Configuring optical layers in imprint lithography processes
An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
1. An imprint lithography method of configuring an optical layer, the imprint lithography method comprising:
depositing a first set of droplets onto a substrate that comprises a functional pattern;
curing the first set of droplets to form a spacer layer associated with the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the first set of droplets depositing a second set of droplets atop the substrate such that each droplet of the second set of droplets is respectively dispensed atop a droplet of the first set of droplets; and
curing the second set of droplets to increase a height of the spacer layer, wherein a first number of droplets in the first set of droplets is not equal to a second number of droplets in the second set of droplets such that the spacer layer has a variable height.
2. The imprint lithography method of claim 1 , wherein each droplet of the first set of droplets has a volume of about 1 pL to about 100 pL.
3. The imprint lithography method of claim 1 , further comprising generating a drop-on demand programming scheme.
4. The imprint lithography method of claim 1 , further comprising providing a printing screen.
5. The imprint lithography method of claim 1 , further comprising imprinting the functional pattern on the substrate.
6. The imprint lithography method of claim 1 , wherein depositing the first set of droplets onto the substrate comprises dispensing droplet volumes of a polymerizable substance onto the substrate.
7. The imprint lithography method of claim 1 , further comprising:
depositing each droplet of the first set of droplets directly on the substrate; and
curing the first set of droplets directly on the substrate.
8. The imprint lithography method of claim 1 , wherein each droplet of the first set of droplets has a cured height of about 0.5 μm to about 20.0 μm.
9. The imprint lithography method of claim 8 , further comprising, after the first set of droplets is cured:
depositing each droplet of the second set of droplets directly atop a droplet of the first set of droplets; and
curing the second set of droplets directly atop the first set of droplets to increase a height of the spacer layer.
10. The imprint lithography method of claim 9 , wherein the spacer layer has a wedge shape.
11. The imprint lithography method of claim 1 , wherein the functional pattern is imprinted onto the substrate.
12. The imprint lithography method of claim 11 , wherein the functional pattern is imprinted along an interior region of the substrate, the imprint lithography method further comprising depositing the first set of droplets along a peripheral edge of the substrate.
13. The imprint lithography method of claim 1 , wherein the functional pattern is imprinted on a side of the substrate that is opposite the first set of droplets.
14. The imprint lithography method of claim 13 , further comprising depositing the first set of droplets across an entirety of a portion of the substrate.
15. The imprint lithography method of claim 1 , further comprising attaching the substrate to the surface adjacent the substrate at the first set of droplets such that the spacer layer forms a gap between the substrate and the surface.
16. The imprint lithography method of claim 1 , wherein the gap provides a low index region having an index of refraction in a range of about 1.0 to about 1.2.
17. The imprint lithography method of claim 16 , wherein the low index region comprises air.
18. The imprint lithography method of claim 17 , wherein the low index region has an index of refraction of 1.
19. An optical layer, comprising:
a substrate;
a functional pattern formed on the substrate;
a first cured set of droplets disposed on the substrate, the first cured set of droplets forming a spacer layer associated with the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the first cured set of droplets; and
a second cured set of droplets, each droplet of the second cured set of droplets atop a cured droplet of the first cured set of droplets, thereby increasing a height of the spacer layer relative to the first cured set of droplets,
wherein a number of droplets in the first set of cured droplets is not equal to a number of droplets in the second cured set of droplets, such that the spacer layer has a variable height.