Method for cleaning substrate and cleaning device
According to one embodiment, a method including supplying a liquid onto a substrate, solidifying the liquid on the substrate to form a solidified body, and melting the solidified body of the liquid on the substrate is provided. When solidifying the liquid, an internal pressure of the liquid on the substrate is varied.
1. A method for cleaning a substrate, comprising:
dispensing a liquid onto the substrate mounted on a rotatable stage;
cooling the liquid on the substrate to a supercooled state;
varying a rotational speed of the rotatable stage with the substrate mounted thereon and the liquid on the substrate in the supercooled state to vary an internal pressure of the liquid when a temperature of the liquid reaches a setpoint temperature to form a solidified body on the substrate; and
melting the solidified body on the substrate.
2. The method according to claim 1 , wherein the substrate is a nanoimprint template.
3. The method according to claim 1 , wherein the rotatable stage is disposed in a cleaning cup.
4. The method according to claim 1 , further comprising:
measuring the temperature of the liquid on the substrate during the cooling of the liquid on the substrate.
5. The method according to claim 1 , wherein varying the rotational speed includes increasing the rotational speed.
6. The method according to claim 1 , wherein varying the rotational speed includes changing an acceleration of the rotatable stage.
7. The method according to claim 1 , further comprising:
rinsing the liquid from the substrate after melting of the solidified body; and
drying the substrate after the rinsing of the liquid from the substrate.
8. The method according to claim 1 , further comprising:
cooling the solidified body on the substrate to a temperature below a freezing point of the liquid.
9. The method according to claim 1 , wherein the liquid is deionized water.
10. The method according to claim 1 , wherein cooling the liquid is performed by supplying cooling gas from a backside direction of the substrate through a pipe provided in a shaft of the rotatable stage.
11. A method for cleaning a substrate, comprising:
dispensing a liquid onto a nanoimprint template mounted on a rotatable stage;
cooling the liquid on the nanoimprint template to a supercooled state;
increasing a rotational speed of the rotatable stage with the nanoimprint template mounted thereon and the liquid in the supercooled state to vary an internal pressure of the liquid when a temperature of the liquid reaches a setpoint temperature to form a solidified body on the nanoimprint template; and
melting the solidified body.
12. The method according to claim 11 , further comprising:
rinsing the liquid from the nanoimprint template after melting of the solidified body; and
drying the nanoimprint template after the rinsing of the liquid.
13. The method according to claim 11 , wherein cooling the liquid is performed by supplying cooling gas from a backside direction of the nanoimprint template through a pipe provided in a shaft of the rotatable stage.