactive gas, the plasma including reactive ions of the first reactive gas that are configured to react with the material layer to generate volatile materials;
one or more aligned collimator grids configured to extract and accelerate at least some of the reactive ions in the plasma to form a collimated reactive ion beam towards the material layer; and
a gas ring configured to inject a second reactive gas onto the material layer, the second reactive gas configured to react with the material layer,
wherein the collimated reactive ion beam and the second reactive gas etch the material layer both physically and chemically to form the slanted surface-relief structure in the material layer.
2 . The CARIBE system of claim 1 , further comprising a neutralizer configured to inject an electron beam into the collimated reactive ion beam to neutralize the collimated reactive ion beam.
3 . The CARIBE system of claim 1 , further comprising a rotation stage configured to hold and rotate a substrate that include the material layer.
4 . The CARIBE system of claim 1 , wherein the reactive ion source generator comprises an inductively coupled plasma generator.
5 . The CARIBE system of claim 1 , wherein:
the first reactive gas comprises at least one of CF 4 , CHF 3 , N 2 , O 2 , SF 6 , H 2 , Cl 2 , BCl 3 , HBr, Ar, He, or Ne; and
the second reactive gas comprises at least one of CF 4 , CHF 3 , N 2 , O 2 , SF 6 , Cl 2 , BCl 3 , or HBr.
6 . The CARIBE system of claim 1 , further comprising a gas inlet for receiving the first reactive gas.