Low-profile intercranial device with enhancing grounding to ensure proper impedance measurements
A low-profile intercranial device adapted for housing a functional neurosurgical implant in manner providing for convenient and reliable grounding to ensure proper impedance measurements includes a static cranial implant including a base cranial implant member including an outer first surface, an inner second surface, and a recess shaped and dimensioned for receiving a functional neurosurgical implant. The low-profile intercranial device includes a plurality of fluid passageways extending between the inner second surface and the recess allowing for the flow of bodily fluid between an external environment of the base cranial implant member and a cavity defined by the recess.
1. A low-profile intercranial device adapted for housing a functional neurosurgical implant in manner providing for convenient and reliable grounding to ensure proper impedance measurements, comprising:
a static cranial implant including a base cranial implant member including an outer first surface, an inner second surface, and a recess shaped and dimensioned for receiving a functional neurosurgical implant;
at least one fluid passageway providing for convenient and reliable grounding of a functional neurosurgical implant, the at least one fluid passageway extending between the inner second surface and the recess allowing for the flow of bodily fluid between an external environment of the base cranial implant member and a cavity defined by the recess to thereby conveniently and reliably ground the functional neurosurgical implant to ensure proper impedance measurements of the functional neurosurgical implant;
wherein the at least one fluid passageway is a crescent shaped aperture.
2. The intercranial device according to claim 1 , wherein the static cranial implant further includes a cover cranial implant member.
3. The intercranial device according to claim 1 , wherein the base cranial implant member has a geometry that substantially conforms with a resected portion of the patient's anatomy.
4. The intercranial device according to claim 1 , wherein the recess includes internal side walls and a recess base surface, and the at least one fluid passageway extends between the inner second surface and the recess base surface.
5. The intercranial device according to claim 1 , further including a functional neurosurgical implant positioned within the recess.
6. The intercranial device according to claim 1 , wherein the at least one fluid passageway includes a plurality of fluid passageways.
7. The intercranial device according to claim 6 , wherein the plurality of fluid passageways are formed in opposed corners of the recess.
8. The intercranial device according to claim 1 , further including suture holes within a recess base surface of the recess.
9. The intercranial device according to claim 1 , wherein the base cranial implant member is made of a clear material.
10. A low-profile intercranial device adapted for housing a functional neurosurgical implant in manner providing for convenient and reliable grounding to ensure proper impedance measurements, comprising:
a static cranial implant including a base cranial implant member including an outer first surface, an inner second surface, and a recess shaped and dimensioned for receiving a functional neurosurgical implant;
at least one fluid passageway providing for convenient and reliable grounding of a functional neurosurgical implant, the at least one fluid passageway extending between the inner second surface and the recess allowing for the flow of bodily fluid between an external environment of the base cranial implant member and a cavity defined by the recess to thereby conveniently and reliably ground the functional neurosurgical implant to ensure proper impedance measurements of the functional neurosurgical implant;
wherein the at least one fluid passageway is shaped and dimensioned to allow for fluid communication syphoning heat from the intercranial device.
11. The intercranial device according to claim 10 , wherein the static cranial implant further includes a cover cranial implant member.
12. The intercranial device according to claim 10 , wherein the base cranial implant member has a geometry that substantially conforms with a resected portion of the patient's anatomy.
13. The intercranial device according to claim 10 , wherein the recess includes internal side walls and a recess base surface, and the at least one fluid passageway extends between the inner second surface and the recess base surface.
14. The intercranial device according to claim 10 , further including a functional neurosurgical implant positioned within the recess.
15. The intercranial device according to claim 10 , wherein the at least one fluid passageway includes a plurality of fluid passageways.
16. The intercranial device according to claim 15 , wherein the plurality of fluid passageways are formed in opposed corners of the recess.
17. The intercranial device according to claim 10 , further including suture holes within a recess base surface of the recess.
18. The intercranial device according to claim 10 , wherein the base cranial implant member is made of a clear material.
19. A low-profile intercranial device adapted for housing a functional neurosurgical implant in manner providing for convenient and reliable grounding to ensure proper impedance measurements, comprising:
a static cranial implant including a base cranial implant member including an outer first surface, an inner second surface, and a recess shaped and dimensioned for receiving a functional neurosurgical implant;
at least one fluid passageway providing for convenient and reliable grounding of a functional neurosurgical implant, the at least one fluid passageway extending between the inner second surface and the recess allowing for the flow of bodily fluid between an external environment of the base cranial implant member and a cavity defined by the recess to thereby conveniently and reliably ground the functional neurosurgical implant to ensure proper impedance measurements of the functional neurosurgical implant;
wherein the at least one fluid passageway is shaped and dimensioned to allow for fluid communication syphoning cold from the intercranial device.
20. The intercranial device according to claim 19 , wherein the static cranial implant further includes a cover cranial implant member.
21. The intercranial device according to claim 19 , wherein the base cranial implant member has a geometry that substantially conforms with a resected portion of the patient's anatomy.
22. The intercranial device according to claim 19 , wherein the recess includes internal side walls and a recess base surface, and the at least one fluid passageway extends between the inner second surface and the recess base surface.
23. The intercranial device according to claim 19 , further including a functional neurosurgical implant positioned within the recess.
24. The intercranial device according to claim 19 , wherein the at least one fluid passageway includes a plurality of fluid passageways.
25. The intercranial device according to claim 24 , wherein the plurality of fluid passageways are formed in opposed corners of the recess.
26. The intercranial device according to claim 19 , further including suture holes within a recess base surface of the recess.
27. The intercranial device according to claim 19 , wherein the base cranial implant member is made of a clear material.
28. A low-profile intercranial device adapted for housing a functional neurosurgical implant in manner providing for convenient and reliable grounding to ensure proper impedance measurements, comprising:
a static cranial implant including a base cranial implant member including an outer first surface, an inner second surface, and a recess shaped and dimensioned for receiving a functional neurosurgical implant;
at least one fluid passageway providing for convenient and reliable grounding of a functional neurosurgical implant, the at least one fluid passageway extending between the inner second surface and the recess allowing for the flow of bodily fluid between an external environment of the base cranial implant member and a cavity defined by the recess to thereby conveniently and reliably ground the functional neurosurgical implant to ensure proper impedance measurements of the functional neurosurgical implant;
wherein the at least one fluid passageway is shaped and dimensioned to prevent fluid accumulation within the intercranial device.
29. The intercranial device according to claim 28 , wherein the static cranial implant further includes a cover cranial implant member.
30. The intercranial device according to claim 28 , wherein the base cranial implant member has a geometry that substantially conforms with a resected portion of the patient's anatomy.
31. The intercranial device according to claim 28 , wherein the recess includes internal side walls and a recess base surface, and the at least one fluid passageway extends between the inner second surface and the recess base surface.
32. The intercranial device according to claim 28 , further including a functional neurosurgical implant positioned within the recess.
33. The intercranial device according to claim 28 , wherein the at least one fluid passageway includes a plurality of fluid passageways.
34. The intercranial device according to claim 33 , wherein the plurality of fluid passageways are formed in opposed corners of the recess.
35. The intercranial device according to claim 28 , further including suture holes within a recess base surface of the recess.
36. The intercranial device according to claim 28 , wherein the base cranial implant member is made of a clear material.