Hybrid metrology method and system
A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.
1. A method for use in measuring one or more characteristics of patterned structures, the method comprising:
providing first and second measured data,
wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements, and
wherein the second measured data comprises at least one Optical Critical Dimension (OCD) spectrum obtained from said patterned structure in an OCD measurement session;
obtaining a set of one or more parameters of the patterned structure by analyzing the at least one Raman spectrum; and
determining measurements of said one or more characteristics of the patterned structure under measurements by analyzing the at least one OCD spectrum using the set of one or more parameters,
wherein the first and second measured data are obtained using different measurement configurations having different values of any of wavelength, polarization, angle of incidence, and sample azimuth, and
wherein the different values are predetermined in accordance with any of a) predefined sensitivities of any of said channels to any predefined parameter of interest of the patterned structure, b) correlations between predefined sensitivities to different parameters of the patterned structure, c) a predefined optical system configuration of any of said channels, and d) predefined productivity considerations including any of predefined throughput values and predefined risk values of possible sample damage.
2. The method according to claim 1 , wherein the first and second measured data are obtained using different optical channels having different types of illumination and different collection channels having different types of detectors.
3. The method according to claim 1 , wherein said first measured data is indicative of a number n (n>1) different Raman spectra obtained from the patterned structure under measurements using n different optical measurement schemes, respectively, with different configurations of the at least one of illuminating and collected light conditions corresponding to said one or more characteristics to be measured.
4. The method according to claim 3 , wherein said analyzing the at least one Raman spectrum comprises sequentially analyzing said n Raman spectra.
5. The method according to claim 3 , wherein said analyzing the at least one Raman spectrum comprises: for each i-th Raman spectrum of said n Raman spectra, calculating distribution of Raman-contribution efficiency, RCE i (x,y,z), across at least part of the structure under measurements, the RCE i (x,y,z) being dependent on characteristics of the structure and a corresponding configuration of at least one of illuminating and collected light conditions in a respective optical measurement scheme, analyzing one or more selected distributions of the Raman-contribution efficiency, and determining the set of parameters of the patterned structure.
6. The method according to claim 5 , comprising using said set of the determined parameters for interpreting the second measured data indicative of the at least one OCD spectrum and determining said one or more characteristics of the structure from the second measured data.
7. The method according to claim 1 , wherein any of said parameters of the patterned structure obtained by analyzing the at least one Raman spectrum is indicative of dimensional configuration of the structure.
8. The method according to claim 1 , wherein said one or more characteristics of the patterned structure comprises at least one of the following: dimension, material composition, stress, crystallinity.
9. A control system for use in measuring one or more characteristics of patterned structures, the control system comprising:
a processor unit configured to
receive and process first and second measured data,
wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements, and
wherein the second measured data comprises at least one Optical Critical Dimension (OCD) spectrum obtained from said patterned structure in an OCD measurement session,
obtain a set of one or more parameters of the patterned structure by analyzing the at least one Raman spectrum, and
determine measurements of said one or more characteristics of the patterned structure under measurements by analyzing the at least one OCD spectrum using the set of one or more parameters,
wherein the first and second measured data are obtained using different measurement configurations having different values of any of wavelength, polarization, angle of incidence, and sample azimuth, and
wherein the different values are predetermined in accordance with any of a) predefined sensitivities of any of said channels to any predefined parameter of interest of the patterned structure, b) correlations between predefined sensitivities to different parameters of the patterned structure, c) a predefined optical system configuration of any of said channels, and d) predefined productivity considerations including any of predefined throughput values and predefined risk values of possible sample damage.
10. The control system according to claim 9 , wherein the first and second measured data are obtained using different optical channels having different types of illumination and different collection channels having different types of detectors.
11. The control system according to claim 9 , wherein said first measured data is indicative of a number n (n>1) different Raman spectra obtained from the patterned structure under measurements using n different optical measurement schemes, respectively, with different configurations of the at least one of illuminating and collected light conditions corresponding to said one or more characteristics to be measured.
12. The control system according to claim 11 , wherein said processor is configured to analyze the at least one Raman spectrum comprises sequentially analyzing said n Raman spectra.
13. The control system according to claim 11 , wherein said processor is configured to analyze the at least one Raman spectrum by, for each i-th Raman spectrum of said n Raman spectra, calculating distribution of Raman-contribution efficiency, RCE i (x,y,z), across at least part of the structure under measurements, the RCE i (x,y,z) being dependent on characteristics of the structure and a corresponding configuration of at least one of illuminating and collected light conditions in a respective optical measurement scheme, analyzing one or more selected distributions of the Raman-contribution efficiency, and determining the set of parameters of the patterned structure.
14. The control system according to claim 13 , wherein the processor is configured to use said set of the determined parameters for interpreting the second measured data indicative of the at least one OCD spectrum and determining said one or more characteristics of the structure from the second measured data.
15. The control system according to claim 9 , wherein any of said parameters of the patterned structure obtained by analyzing the at least one Raman spectrum is indicative of dimensional configuration of the structure.
16. The control system according to claim 9 , wherein said one or more characteristics of the patterned structure comprises at least one of the following: dimension, material composition, stress, crystallinity.
17. A system for use in measuring one or more characteristics of patterned structures, the system comprising:
an optical measurement system configured and operable to perform optical measurements on a patterned structure and thereby generate first and second measured data,
wherein the first measured data is indicative of at least one Raman spectrum obtained from the patterned structure, and
wherein the second measured data comprises at least one Optical Critical Dimension (OCD) spectrum obtained from the patterned structure; and
the control system of claim 9 configured for data communication with the optical measurement system to receive and process the measured data by
obtaining a set of one or more parameters of the patterned structure by analyzing the at least one Raman spectrum, and
determining measurements of said one or more characteristics of the patterned structure under measurements by analyzing the at least one OCD spectrum using the set of one or more parameters,
wherein the first and second measured data are obtained using different measurement configurations having different values of any of wavelength, polarization, angle of incidence, and sample azimuth, and
wherein the different values are predetermined in accordance with any of a) predefined sensitivities of any of said channels to any predefined parameter of interest of the patterned structure, b) correlations between predefined sensitivities to different parameters of the patterned structure, c) a predefined optical system configuration of any of said channels, and d) predefined productivity considerations including any of predefined throughput values and predefined risk values of possible sample damage.
18. The system according to claim 17 , wherein the first and second measured data are obtained using different optical channels having different types of illumination and different collection channels having different types of detectors.
19. The system according to claim 17 , wherein said first measured data is indicative of a number n (n>1) different Raman spectra obtained from the patterned structure under measurements using n different optical measurement schemes, respectively, with different configurations of the at least one of illuminating and collected light conditions corresponding to said one or more characteristics to be measured.
20. The system according to claim 19 , wherein said processor is configured to analyze the at least one Raman spectrum comprises sequentially analyzing said n Raman spectra.
21. The system according to claim 19 , wherein said processor is configured to analyze the at least one Raman spectrum by, for each i-th Raman spectrum of said n Raman spectra, calculating distribution of Raman-contribution efficiency, RCE i (x,y,z), across at least part of the structure under measurements, the RCE i (x,y,z) being dependent on characteristics of the structure and a corresponding configuration of at least one of illuminating and collected light conditions in a respective optical measurement scheme, analyzing one or more selected distributions of the Raman-contribution efficiency, and determining the set of parameters of the patterned structure.
22. The system according to claim 21 , wherein the processor is configured to use said set of the determined parameters for interpreting the second measured data indicative of the at least one OCD spectrum and determining said one or more characteristics of the structure from the second measured data.
23. The system according to claim 17 , wherein any of said parameters of the patterned structure obtained by analyzing the at least one Raman spectrum is indicative of dimensional configuration of the structure.
24. The system according to claim 17 , wherein said one or more characteristics of the patterned structure comprises at least one of the following: dimension, material composition, stress, crystallinity.