Wavelength converted light emitting device with small source size
A lighting structure according to embodiments of the invention includes a semiconductor light emitting device and a flat wavelength converting element attached to the semiconductor light emitting device. The flat wavelength converting element includes a wavelength converting layer for absorbing light emitted by the semiconductor light emitting device and emitting light of a different wavelength. The flat wavelength converting element further includes a transparent layer. The wavelength converting layer is formed on the transparent layer.
1. A method of manufacturing a light emitting device, the method comprising:
forming a wavelength converting element by disposing a wavelength converting layer on a light transmitting support substrate;
after said forming, attaching the wavelength converting element to a wafer of semiconductor light emitting devices;
after said attaching, dicing the wavelength converting element and the wafer of semiconductor light emitting devices to form a plurality of lighting elements;
after said dicing, disposing the plurality of lighting elements on a handling substrate; and
disposing a reflective material between the plurality of lighting elements.
2. The method of claim 1 , wherein forming the wavelength converting element comprises laminating the wavelength converting layer onto the support substrate.
3. The method of claim 1 , wherein forming the wavelength converting element comprises molding the wavelength converting layer onto the support substrate.
4. The method of claim 1 , comprising texturing the surface of the support substrate.
5. The method of claim 1 , wherein the reflective material comprises particles disposed in a transparent material.
6. The method of claim 1 , wherein disposing the reflective material between the plurality of lighting elements comprises covering a top surface of the light transmitting support substrate with reflective material, the method further comprising removing reflective material disposed on the top surface of the light transmitting support substrate.
7. The method of claim 6 , wherein removing reflective material disposed on the top surface of the light transmitting support substrate roughens, polishes, textures, or patterns the top surface of the light transmitting support substrate.
8. The method of claim 1 , comprising cutting the reflective material between the plurality of lighting elements.
9. The method of claim 1 , wherein the wafer of semiconductor light emitting devices comprises a light emitting region between n and p regions and a growth substrate.
10. The method of claim 9 , wherein a surface of the growth substrate is patterned, roughened or textured.
11. The method of claim 1 , wherein the wavelength converting layer has a thickness of at least 30 microns and no more than 100 microns.
12. The method of claim 1 , wherein the wavelength converting layer has a thickness of no more than 50 microns.
13. The method of claim 1 , wherein attaching the wavelength converting element to a wafer of semiconductor light emitting devices comprises attaching a surface of the wavelength converting element opposite the light transmitting support substrate to the wafer of semiconductor light emitting devices.